-
11.发明授权Positive-working photosensitive quinone diazide composition with alkali insoluble dye and alkali soluble dye 失效正色光敏醌二叠氮化合物与碱不溶性染料和碱溶性染料
公开(公告)号：US4882260A
公开(公告)日：1989-11-21
申请号：US059556
申请日：1987-06-05
申请人： Hidekatsu Kohara , Nobuo Tokutake , Masanori Miyabe , Toshimasa Nakayama , Shingo Asaumi , Hatsuyuki Tanaka , Yoshiaki Arai
发明人： Hidekatsu Kohara , Nobuo Tokutake , Masanori Miyabe , Toshimasa Nakayama , Shingo Asaumi , Hatsuyuki Tanaka , Yoshiaki Arai
IPC分类号： G03C1/00 , C09D161/08 , G03C1/72 , G03F7/004 , G03F7/022 , G03F7/025 , G03F7/04 , G03F7/09 , H01L21/027 , H01L21/30
CPC分类号： G03F7/091
摘要： The photosensitive composition, which is suitable as a photoresist material in fine patterning works for the manufacture of semiconductor devices, contains, as a photoextinctive agent, a combination of an alkali-insoluble dye and an alkali-soluble dye each having absorptivity of light in the wavelength region from 230 to 500 nm in a specified amount and in a specified ratio between them. By virtue of the formulation of combined dyes, the undesirable phenomenon of halation by the underlying aluminum coating layer on the substrate surface is greatly decreased so that patterned resist layer obtained with the composition is a high-fidelity reproduction of the original pattern even in a submicron range of fineness with good rectangularity of the cross sectional form of the patterned lines.
摘要翻译： 在制造半导体器件的精细图案化中适合作为光致抗蚀剂材料的光敏组合物包含作为光敏剂的碱不溶性染料和碱溶性染料的组合，其中每种具有光吸收性的染料 波长范围为230〜500nm，以规定的量和它们之间的规定比例。 由于组合染料的配制，基板表面上的下面的铝涂层的不期望的卤化现象大大降低，使得用该组合物获得的图案化抗蚀剂层即使在亚微米中也是原始图案的高保真再现 图案线的横截面形状的良好矩形度的细度范围。
-
公开(公告)号：US07935397B2
公开(公告)日：2011-05-03
申请号：US11693064
申请日：2007-03-29
IPC分类号： B41M5/00
CPC分类号： B41M5/52 , B41M5/5218
摘要： A high quality ink jet recording medium with a printed image non-vulnerable and excellent in scratch resistance is obtained with an ink jet recording using a water pigment ink. An ink jet recording medium having a substrate and an ink receiving layer including an inorganic particle and a binder on the substrate is provided. A surface of the ink receiving layer has (a) a projected valley portion depth (Rvk) of not less than 20 nm and not more than 100, (b) an arithmetic average roughness (Ra) of not less than 5 nm and not more than 100 nm, and (c) an average spacing (S) of local peaks of not more than 1.0 μm.
摘要翻译： 通过使用水性颜料墨水的喷墨记录，获得具有非脆弱性和耐擦伤性优异的印刷图像的高质量喷墨记录介质。 提供一种喷墨记录介质，其具有基板和在基板上包括无机颗粒和粘合剂的油墨接收层。 墨水接收层的表面具有（a）不小于20nm且不大于100的投影谷部深度（Rvk），（b）不小于5nm的算术平均粗糙度（Ra）不小于5nm 超过100nm，（c）局部峰的平均间隔（S）不大于1.0μm。
-
13.发明授权Pattern forming method with selective silylation utilizing lithographic double-coated patterning plate with undercoat levelling layer 失效具有选择性甲硅烷基化的图案形成方法利用具有底层平整层的平版印刷双层图案化板
公开(公告)号：US5599653A
公开(公告)日：1997-02-04
申请号：US573142
申请日：1995-12-15
申请人： Taku Nakao , Hiroyuki Yamazaki , Nobuo Tokutake , Masato Saito , Hidekatsu Kohara , Toshimasa Nakayama
发明人： Taku Nakao , Hiroyuki Yamazaki , Nobuo Tokutake , Masato Saito , Hidekatsu Kohara , Toshimasa Nakayama
CPC分类号： G03F7/094
摘要： An improvement is proposed in a double-coated patterning plate, which consists of a substrate, an undercoat levelling layer and a photoresist layer thereon, as well as in the patterning method therewith. Different from conventional double-coated patterning plate in which the undercoat levelling layer is formed from poly(methyl methacrylate) resin, the layer in the invention is formed from a copolymeric resin of methyl methacrylate and glycidyl methacrylate in a specified copolymerization ratio and the resin is admixed with 2,2',4,4'-tetrahydroxybenzophenone. By virtue of the use of this unique resin composition for the undercoat levelling layer, the troubles due to intermixing between the undercoat levelling layer and the photoresist layer thereon can be avoided to impart the patterned resist layer with excellent properties.
