公开(公告)号：US06638403B1

公开(公告)日：2003-10-28

申请号：US09644072

申请日：2000-08-23

申请人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

发明人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

IPC分类号： C23C1400

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/3266

摘要： In the plasma processing device which utilizes a low pressure arc discharge, a method for efficiently capturing and removing electrically charged particles and neutral particles having no charge which are at most 5 &mgr;m in particle diameter is demanded. The electrically charged particles can be captured efficiently by installing an electric field filter in a transportation course of plasma. The electric field filter has a cylindrical structure which is uneven in inner wall shape. A voltage in the range of 10 to 90 V is applied to the electric field filter. The neutral filters can be captured efficiently by installing a neutral filter having an opening sectional area which is at most 40% of a sectional area of the transportation course.

摘要翻译： 在使用低压电弧放电的等离子体处理装置中，要求有效地捕获和去除带电粒子的方法和粒径不超过5μm的无电荷的中性粒子。 通过在等离子体的输送过程中安装电场滤波器可以有效地捕获带电粒子。 电场滤波器具有内壁形状不均匀的圆筒状结构。 对电场滤波器施加10〜90V范围的电压。 可以通过安装具有开口截面积至多为运输路线横截面面积的40％的中性过滤器来有效地捕获中性过滤器。

公开(公告)号：US06875326B2

公开(公告)日：2005-04-05

申请号：US10319695

申请日：2002-12-16

申请人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

发明人： Hiroshi Inaba ,  Shinji Sasaki ,  Shinya Hirano ,  Kenji Furusawa ,  Minoru Yamasaka ,  Atsushi Amatatsu ,  Shi Xu

IPC分类号： H05H1/24 ,  B01J19/08 ,  C23C14/32 ,  C23F4/00 ,  H01J37/32 ,  H01L21/203 ,  H01L21/302 ,  C23C14/00 ,  C23C16/00

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J37/3266

摘要： A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.

摘要翻译： 等离子体处理装置包括：通过使用阴极电弧放电来产生等离子体的等离子体生成单元，排列成一行的第一和第二磁场导管，用于输送等离子体，该等离子体的一端与等离子体产生单元连接;处理室 连接到行单元的另一端并且具有用于保持要处理的基板的台。 在电弧放电开始之后的预定时间期间或在电弧放电结束之前的预定时间段期间，提供用于覆盖等离子体的快门。 快门设置在第一磁场通道和待处理基板之间，并且是可移动的。 快门能够被提供电压，并且保持在与处理室电绝缘的状态。