公开(公告)号：US09915768B2

公开(公告)日：2018-03-13

申请号：US14990334

申请日：2016-01-07

Applicant: Samsung Display Co. Ltd.

Inventor： Seung Won Park ,  Tae Woo Kim ,  Min Hyuck Kang ,  Dae Ho Yoon ,  Moon Gyu Lee

IPC: G02B5/30 ,  G02F1/1335

CPC classification number: G02B5/3058 ,  G02F1/133528 ,  G02F2001/133548 ,  G02F2001/13355

Abstract: The wire grid polarizer plate includes a light permeable substrate and a conductive pattern layer arranged on one surface of the light permeable substrate, the conductive pattern layer includes window regions and at least one reflective region arranged in a rectangular region which is circumscribed to the window regions, the window regions have target patterns including conductive simple closed curves surrounding in piles, spaced apart from each other at an interval of a period which is shorter than a wavelength of incident light, transmit first polarized light of the incident light and reflect second polarized light which is perpendicular to the first polarized light and the reflective regions reflect both of the first polarized light and the second polarized light.

公开(公告)号：US09903991B2

公开(公告)日：2018-02-27

申请号：US14623708

申请日：2015-02-17

Applicant: Samsung Display Co., Ltd.

Inventor： Eun Ae Kwak ,  Min Hyuck Kang ,  Moon Gyu Lee

IPC: G02B5/30 ,  C09K13/00 ,  C23F4/00 ,  H01L21/308 ,  G02F1/1335 ,  H01L21/3065 ,  B81C1/00 ,  G03F7/004 ,  H01L21/306

CPC classification number: G02B5/3058 ,  B81C1/00388 ,  B81C1/00404 ,  B81C2201/0149 ,  C09K13/00 ,  C23F4/00 ,  G02F2001/133548 ,  G03F7/0041 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3083 ,  H01L21/3086 ,  H01L21/3088

Abstract: A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.

公开(公告)号：US20160047961A1

公开(公告)日：2016-02-18

申请号：US14667588

申请日：2015-03-24

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Seung Won Park ,  Tae Woo Kim ,  Dae Ho Yoon ,  Moon Gyu Lee

IPC: G02B5/30 ,  G03F7/00

CPC classification number: G02B5/3058 ,  G03F7/0002 ,  G03F7/0007 ,  G03F7/0035

Abstract: A method of fabricating a polarizer, the method including, forming a base substrate by sequentially forming a metal layer, a guide layer, a hard mask layer, a sacrificial layer, and a first photoresist layer on a light-transmitting substrate in a panel area and an alignment key area which are spatially separated from each other, forming a first photoresist layer pattern for forming an alignment key pattern in the alignment key area by patterning the first photoresist layer, forming a sacrificial layer pattern in the alignment key area utilizing the first photoresist layer pattern as a mask, and forming a second photoresist layer on a top surface of the sacrificial layer pattern of the alignment key area before removing the sacrificial layer of an aperture area of the panel area.

Abstract translation: 一种偏振片的制造方法，其特征在于，在面板区域的透光性基板上依次形成金属层，导向层，硬掩模层，牺牲层，第一光致抗蚀剂层，形成基板 以及在空间上彼此分离的对准键区域，通过对所述第一光致抗蚀剂层进行构图来形成用于在所述对准键区域中形成对准键图案的第一光致抗蚀剂层图案，利用所述第一光刻胶层在所述对准键区域中形成牺牲层图案 光致抗蚀剂层图案作为掩模，并且在去除面板区域的孔区域的牺牲层之前，在对准键区域的牺牲层图案的顶表面上形成第二光致抗蚀剂层。

公开(公告)号：US09116382B2

公开(公告)日：2015-08-25

申请号：US14518189

申请日：2014-10-20

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jeong Min Seo ,  Jee Hong Min ,  Young Chan Kim ,  Moon Gyu Lee ,  Kyu Seok Kim

