公开(公告)号：US20120285788A1

公开(公告)日：2012-11-15

申请号：US13508178

申请日：2010-11-05

申请人： Toru Akamatsu ,  Masaki Inoue ,  Masakazu Sakata

发明人： Toru Akamatsu ,  Masaki Inoue ,  Masakazu Sakata

IPC分类号： G07D11/00 ,  G07D9/00

CPC分类号： G07D11/00 ,  B65H29/12 ,  B65H29/125 ,  B65H31/3009 ,  B65H31/3027 ,  B65H33/16 ,  G07D11/0003 ,  G07D11/0009 ,  G07D11/0018 ,  G07D11/0021 ,  G07D11/0024 ,  G07D11/0084

摘要： A banknote deposit apparatus includes: a storing box 70 configured to receive the banknote stacked in a stacking unit 60 so as to store the banknote; and a clamping and transporting mechanism 10 configured to clamp surfaces of the banknote stacked in the stacking unit 60 and to transport the banknote to a direction parallel to the surfaces of the clamped banknote so as to store the banknote in the storing box. A front opening 61 through which the stacked banknote is taken out from outside, and a front shutter unit 62 configured to open and close the front opening are disposed on a front surface of the stacking unit 60.

摘要翻译： 纸币存放装置包括：存储箱70，被配置为接收堆叠在堆垛单元60中以便存储钞票的纸币; 以及夹持传送机构10，其构造成夹持堆叠在堆叠单元60中的纸币的表面，并将纸币输送到与夹持的纸币的表面平行的方向，以将纸币存储在存储箱中。 堆叠的纸币从外部取出的前开口61和构造成打开和关闭前开口的前快门单元62设置在堆叠单元60的前表面上。

公开(公告)号：US20100068414A1

公开(公告)日：2010-03-18

申请号：US12585341

申请日：2009-09-11

申请人： Akira Takahashi ,  Hidehiro Yanai ,  Masakazu Sakata

发明人： Akira Takahashi ,  Hidehiro Yanai ,  Masakazu Sakata

IPC分类号： C23C16/513 ,  C23C16/00 ,  C23C16/46

CPC分类号： H01L21/6719 ,  H01L21/67703

摘要： A substrate processing apparatus includes a transport chamber and a processing chamber that processes substrates. The transport chamber has a first substrate transport member transporting the substrates from the transport chamber to the processing chamber. The processing chamber has a first processing unit which is adjacent to the transport chamber and has a first substrate placing base, a second processing unit which is adjacent to the other side of the transport chamber in the first processing unit and has a second substrate placing base, a second substrate transport member transporting the substrates between the first processing unit and the second processing unit, and a control unit controlling at least the second substrate transport member.

摘要翻译： 基板处理装置包括处理基板的输送室和处理室。 输送室具有将基板从输送室输送到处理室的第一基板输送部件。 处理室具有与传送室相邻的第一处理单元，具有第一基板放置基座，与第一处理单元中的输送室的另一侧相邻的第二处理单元，具有第二基板放置基座 在第一处理单元和第二处理单元之间传送基板的第二基板输送构件以及至少控制第二基板输送构件的控制单元。

公开(公告)号：US5845561A

公开(公告)日：1998-12-08

申请号：US843526

申请日：1997-04-16

申请人： Noboru Chigira ,  Naoto Fukushima ,  Kazuhiro Uehara ,  Masakazu Sakata ,  Kouji Takeda

发明人： Noboru Chigira ,  Naoto Fukushima ,  Kazuhiro Uehara ,  Masakazu Sakata ,  Kouji Takeda

IPC分类号： G07F13/06 ,  A47J31/42 ,  A47J42/38 ,  B07B4/02 ,  A47J31/40

CPC分类号： B07B4/02 ,  A47J31/42 ,  A47J42/38

摘要： An apparatus for preparing a coffee beverage by supplying the ground coffee beans fed from a coffee mill for grinding coffee beans to an extractor to prepare the coffee beverage is disclosed, wherein a device for removing the silver skins out of the coffee beans ground by the coffee mill is provided therewith.

