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公开(公告)号：US20110113620A1
公开(公告)日：2011-05-19
申请号：US12948348
申请日：2010-11-17
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/3169 , G11B5/6011 , Y10T29/49032
摘要： A conventional lapping process of executing element size control and surface roughness reduction at the same time is divided in the present invention into a lapping process for element size control and a lapping step for surface roughness reduction. In the lapping process for surface roughness reduction, a surface of a ceramic substrate portion is used as a stopper for limiting cut-in of abrasive grains to realize surface roughness reduction while maintaining productivity.
摘要翻译： 在本发明中，将元件尺寸控制和表面粗糙度减少执行的常规研磨处理分为用于元件尺寸控制的研磨工艺和用于表面粗糙度降低的研磨步骤。 在表面粗糙度降低的研磨工艺中，陶瓷基板部分的表面用作限制磨粒的切割以在保持生产率的同时实现表面粗糙度减小。
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2.发明申请Cluster-ion beam irradiation apparatus and method for manufacturing magnetic head element using the same 失效集束离子束照射装置及使用其的磁头元件的制造方法公开(公告)号：US20060043317A1
公开(公告)日：2006-03-02
申请号：US11173023
申请日：2005-07-05
申请人： Shigeru Ono , Shinji Sasaki , Kenji Furusawa , Jiro Matsuo , Toshio Seki
发明人： Shigeru Ono , Shinji Sasaki , Kenji Furusawa , Jiro Matsuo , Toshio Seki
IPC分类号： H01J37/08
CPC分类号： H01J37/3053 , H01J2237/04756 , H01J2237/0812 , H01J2237/304
摘要： In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N2/3/E1/2 Pa.m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.
摘要翻译： 在包括用于通过使用飞行时间（TOF）质谱法测量气体簇离子的尺寸和能量分布的装置的集束离子束照射装置中，在TOF测量仪器之前的阶段中设置用于施加延迟电压的单元，包括 漂移管和电流测量仪器。 通过测量气体团簇离子的尺寸和能量分布并调节电离条件，将具有预定能量和尺寸的簇离子供应到工作表面。 此外，控制离子输送装置中的压力和离子输送长度的乘积，以满足关系式PxL <= 30 / N 2/3 / E 1/2 Pa.m，其中N是用于照射的气体簇离子的大小，E是气体簇离子的动能（eV）。
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公开(公告)号：US06875326B2
公开(公告)日：2005-04-05
申请号：US10319695
申请日：2002-12-16
申请人： Hiroshi Inaba , Shinji Sasaki , Shinya Hirano , Kenji Furusawa , Minoru Yamasaka , Atsushi Amatatsu , Shi Xu
发明人： Hiroshi Inaba , Shinji Sasaki , Shinya Hirano , Kenji Furusawa , Minoru Yamasaka , Atsushi Amatatsu , Shi Xu
IPC分类号： H05H1/24 , B01J19/08 , C23C14/32 , C23F4/00 , H01J37/32 , H01L21/203 , H01L21/302 , C23C14/00 , C23C16/00
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/3266
摘要： A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.
摘要翻译： 等离子体处理装置包括：通过使用阴极电弧放电来产生等离子体的等离子体生成单元，排列成一行的第一和第二磁场导管，用于输送等离子体，该等离子体的一端与等离子体产生单元连接;处理室 连接到行单元的另一端并且具有用于保持要处理的基板的台。 在电弧放电开始之后的预定时间期间或在电弧放电结束之前的预定时间段期间，提供用于覆盖等离子体的快门。 快门设置在第一磁场通道和待处理基板之间，并且是可移动的。 快门能够被提供电压，并且保持在与处理室电绝缘的状态。
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公开(公告)号：US5651867A
公开(公告)日：1997-07-29
申请号：US591935
申请日：1990-10-02
申请人： Yuichi Kokaku , Hiroyuki Kataoka , Makoto Kitoh , Shigehiko Fujimaki , Satoshi Matsunuma , Kenji Furusawa , Nobuo Nakagawa , Katsuo Abe , Masaaki Hayashi
发明人： Yuichi Kokaku , Hiroyuki Kataoka , Makoto Kitoh , Shigehiko Fujimaki , Satoshi Matsunuma , Kenji Furusawa , Nobuo Nakagawa , Katsuo Abe , Masaaki Hayashi
CPC分类号： H01J37/32623 , C23C14/566 , C23C16/5096 , G11B5/84 , G11B5/851 , H01J37/32743
摘要： A plasma processing apparatus comprising: a vacuum container; an evacuation means for keeping the interior of the vacuum container at a pressure not higher than atmospheric pressure; a substrate support device for supporting a substrate to be subjected to plasma processing; an electrode for generating plasma in cooperation with the substrate support; a voltage supply for applying a voltage to the electrode; a gas introducing system for introducing a gaseous material into a space where the plasma is produced; a surrounding member for enclosing the space above the substrate support, and a drive for relatively moving the surrounding member to space an end of the surrounding member proximate from the substrate from at least one of the substrate support and the substrate supported thereon by a distance which is short enough to suppress plasma leakage during the plasma processing and to position the end of the surrounding member away from said at least one of the substrate support and the substrate thereon for charging and discharging of the substrate.
