CALIBRATION SYSTEM
    12.
    发明申请
    CALIBRATION SYSTEM 审中-公开

    公开(公告)号:US20180304466A1

    公开(公告)日:2018-10-25

    申请号:US15954092

    申请日:2018-04-16

    IPC分类号: B25J9/16 B25J9/00

    摘要: A calibration system that calibrates robots installed in a process includes: a reference measuring element; a flange measuring element attached to a flange provided at an arm tip of each robot; a fixed measuring device configured to measure the flange measuring element of each robot and the reference measuring element; and a controller configured to control the robots, calculate a position and attitude relation between the flange measuring element of each robot and the reference measuring element based on a measured result measured by the fixed measuring device, and calculate an error between a design installation position and attitude of each robot and an actual installation position and attitude of the robot by using the measured position and attitude relation and position and attitude data of the flange measuring element in a robot coordinate system at the time when the robot has been measured by the fixed measuring device.

    Plasma processing apparatus with real-time particle filter
    13.
    发明授权
    Plasma processing apparatus with real-time particle filter 失效
    具有实时粒子滤波器的等离子体处理装置

    公开(公告)号:US06875326B2

    公开(公告)日:2005-04-05

    申请号:US10319695

    申请日:2002-12-16

    摘要: A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.

    摘要翻译: 等离子体处理装置包括:通过使用阴极电弧放电来产生等离子体的等离子体生成单元,排列成一行的第一和第二磁场导管,用于输送等离子体,该等离子体的一端与等离子体产生单元连接;处理室 连接到行单元的另一端并且具有用于保持要处理的基板的台。 在电弧放电开始之后的预定时间期间或在电弧放电结束之前的预定时间段期间,提供用于覆盖等离子体的快门。 快门设置在第一磁场通道和待处理基板之间,并且是可移动的。 快门能够被提供电压,并且保持在与处理室电绝缘的状态。