INTEGRATED CIRCUIT PACKAGE WITH INTEGRATED VOLTAGE REGULATOR

    公开(公告)号:US20200312766A1

    公开(公告)日:2020-10-01

    申请号:US16367731

    申请日:2019-03-28

    Abstract: Various semiconductor chip devices and methods of making the same are disclosed. In one aspect, an apparatus is provided that includes a first redistribution layer (RDL) structure having a first plurality of conductor traces, a first molding layer on the first RDL structure, plural conductive pillars in the first molding layer, each of the conductive pillars including a first end and a second end, a second RDL structure on the first molding layer, the second RDL structure having a second plurality of conductor traces, and wherein some of the conductive pillars are electrically connected between some of the first plurality of conductor traces and some of the second plurality of conductor traces to provide a first inductor coil.

    FAN-OUT PACKAGE WITH MULTI-LAYER REDISTRIBUTION LAYER STRUCTURE

    公开(公告)号:US20190333851A1

    公开(公告)日:2019-10-31

    申请号:US15965576

    申请日:2018-04-27

    Abstract: Various fan-out devices are disclosed. In one aspect, a semiconductor chip device is provided that includes a redistribution layer (RDL) structure. The RDL structure includes plural metallization layers and plural polymer layers. One of the polymer layers is positioned over one of the metallization layers. The one of the metallization layers has conductor traces. The one of the polymer layers has an upper surface that is substantially planar at least where the conductor traces are positioned. A semiconductor chip is positioned on and electrically connected to the RDL structure. A molding layer is positioned on the RDL structure and at least partially encases the semiconductor chip.

    MOLDED DIE LAST CHIP COMBINATION
    15.
    发明申请

    公开(公告)号:US20190326221A1

    公开(公告)日:2019-10-24

    申请号:US15961222

    申请日:2018-04-24

    Abstract: Various multi-die arrangements and methods of manufacturing the same are disclosed. In one aspect, a method of manufacturing a semiconductor chip device is provided. A redistribution layer (RDL) structure is fabricated with a first side and second side opposite to the first side. An interconnect chip is mounted on the first side of the RDL structure. A first semiconductor chip and a second semiconductor chip are mounted on the second side of the RDL structure after mounting the interconnect chip. The RDL structure and the interconnect chip electrically connect the first semiconductor chip to the second semiconductor chip.

    3D STACKED DIES WITH DISPARATE INTERCONNECT FOOTPRINTS

    公开(公告)号:US20190164936A1

    公开(公告)日:2019-05-30

    申请号:US15826054

    申请日:2017-11-29

    Abstract: Various semiconductor chip devices with stacked chips are disclosed. In one aspect, a semiconductor chip device is provided. The semiconductor chip device includes a first semiconductor chip that has a front side and a back side and plural through chip vias. The through chip vias have a first footprint. The back side is configured to have a second semiconductor chip stacked thereon. The second semiconductor chip includes plural interconnects that have a second footprint larger than the first footprint. The back side includes a backside interconnect structure configured to connect to the interconnects and provide fanned-in pathways to the through chip vias.

    Double side wafer grinder and methods for assessing workpiece nanotopology
    20.
    发明授权
    Double side wafer grinder and methods for assessing workpiece nanotopology 有权
    双面晶圆研磨机和评估工件纳米拓扑学的方法

    公开(公告)号:US07601049B2

    公开(公告)日:2009-10-13

    申请号:US11617433

    申请日:2006-12-28

    CPC classification number: B24B37/28 B24B7/228 B24B49/02

    Abstract: A double side grinder comprises a pair of grinding wheels and a pair of hydrostatic pads operable to hold a flat workpiece (e.g., semiconductor wafer) so that part of the workpiece is positioned between the grinding wheels and part of the workpiece is positioned between the hydrostatic pads. At least one sensor measures a distance between the workpiece and the respective sensor for assessing nanotopology of the workpiece. In a method of the invention, a distance to the workpiece is measured during grinding and used to assess nanotopology of the workpiece. For instance, a finite element structural analysis of the workpiece can be performed using sensor data to derive at least one boundary condition. The nanotopology assessment can begin before the workpiece is removed from the grinder, providing rapid nanotopology feedback. A spatial filter can be used to predict the likely nanotopology of the workpiece after further processing.

    Abstract translation: 双面研磨机包括一对砂轮和一对静压垫,其可操作以保持平坦工件(例如,半导体晶片),使得工件的一部分位于砂轮之间并且部分工件位于静水压 垫 至少一个传感器测量工件和相应传感器之间的距离,用于评估工件的纳米拓扑学。 在本发明的方法中,在研磨期间测量与工件的距离,并用于评估工件的纳米拓扑学。 例如,可以使用传感器数据来执行工件的有限元结构分析以导出至少一个边界条件。 纳米技术评估可以在从研磨机上取出工件之前开始,提供快速的纳米拓扑反馈。 可以使用空间滤波器来进一步处理后预测工件的可能纳米拓扑。

Patent Agency Ranking