IPC: G02F1/1335 ,  G02F1/1333 ,  G02F1/1343 ,  G02F1/1362 ,  G02F1/1368 ,  G02B5/04 ,  F21V8/00

CPC classification number: G02F1/133504 ,  G02B5/045 ,  G02B6/0011 ,  G02B6/0016 ,  G02B6/0036 ,  G02B6/0038 ,  G02B6/0053 ,  G02B6/0068 ,  G02F1/133305 ,  G02F1/133514 ,  G02F1/133553 ,  G02F1/1336 ,  G02F1/133606 ,  G02F1/13439 ,  G02F1/136213 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/133607 ,  G02F2001/136222

Abstract: A liquid crystal display device having brightness uniformity at its front and lateral sides is provided according to one or more embodiments. In one embodiment, the liquid crystal display device includes a reflection sheet reflecting light, an optical plate including a substrate for guiding light, a height-varying portion formed on one surface of the substrate, not facing the reflection sheet, and a prism pattern formed on the height-varying portion, and a plurality of light sources arranged on one lateral surface of the optical plate in a first direction so as to correspond to a position of the height-varying portion having a height not greater than an average height from the one surface of the substrate to the height-varying portion, wherein the prism pattern extends in a second direction substantially perpendicular to the first direction, and the average height is in a range of about 0.1% to about 10% of the thickness of the substrate.

Abstract translation: 根据一个或多个实施例，提供其前侧和侧面具有亮度均匀性的液晶显示装置。 在一个实施例中，液晶显示装置包括反射光的反射片，包括用于引导光的基板的光学板，形成在基板的一个表面上的不面向反射片的高度变化部分和形成的棱镜图案 和高度变化部分上的多个光源，以及在第一方向上布置在光学板的一个侧表面上的多个光源，以便对应于具有不大于平均高度的高度变化部分的高度的位置 衬底的高度变化部分的一个表面，其中棱镜图案沿基本上垂直于第一方向的第二方向延伸，并且平均高度在衬底的厚度的约0.1％至约10％的范围内 。

公开(公告)号：US10509150B2

公开(公告)日：2019-12-17

申请号：US15871186

申请日：2018-01-15

Applicant: Samsung Display Co., Ltd.

Inventor： Eun Ae Kwak ,  Min Hyuck Kang ,  Moon Gyu Lee

IPC: G02F1/1335 ,  G02B5/30

Abstract: A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.

公开(公告)号：US09952366B2

公开(公告)日：2018-04-24

申请号：US14628985

申请日：2015-02-23

Applicant: Samsung Display Co. Ltd.

Inventor： Min Hyuck Kang ,  Eun Ae Kwak ,  Lei Xie ,  Moon Gyu Lee ,  Hyeong Gyu Jang

IPC: G03F7/00 ,  G02B5/30

CPC classification number: G02B5/3058 ,  G03F7/0002

Abstract: A patterning method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.

公开(公告)号：US09939570B2

公开(公告)日：2018-04-10

申请号：US14945328

申请日：2015-11-18

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Tae Woo Kim ,  Seung Won Park ,  Moon Gyu Lee ,  Lei Xie ,  Dae Ho Yoon

IPC: G02B5/30 ,  G02F1/1335

CPC classification number: G02B5/3058 ,  G02F2001/133548

Abstract: Provided is a wire grid polarizing plate. The wire grid polarizing plate comprises a light-transmitting substrate and wire grid patterns which are disposed on the light-transmitting substrate, and which are arranged to transmit first polarized light and to reflect second polarized light polarized in a direction perpendicular to that of the first polarized light, the wire grid patterns comprising target patterns comprising conductive structures shaped as closed curves, at least one of the conductive structures surrounding another one of the conductive structures with a gap therebetween.

公开(公告)号：US09581745B2

公开(公告)日：2017-02-28

申请号：US14667437

申请日：2015-03-24

Applicant: Samsung Display Co. Ltd.