摘要翻译： 一种等离子体处理装置，包括：真空容器; 用于将真空容器的内部保持在不高于大气压的压力的排气装置; 用于支撑待进行等离子体处理的基板的基板支撑装置; 用于与衬底支撑件协作产生等离子体的电极; 用于向电极施加电压的电压源; 用于将气态物质引入制造等离子体的空间中的气体导入系统; 用于封闭衬底支撑件上方的空间的周围构件以及用于相对移动周围构件的驱动器，用于将基板支撑件和支撑在其上的衬底中的至少一个上的衬底附近的邻近基板的一端远离一定距离， 足够短以抑制等离子体处理期间的等离子体泄漏并且使周围部件的端部远离所述至少一个基板支撑件和其上的基板，以对基板进行充电和放电。
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公开(公告)号：US4950548A
公开(公告)日：1990-08-21
申请号：US355351
申请日：1989-05-23
申请人： Kenji Furusawa , Katsuo Abe , Hiroyuki Kataoka , Tokuho Takagaki , Yoshihiro Shiroishi , Norikazu Tsumita
发明人： Kenji Furusawa , Katsuo Abe , Hiroyuki Kataoka , Tokuho Takagaki , Yoshihiro Shiroishi , Norikazu Tsumita
CPC分类号： G11B5/656 , G11B5/72 , G11B5/738 , G11B5/851 , Y10S428/928 , Y10T428/12465 , Y10T428/12625 , Y10T428/12639 , Y10T428/12847 , Y10T428/12861 , Y10T428/12931
摘要： The present invention relates to a magnetic recording medium for a magnetic disk unit or the like and, more particularly, to a magnetic recording medium having its recording layer made of a magnetic alloy film with uniform magnetic characteristics. The present magnetic recording medium comprises a non-magnetic substrate, at least two sputtered layers of chromium thin film having a bow-like columnar structure which chromium thin film is laminated on the substrate, another sputtered layer of a magnetic alloy thin film laminated on the chromium thin film, and a protective layer laminated on the magnetic alloy thin film. The present invention is effective in reducing modulation of regenerative output relatively independent of a texture roughness of the substrate.
摘要翻译： 本发明涉及一种用于磁盘单元等的磁记录介质，更具体地说，涉及一种具有由具有均匀磁特性的磁性合金膜制成的记录层的磁记录介质。 本磁记录介质包括非磁性基板，至少两个具有弓形柱状结构的铬薄膜溅射层，该铬薄膜层叠在基板上，另一层叠在该基板上的磁性合金薄膜溅射层 铬薄膜和层叠在磁性合金薄膜上的保护层。 本发明可有效地减少再生输出的调制，而不依赖于衬底的纹理粗糙度。
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公开(公告)号：US07405394B2
公开(公告)日：2008-07-29
申请号：US11173023
申请日：2005-07-05
申请人： Shigeru Ono , Shinji Sasaki , Kenji Furusawa , Jiro Matsuo , Toshio Seki
发明人： Shigeru Ono , Shinji Sasaki , Kenji Furusawa , Jiro Matsuo , Toshio Seki
IPC分类号： B01D59/44
CPC分类号： H01J37/3053 , H01J2237/04756 , H01J2237/0812 , H01J2237/304
摘要： In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N2/3/E1/2 Pa·m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.
摘要翻译： 在包括用于通过使用飞行时间（TOF）质谱法测量气体簇离子的尺寸和能量分布的装置的集束离子束照射装置中，在TOF测量仪器之前的阶段中设置用于施加延迟电压的单元，包括 漂移管和电流测量仪器。 通过测量气体团簇离子的尺寸和能量分布并调节电离条件，将具有预定能量和尺寸的簇离子供应到工作表面。 此外，控制离子输送装置中的压力和离子输送长度的乘积，以满足关系式PxL <= 30 / N 2/3 / E 1/2 Pa.m，其中N是用于照射的气体簇离子的大小，E是气体簇离子的动能（eV）。
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公开(公告)号：US07147540B2
公开(公告)日：2006-12-12
申请号：US10384310
申请日：2003-03-06
申请人： Hideaki Tanaka , Kenji Furusawa , Takateru Seki , Akio Takakura , Yukihiro Isono
发明人： Hideaki Tanaka , Kenji Furusawa , Takateru Seki , Akio Takakura , Yukihiro Isono
IPC分类号： B24B49/10
CPC分类号： G11B5/6005 , Y10T29/49048
摘要： In order to realize a shape of an air bearing surface of a magnetic head slider which is capable of coping with a lowering of flying height and which has high reliability, at the time of polishing the air bearing surface of the magnetic head slider by bringing the air bearing surface and the surface of a polishing machine into contact with each other, machining is conducted in the condition where the stiffness acting between both the members is enhanced, and the standard deviation of the flatness of the air bearing surface machined and the standard deviation of the recess amount between the air bearing surface and a magnetic element are controlled. Thus, it is possible to efficiently manufacture a magnetic head slider which enables driving at a low flying height.