摘要翻译： 公开了一种用于通过从用于研磨咖啡豆的咖啡研磨机供给的研磨咖啡豆到提取器供应咖啡饮料来制备咖啡饮料的装置，其中，用于从由咖啡研磨的咖啡豆中除去银皮的装置 提供轧机。

公开(公告)号：US20060289882A1

公开(公告)日：2006-12-28

申请号：US11192405

申请日：2005-07-29

申请人： Kazuki Nishimura ,  Yuji Hamada ,  Masahiro Iyori ,  Haruhisa Hashimoto ,  Masakazu Sakata ,  Hiroaki Izumi ,  Kaname Ito ,  Kaori Ishikawa ,  Hiroki Ishida

发明人： Kazuki Nishimura ,  Yuji Hamada ,  Masahiro Iyori ,  Haruhisa Hashimoto ,  Masakazu Sakata ,  Hiroaki Izumi ,  Kaname Ito ,  Kaori Ishikawa ,  Hiroki Ishida

IPC分类号： H01L51/54 ,  H05B33/00

CPC分类号： H01L51/5278 ,  C09K11/06 ,  C09K2211/1007 ,  C09K2211/1011 ,  C09K2211/1037 ,  H01L27/3248 ,  H01L51/0051 ,  H01L51/0054 ,  H01L51/0065 ,  H01L51/0068 ,  H01L51/0072 ,  H01L51/5036 ,  H01L2251/5315 ,  H01L2251/552 ,  H01L2251/558 ,  H05B33/14 ,  Y10T428/24116

摘要： An organic electroluminescent element comprising a cathode, an anode, an intermediate unit arranged between a cathode and an anode, a first light emitting unit arranged between a cathode and an intermediate unit, and a second light emitting unit arranged between an anode and an intermediate unit, wherein an electron extracting layer for extracting an electron from an adjacent layer adjoining a cathode side is provided in an intermediate unit, an absolute value of an energy level of a lowest unoccupied molecular orbital (LUMO) of an electron extracting layer |LUMO(A)|, and an absolute value of an energy level of a highest occupied molecular orbital (HOMO) of the adjacent layer |HOMO(B)| are in the relationship of |HOMO(B)|−|LUMO(A)|≦1.5 eV, and an intermediate unit supplies a hole generated by extraction of an electron from an adjacent layer by an electron extracting layer and, at the same time, supplies the extracted electron to a second light emitting unit.

摘要翻译： 一种有机电致发光元件，包括阴极，阳极，布置在阴极和阳极之间的中间单元，布置在阴极和中间单元之间的第一发光单元和布置在阳极和中间单元之间的第二发光单元 其中，在中间单元中设置用于从邻接阴极侧的相邻层提取电子的电子提取层，电子提取层| LUMO（A）的最低未占分子轨道（LUMO）的能级的绝对值 ）|，相邻层的最高占位分子轨道（HOMO）的能级的绝对值| HOMO（B）| 处于| HOMO（B）| - | LUMO（A）| <= 1.5eV的关系中，并且中间单元提供通过电子提取层从相邻层提取电子产生的空穴，并且在相同 时间，将提取的电子提供给第二发光单元。

公开(公告)号：US5545400A

公开(公告)日：1996-08-13

申请号：US458031

申请日：1995-06-01

申请人： Masakazu Sakata ,  Hiroyuki Fujii ,  Yuji Hamada ,  Kenichi Shibata ,  Yoshitaka Nishio

发明人： Masakazu Sakata ,  Hiroyuki Fujii ,  Yuji Hamada ,  Kenichi Shibata ,  Yoshitaka Nishio

IPC分类号： A61L9/01 ,  C07D213/77 ,  B61L9/01

CPC分类号： A61L9/01 ,  C07D213/77

摘要： A deodorant containing an azo metal complex expressed by the following structural formula 1, which is produced by mixing a solution in which azo compounds to be ligands are dissolved with a solution in which a metal salt is dissolved: ##STR1## In the structural formula 1, M represents a metal element, R.sub.1 and R.sub.2 represent aromatic compounds, which may be the same or different from each other, and R.sub.3 and R.sub.4 represent aromatic compounds or heterocyclic compounds, which may be the same or different from each other. In addition, either one or both of nitrogen atoms in an azo base in each of the legends may be coordinated to the metal M.