Inventor： Lei Xie ,  Tae Woo Kim ,  Dae Ho Yoon ,  Moon Gyu Lee

IPC: G02B5/30

CPC classification number: G02B5/3058

Abstract: A method for fabricating a wire grid polarizer according to an embodiment comprises: forming a conductive layer on a substrate; forming a guide layer on the conductive layer; forming a hard mask pattern to partially expose the guide layer; forming a guide pattern to partially expose the conductive layer; providing a block copolymer of two monomers having different etching rates; forming two sets of monomer blocks by aligning the block copolymer; selectively removing one set of monomer blocks; and forming a conductive wire pattern using the remaining set of monomer blocks and the guide pattern as etching masks. A width of an upper end of the guide pattern adjacent to the hard mask pattern is smaller than a width of a lower end adjacent to the conductive layer. The width of the upper end of the guide pattern is smaller than a width of the hard mask pattern.

Abstract translation: 根据实施例的用于制造线栅偏振器的方法包括：在衬底上形成导电层; 在导电层上形成引导层; 形成硬掩模图案以部分地暴露引导层; 形成引导图案以部分地暴露所述导电层; 提供具有不同蚀刻速率的两种单体的嵌段共聚物; 通过对齐嵌段共聚物形成两组单体嵌段; 选择性地除去一组单体嵌段; 并使用剩余的单体块组和引导图案作为蚀刻掩模形成导线图案。 与硬掩模图案相邻的引导图案的上端的宽度小于与导电层相邻的下端的宽度。 引导图案的上端的宽度小于硬掩模图案的宽度。

公开(公告)号：US09140917B2

公开(公告)日：2015-09-22

申请号：US14108761

申请日：2013-12-17

Applicant: Samsung Display Co., Ltd.

Inventor： Su Mi Lee ,  Min Hyuck Kang ,  Myung Im Kim ,  Tae Woo Kim ,  Seung-Won Park ,  Xie Lei ,  Moon Gyu Lee

IPC: G02F1/155 ,  G02F1/1333 ,  G02F1/1335

CPC classification number: G02F1/1333 ,  G02F1/133528 ,  G02F1/133536 ,  G02F1/133553 ,  G02F1/133555 ,  G02F1/155

Abstract: A method of forming a micropattern structure includes: coating a structure including a plurality of guide blocks extending in a first direction on a substrate and disposed to be spaced apart from each other in a second direction, which is perpendicular to the first direction, with a sacrificial material; ashing a portion of the sacrificial material to expose upper portions of the plurality of guide blocks; coating the structure with a first material having a polarity that is contrary to a polarity of a filling material filling the structure; heat-treating the structure to chemically bond the first material to the upper portions of the plurality of guide blocks; removing the sacrificial material and excess first material to form a first material cap chemically bonded to the upper portions of the plurality of guide blocks; and filling the structure with the filling material.

Abstract translation: 一种形成微图案结构的方法包括：涂覆包括在基板上沿第一方向延伸的多个引导块的结构，并且设置成在垂直于第一方向的第二方向上彼此间隔开， 牺牲材料; 灰化所述牺牲材料的一部分以暴露所述多个引导块的上部; 用具有与填充结构的填充材料的极性相反的极性的第一材料涂覆结构; 对所述结构进行热处理以将所述第一材料化学结合到所述多个引导块的上部; 去除牺牲材料和过量的第一材料，以形成化学键合到多个引导块的上部的第一材料帽; 并用填充材料填充结构。

公开(公告)号：US20150218300A1

公开(公告)日：2015-08-06

申请号：US14466735

申请日：2014-08-22

Applicant: SAMSUNG DISPLAY CO., LTD. ,  SOGANG UNIVERSITY RESEARCH FOUNDATION

Inventor： MIN HYUCK KANG ,  Tae Woo Kim ,  Myung Im Kim ,  Moon Gyu Lee ,  Su Mi Lee ,  Seung-Won Park ,  Lei Xie ,  Bong-Jin Moon ,  Na Na Kang

IPC: C08F299/04 ,  G03F7/40

CPC classification number: G03F7/40 ,  C08F293/00 ,  G03F7/0002 ,  G03F7/405 ,  H01L21/3081

Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.

Abstract translation: 嵌段共聚物包括：第一嵌段和与第一嵌段共聚的第二嵌段。 第二嵌段包括含有环型官能团的甲硅烷基。