摘要翻译： 在其中由基底，底涂层流平层和光致抗蚀剂层组成的双面图案化板以及其图案化方法中提出了一种改进。 与由聚（甲基丙烯酸甲酯）树脂形成底层平整层的常规双面图案化板不同，本发明的层由特定共聚比例的甲基丙烯酸甲酯和甲基丙烯酸缩水甘油酯的共聚树脂形成，树脂为 与2,2'，4,4'-四羟基二苯甲酮混合。 由于使用这种独特的树脂组合物作为底层调平层，所以可以避免由于底层平整层和其上的光致抗蚀剂层之间的混合所引起的问题，以赋予图案化抗蚀剂层优异的性能。
-
14.发明授权Positive-working naphtho quinone diazide sulfonic acid ester photoresist composition containing select combination of additives 失效正性萘醌醌二叠氮磺酸酯光致抗蚀剂组合物含有选择性组合的添加剂
公开(公告)号：US5576138A
公开(公告)日：1996-11-19
申请号：US423722
申请日：1995-04-18
IPC分类号： G03F7/004 , G03F7/022 , G03F7/09 , H01L21/027 , G03F7/023
CPC分类号： G03F7/0226 , G03F7/091
摘要： Disclosed is a positive-working photoresist composition used in the photolithographic patterning work for the manufacture of various electronic devices such as VLSIs having improved characteristics, in particular, in respect of the halation-preventing effect. In addition to the conventional ingredients of (a) an alkali-soluble novolac resin as a film-forming agent and (b) a naphthoquinonediazide group-containing compound as a photosensitizing agent, the composition is formulated by the admixture of a specific amount of (c) a halation-preventing agent which is a combination of, one, (c1) a 4,4'-bis(dialkylamino) benzophenone compound and, the other, (c2) a compound selected from the group consisting of polyhydroxy benzophenone compounds, amino- and hydroxy-containing benzophenone compounds and 4-pyrazolylazo compounds in a specific weight proportion of (c1):(c2).
摘要翻译： 公开了用于制造具有改进特性的各种电子器件如VLSI的光刻图形工作中的正性光致抗蚀剂组合物，特别是关于防止晕影效果。 除了（a）作为成膜剂的碱溶性酚醛清漆树脂和（b）含有萘醌二叠氮化物基的化合物作为感光剂的常规成分之外，还通过混合特定量的（ c）一种防晕剂，其是一种（c1）4,4'-双（二烷基氨基）二苯甲酮化合物的组合，另一种是（c2）选自多羟基二苯甲酮化合物， 氨基和羟基的二苯甲酮化合物和4-吡唑基偶氮化合物，其特定重量比例为（c1）:( c2）。
-
公开(公告)号：US5384228A
公开(公告)日：1995-01-24
申请号：US134287
申请日：1993-10-08
IPC分类号： C07C309/76 , G03F7/022 , G03F7/023 , G03F7/30
CPC分类号： G03F7/022 , C07C309/76
摘要： A novel alkali-developable photosensitive resin composition, which is suitable for use as a photoresist composition for fine patterning in the manufacture of various electronic devices, is proposed. The photosensitive resin composition comprises, as the essential ingredients, (a) an alkali-soluble novolac resin as the film-forming ingredient and (b) a very specific compound which is a 1,2-quinone diazide sulfonic acid ester of a condensation product having a weight-average molecular weight of 400 to 2000 obtained by the condensation reaction between phenol and a hydroxybenzaldehyde in the presence of an acidic catalyst as the photosensitizing agent. By virtue of the formulation with this specific photosensitizer, the resist layer formed from the inventive composition has a greatly increased focusing latitude in addition to the excellent sensitivity, resolution and heat resistance.
摘要翻译： 提出了一种新型的碱显影性感光性树脂组合物，其适合用作各种电子器件的制造中的精细图案化的光致抗蚀剂组合物。 感光性树脂组合物含有（a）作为成膜成分的碱溶性酚醛清漆树脂和（b）作为缩合产物的1,2-醌二叠氮基磺酸酯的非常特殊的化合物，作为必要成分 在酸性催化剂作为感光剂的存在下，通过苯酚与羟基苯甲醛之间的缩合反应得到的重均分子量为400〜2000。 由于使用该特定光敏剂的配方，除了优异的灵敏度，分辨率和耐热性之外，由本发明组合物形成的抗蚀剂层具有大大提高的聚焦纬度。
-
16.发明授权Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article 失效含N，N'，N“ - 取代的异氰脲酸酯化合物和相关制品的正性醌醌二叠氮化合物组合物
公开(公告)号：US5332647A
公开(公告)日：1994-07-26
申请号：US111179
申请日：1993-08-24
CPC分类号： G03F7/0226
摘要： A positive-working photosensitive resin composition useful as a photoresist material in the fine patterning work for the manufacture of semiconductor devices is proposed. The composition is excellent in the storage stability and capable of giving a patterned resist layer having good film thickness retention, cross sectional profile of line patterns, resolution and heat resistance. The composition comprises, in addition to a conventional alkali-soluble novolac resin as a film-forming agent and a quinone diazide group containing compound as a photosensitizing agent, a specific isocyanurate compound substituted at each nitrogen atom with a hydroxy- and ter-butyl-substituted benzyl group.
摘要翻译： 提出了用于制造半导体器件的精细图案化工作中用作光致抗蚀剂材料的正性感光性树脂组合物。 该组合物的保存稳定性优异，能够得到具有良好的膜厚保持性，线图案的横截面轮廓，分辨率和耐热性的图案化抗蚀剂层。 该组合物除了常规的作为成膜剂的碱溶性酚醛清漆树脂和含有醌二叠氮基的化合物作为感光剂之外，还包括在每个氮原子处被羟基和叔丁基取代的异氰脲酸酯化合物， 取代的苄基。
-
-
-
-
-
搜索结果
16 条记录 (耗时 0.015 秒)