公开(公告)号：US09640631B2

公开(公告)日：2017-05-02

申请号：US14970341

申请日：2015-12-15

Applicant: STMicroelectronics SA

Inventor： Alain Chantre ,  Pascal Chevalier ,  Gregory Avenier

IPC: H01L29/66 ,  H01L21/8249 ,  H01L27/12 ,  H01L29/73 ,  H01L29/732 ,  H01L29/737 ,  H01L29/10

CPC classification number: H01L29/66272 ,  H01L21/8249 ,  H01L27/1203 ,  H01L29/1004 ,  H01L29/66234 ,  H01L29/66242 ,  H01L29/66265 ,  H01L29/73 ,  H01L29/7317 ,  H01L29/7322 ,  H01L29/7371

Abstract: A method for manufacturing a bipolar transistor, including the steps of: forming a first surface-doped region of a semiconductor substrate having a semiconductor layer extending thereon with an interposed first insulating layer; forming, at the surface of the device, a stack of a silicon layer and of a second insulating layer; defining a trench crossing the stack and the semiconductor layer opposite to the first doped region, and then an opening in the exposed region of the first insulating layer; forming a single-crystal silicon region in the opening; forming a silicon-germanium region at the surface of single-crystal silicon region, in contact with the remaining regions of the semiconductor layer and of the silicon layer; and forming a second doped region at least in the remaining space of the trench.

公开(公告)号：US09461441B2

公开(公告)日：2016-10-04

申请号：US14945859

申请日：2015-11-19

Applicant: STMICROELECTRONICS SA ,  STMICROELECTRONICS (CROLLES 2) SAS

Inventor： Alain Chantre ,  Charles Baudot ,  Sébastien Cremer

IPC: H01S5/00 ,  H01S5/026 ,  H01S5/125 ,  H01S5/22 ,  H01S5/02 ,  H01S5/065

CPC classification number: H01S5/026 ,  G02B6/12004 ,  G02B6/1225 ,  G02B6/132 ,  G02B6/136 ,  H01S5/021 ,  H01S5/0264 ,  H01S5/0265 ,  H01S5/0267 ,  H01S5/0268 ,  H01S5/0422 ,  H01S5/0425 ,  H01S5/0656 ,  H01S5/1032 ,  H01S5/1035 ,  H01S5/125 ,  H01S5/22 ,  H01S5/2206

Abstract: A photonic integrated circuit includes a first insulating region encapsulating at least one metallization level, a second insulating region at least partially encapsulating a gain medium of a laser source, and a stacked structure placed between the two insulating regions. The stacked structure includes a first polycrystalline or single-crystal silicon layer, a second polycrystalline or single-crystal silicon layer, an intermediate layer optically compatible with the wavelength of the laser source and selectively etchable relative to silicon and that separates the first layer from a first portion of the second layer, and the gain medium facing at least one portion of the first layer. The first layer, the intermediate layer, and the first portion of the second layer form an assembly containing a resonant cavity and a waveguide, which are optically coupled to the gain medium, and a second portion of the second layer containing at least one other photonic component.

Abstract translation: 光子集成电路包括封装至少一个金属化水平的第一绝缘区域，至少部分地封装激光源的增益介质的第二绝缘区域和放置在两个绝缘区域之间的层叠结构。 层叠结构包括第一多晶或单晶硅层，第二多晶或单晶硅层，与激光源的波长光学兼容并且可相对于硅选择性地蚀刻的中间层，并且将第一层与 所述第二层的第一部分和所述增益介质面向所述第一层的至少一部分。 第一层，中间层和第二层的第一部分形成包含谐振腔和波导的组件，光学耦合到增益介质，第二层的第二部分包含至少一个其他光子 零件。