摘要翻译： 为了实现能够应对飞行高度的降低并且具有高可靠性的磁头滑块的空气轴承表面的形状，在通过使磁头滑块的空气支承表面进行研磨时， 空气轴承表面和抛光机的表面彼此接触，在两个构件之间作用的刚度增强的情况下进行机械加工，并且空气轴承表面的平面度的标准偏差和标准偏差 控制空气轴承表面和磁性元件之间的凹陷量。 因此，可以有效地制造能够以低飞行高度驾驶的磁头滑块。
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公开(公告)号：US20050280941A9
公开(公告)日：2005-12-22
申请号：US10384310
申请日：2003-03-06
申请人： Hideaki Tanaka , Kenji Furusawa , Takateru Seki , Akio Takakura , Yukihiro Isono
发明人： Hideaki Tanaka , Kenji Furusawa , Takateru Seki , Akio Takakura , Yukihiro Isono
IPC分类号： G11B5/60
CPC分类号： G11B5/6005 , Y10T29/49048
摘要： In order to realize a shape of an air bearing surface of a magnetic head slider which is capable of coping with a lowering of flying height and which has high reliability, at the time of polishing the air bearing surface of the magnetic head slider by bringing the air bearing surface and the surface of a polishing machine into contact with each other, machining is conducted in the condition where the stiffness acting between both the members is enhanced, and the standard deviation of the flatness of the air bearing surface machined and the standard deviation of the recess amount between the air bearing surface and a magnetic element are controlled. Thus, it is possible to efficiently manufacture a magnetic head slider which enables driving at a low flying height.
摘要翻译： 为了实现能够应对飞行高度的降低并且具有高可靠性的磁头滑块的空气轴承表面的形状，在通过使磁头滑块的空气支承表面进行研磨时， 空气轴承表面和抛光机的表面彼此接触，在两个构件之间作用的刚度增强的情况下进行机械加工，并且空气轴承表面的平面度的标准偏差和标准偏差 控制空气轴承表面和磁性元件之间的凹陷量。 因此，可以有效地制造能够以低飞行高度驾驶的磁头滑块。
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9.发明申请公开(公告)号：US20050123806A1
公开(公告)日：2005-06-09
申请号：US11036064
申请日：2005-01-18
申请人： Kazusuke Yamanaka , Tomoo Yamamoto , Yuzuru Hosoe , Nobuyuki Inaba , Yasutaro Uesaka , Masaaki Futamoto , Yoshibumi Matsuda , Kenji Furusawa , Shinji Narishige
发明人： Kazusuke Yamanaka , Tomoo Yamamoto , Yuzuru Hosoe , Nobuyuki Inaba , Yasutaro Uesaka , Masaaki Futamoto , Yoshibumi Matsuda , Kenji Furusawa , Shinji Narishige
CPC分类号： G11B5/64 , Y10T428/12465 , Y10T428/12986 , Y10T428/265 , Y10T428/31
摘要： A magnetic recording medium having a substrate, an under-layer formed on the substrate, a magnetic layer formed on the substrate and a protective layer formed on the magnetic layer. The magnetic layer comprises Co, Cr and Pt with a thickness being from 10 nm to 22 nm. Further, a coercivity of the magnetic layer is not less than 2000 Oe, and a fluctuation field of magnetic viscosity at a field strength equal to remanence coercivity or coercivity is not less than 30 Oe.
摘要翻译： 具有基板的磁记录介质，在基板上形成的下层，形成在基板上的磁性层和形成在磁性层上的保护层。 磁性层包括厚度为10nm至22nm的Co，Cr和Pt。 此外，磁性层的矫顽力不小于2000Oe，磁场强度等于剩磁矫顽力或矫顽磁力的磁场粘度的波动范围不小于30Oe。
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公开(公告)号：US06687089B2
公开(公告)日：2004-02-03
申请号：US09988437
申请日：2001-11-20
申请人： Hiromu Chiba , Kenji Furusawa , Toshio Tamura , Yuji Ochiai
发明人： Hiromu Chiba , Kenji Furusawa , Toshio Tamura , Yuji Ochiai
IPC分类号： G11B560
CPC分类号： G11B5/3173 , G11B5/102 , G11B5/1871 , G11B5/3103 , G11B5/3163 , G11B5/3903
摘要： A magnetic head is formed of materials having different hardnesses. The head includes a base coat formed on a substrate having a high hardness, for example alumina titanium carbide, upon which a base coat, for example alumina, is formed. The base coat typically had a thickness in the range of 0.05 to 0.5 &mgr;m. This structure provides an improved flying height for heads manufactured using a lapping process.
摘要翻译： 磁头由具有不同硬度的材料形成。 头部包括形成在具有高硬度的基底上的底涂层，例如氧化铝碳化钛，在其上形成底涂层，例如氧化铝。 底涂层通常具有在0.05至0.5μm的范围内的厚度。 该结构为使用研磨工艺制造的头部提供了改进的飞行高度。
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