摘要翻译： 含有由以下结构式1表示的偶氮金属络合物的除臭剂，其通过将其中溶解有配体的偶氮化合物的溶液与溶解有金属盐的溶液混合而制备。（1）在 结构式1，M表示金属元素，R 1和R 2表示可以相同或不同的芳香族化合物，R3和R4表示可以相同或不同的芳香族化合物或杂环化合物。 此外，每个图例中的偶氮基中的氮原子中的一个或两个可以与金属M配位。

公开(公告)号：US5059847A

公开(公告)日：1991-10-22

申请号：US507288

申请日：1990-04-10

申请人： Toshiharu Tanaka ,  Kenichi Shibata ,  Kousuke Takeuchi ,  Masakazu Sakata ,  Hiroshi Okano ,  Kazuhiko Kuroki

发明人： Toshiharu Tanaka ,  Kenichi Shibata ,  Kousuke Takeuchi ,  Masakazu Sakata ,  Hiroshi Okano ,  Kazuhiko Kuroki

IPC分类号： H03H9/25 ,  H03H9/02

CPC分类号： H03H9/02574

摘要： A surface acoustic wave device comprising a single crystal silicon substrate and a piezoelectric thin film of single crystal or C-axis-oriented polycrystalline aluminum nitride formed on the surface of the substrate. The C-axis of the piezoelectric thin film is set in a direction in which the projection vector of the C-axis on a plane containing the axis of propagation direction of a surface acoustic wave and a normal axis of the substrate makes an inclination angle .theta. of up to 60 degrees with the axis of propagation direction, whereby the device is given a coupling coefficient of at least 2% is given as maximum coupling coefficient of the device.

公开(公告)号：US09786528B2

公开(公告)日：2017-10-10

申请号：US13407091

申请日：2012-02-28

申请人： Masakazu Sakata

发明人： Masakazu Sakata

IPC分类号： H01L21/673 ,  H01L21/67 ,  F28F1/12

CPC分类号： H01L21/67109 ,  F28F1/126 ,  F28F1/128 ,  H01L21/673

摘要： The substrate supporting table includes a supporting plate that supports a substrate, a peripheral wall that encompasses a flow path of a coolant under the supporting plate and has an upper end enclosed by the supporting plate, a lower cover that encloses a bottom portion of the flow path and encloses a lower end of the peripheral wall. The substrate supporting table further includes a coolant supplying component that supplies a coolant through an upstream input of the flow path, a discharging component that discharges the coolant through a downstream output of the flow path, and a partition disposed between a supplying hole of the coolant supplying component and a discharging hole of the discharging component. A gap is formed between the partition and the bottom portion of the flow path.

公开(公告)号：US09378991B2

公开(公告)日：2016-06-28

申请号：US12585341

申请日：2009-09-11

申请人： Akira Takahashi ,  Hidehiro Yanai ,  Masakazu Sakata

发明人： Akira Takahashi ,  Hidehiro Yanai ,  Masakazu Sakata

IPC分类号： C23C16/513 ,  C23C16/00 ,  C23C16/46 ,  H01L21/67 ,  H01L21/677

CPC分类号： H01L21/6719 ,  H01L21/67703

摘要： A substrate processing apparatus includes a transport chamber and a processing chamber that processes substrates. The transport chamber has a first substrate transport member transporting the substrates from the transport chamber to the processing chamber. The processing chamber has a first processing unit which is adjacent to the transport chamber and has a first substrate placing base, a second processing unit which is adjacent to the other side of the transport chamber in the first processing unit and has a second substrate placing base, a second substrate transport member transporting the substrates between the first processing unit and the second processing unit, and a control unit controlling at least the second substrate transport member.

