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20 条记录 (耗时 0.022 秒)

    Workpiece mounting and clamping system having submicron positioning repeatability
    17.
    发明授权
    Workpiece mounting and clamping system having submicron positioning repeatability 失效
    具有亚微米定位重复性的工件安装和夹紧系统

    公开(公告)号：US4642438A

    公开(公告)日：1987-02-10

    申请号：US672724

    申请日：1984-11-19

    申请人： Karl W. Beumer ,  Charles A. Gaston ,  Charles H. Locke ,  Alfred Mack ,  Brian C. O'Neill ,  Warren J. Pinckney ,  Alan D. Wilson

    发明人： Karl W. Beumer ,  Charles A. Gaston ,  Charles H. Locke ,  Alfred Mack ,  Brian C. O'Neill ,  Warren J. Pinckney ,  Alan D. Wilson

    IPC分类号： H01L21/30 ,  H01J37/20 ,  H01L21/027 ,  H01L21/68 ,  B23K26/00

    CPC分类号： H01L21/68 ,  H01J37/20

    摘要： A high precision, high throughput submicrometer workpiece positioning system, particularly useful as a workpiece positioning means in electron beam lithography tools. The positioning system increases mechanical stability by essentially eliminating mechanical hysteresis, which allows state of the art electron beam lithography systems to provide the repeatable, accurate and dense circuit patterns that modern semiconductor trends demand.The positioning system in preferred form comprises a movable positioning table, a workpiece supporting superstructure which is elastically joined to the movable positioning table by three geometrically distinct kinematic support means and a two-stage coupling means which mounts a workpiece (i.e., semiconductor mask or wafer) to the workpiece supporting superstructure. A laser interferometer locating-positioning system is utilized to position the workpiece. The interferometer mirrors are integral with the workpiece supporting superstructure.The coupling means mounts a workpiece to the workpiece supporting superstructure with a minimum of mechanical distortion. Three two-stage coupling means are utilized in preferred form. The first stage is removable from the positioning, and allows for workpiece loading and unloading outside of the positioning system. The removable stage comprises an integral unit which includes two opposing arms with large radii spherical ends and a tab member. The spherical end center lines are collinear, providing for vertical clamping of the workpiece. The second stage is stationary and integral with the workpiece supporting superstructure. The stationary stage comprises two opposing arms with large radii spherical ends and clamps the tab of the removable stage by vertical clamping.

    摘要翻译： 高精度，高吞吐量的亚微米工件定位系统，特别适用于电子束光刻工具中的工件定位手段。 定位系统通过基本上消除机械滞后来增加机械稳定性，这允许现有技术的电子束光刻系统提供现代半导体趋势需要的可重复，准确和密集的电路图案。 优选形式的定位系统包括可移动定位台，通过三个几何不同的运动支撑装置弹性地连接到可移动定位台的工件支撑上部结构和安装工件（即半导体掩模或晶片）的两级联接装置 ）到工件支撑上部结构。 使用激光干涉仪定位定位系统来定位工件。 干涉仪镜与工件支撑上部结构是一体的。 联接装置以最小的机械变形将工件安装到工件支撑上部结构。 以优选的形式使用三个两级耦合装置。 第一阶段可以从定位中移除，并允许在定位系统之外的工件加载和卸载。 可拆卸台包括整体单元，其包括具有大半径球面端的两个相对臂和突片构件。 球形端中心线是共线的，用于垂直夹紧工件。 第二阶段是固定的，与工件支撑上部结构成一体。 固定台包括两个具有大半径球面的相对臂，并通过垂直夹紧夹紧可拆卸台的突出部。

    Continuously writing electron beam stitched pattern exposure system
    19.
    发明授权
    Continuously writing electron beam stitched pattern exposure system 失效
    连续写入电子束缝合图案曝光系统

    公开(公告)号：US4477729A

    公开(公告)日：1984-10-16

    申请号：US432170

    申请日：1982-10-01

    申请人： Tai-Hon P. Chang ,  Alan D. Wilson

    发明人： Tai-Hon P. Chang ,  Alan D. Wilson

    IPC分类号： B23K26/00 ,  H01J37/302 ,  H01J37/317 ,  H01J37/304

    CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/15 ,  H01J2237/20285 ,  H01J2237/30455 ,  H01J2237/30494 ,  H01J2237/31764 ,  H01J2237/31776

    摘要： A large lithographic pattern is written as quickly as possible by writing successive subpatterns in a vector scan mode of operation without any interruption between successive subpatterns. This is made possible by arranging the subpatterns so that they are adjacent to each other and are preferably overlapping and by gradually moving the workpiece with respect to the writing field so as to always keep the subpattern being written within the writing field of the beam. The speed and direction of the workpiece movement (relative to the writing field) is not predetermined for all patterns but is controlled instead by the pattern being written. A sparsely written pattern or portion of a pattern is accompanied by a more rapid table movement than what accompanies a densely written pattern or portion of a pattern. This is made possible by embedding pattern determined workpiece movement commands within the pattern defining data. Through the workpiece movement commands, relative movement between the workpiece and the writing field may be continuously controlled with respect to movement direction, velocity and acceleration.The desired relative position of the workpiece is continuously updated in tiny increments while a laser interferometer control system measures the error between the actual workpiece position and the desired workpiece position and causes the workpiece to track the desired position.

    摘要翻译： 通过在矢量扫描操作模式中写入连续的子模式，在连续的子模式之间没有任何中断的情况下，尽可能快地写入大的光刻图案。 这通过将子图案布置成使得它们彼此相邻并且优选地重叠并且通过相对于写入场逐渐移动工件来实现，以便始终将子图案写入波束的写入场内。 工件运动的速度和方向（相对于写入场）对于所有图案都不是预先确定的，而是被写入的图案所控制。 一个稀疏写成的图案或图案的一部分伴随着比紧密写入的图案或图案部分更快的桌子移动。 这可以通过在图案定义数据中嵌入图案确定的工件移动命令来实现。 通过工件移动命令，可以相对于移动方向，速度和加速度连续地控制工件与写入区域之间的相对运动。 当激光干涉仪控制系统测量实际工件位置和所需工件位置之间的误差并使工件跟踪所需位置时，工件的期望相对位置以微小增量连续更新。