摘要翻译： 基板处理装置包括处理基板的输送室和处理室。 输送室具有将基板从输送室输送到处理室的第一基板输送部件。 处理室具有与传送室相邻的第一处理单元，具有第一基板放置基座，与第一处理单元中的输送室的另一侧相邻的第二处理单元，具有第二基板放置基座 在第一处理单元和第二处理单元之间传送基板的第二基板输送构件以及至少控制第二基板输送构件的控制单元。

公开(公告)号：US20120329290A1

公开(公告)日：2012-12-27

申请号：US13479441

申请日：2012-05-24

申请人： Toshiya Shimada ,  Kazuhiro Shimeno ,  Masakazu Sakata ,  Hidehiro Yanai ,  Tomihiro Amano ,  Yuichi Wada

发明人： Toshiya Shimada ,  Kazuhiro Shimeno ,  Masakazu Sakata ,  Hidehiro Yanai ,  Tomihiro Amano ,  Yuichi Wada

IPC分类号： B05C13/02 ,  H01L21/324

CPC分类号： H01L21/6719 ,  H01L21/67781 ,  H01L21/68757

摘要： Provided is a substrate placement stage or substrate processing apparatus which can suppress thermal deformation of the substrate placement stage when the substrate placement stage on which a substrate is placed is heated in a process chamber. The substrate placement stage includes: a heating element; a first member surrounding the heating element; and a second member covering a surface of the first member and including a placing surface for placing a substrate thereon, wherein the first member is made of a first material containing ceramics and aluminum, and the second member is made of a second material containing ceramics and aluminum, a content of the ceramics in the second material being lower than that of the first material.

摘要翻译： 提供了当在处理室中加热放置基板的基板放置台时，可以抑制基板放置台的热变形的基板放置台或基板处理装置。 基板放置台包括：加热元件; 围绕所述加热元件的第一构件; 以及第二构件，其覆盖所述第一构件的表面并且包括用于在其上放置衬底的放置表面，其中所述第一构件由包含陶瓷和铝的第一材料制成，并且所述第二构件由包含陶瓷的第二材料制成， 铝，第二材料中的陶瓷的含量低于第一材料的含量。

公开(公告)号：US20120042853A1

公开(公告)日：2012-02-23

申请号：US13211551

申请日：2011-08-17

申请人： Masakazu Sakata

发明人： Masakazu Sakata

IPC分类号： F02M63/00

CPC分类号： F02D41/2451 ,  F02D41/2464 ,  F02D41/3863 ,  F02D2200/0602

摘要： A controller for a pressure reducing valve is applied to a fuel injection system which is provided with a pressure reducing valve in a common-rail and a fuel pressure sensor detecting a fuel pressure in a fuel supply passage from the accumulator to an injection port of the fuel injector. The controller includes a fuel-pressure-variation detector for detecting a fuel pressure variation timing at which a detection value of the fuel pressure sensor is varied due to an opening operation or a closing operation of the pressure reducing valve. The controller further includes a response-delay-time computing portion for computing a response delay time of the pressure reducing valve based on a command timing and a fuel pressure variation timing.

摘要翻译： 用于减压阀的控制器被施加到在共轨中设置有减压阀的燃料喷射系统和检测来自蓄能器的燃料供给通道中的燃料压力到燃料压力传感器的喷射口的燃料压力传感器 喷油器。 控制器包括燃料压力变化检测器，用于检测由于减压阀的打开操作或关闭操作而使燃料压力传感器的检测值发生变化的燃料压力变化定时。 控制器还包括响应延迟时间计算部分，用于基于指令定时和燃料压力变化定时计算减压阀的响应延迟时间。