-
公开(公告)号:US20210226153A1
公开(公告)日:2021-07-22
申请号:US17202229
申请日:2021-03-15
Applicant: Samsung Display Co., Ltd.
Inventor: Hyuneok Shin , Chanwoo Yang , Juhyun Lee , Sanggab Kim , Joonyong Park , Seungwook Chang , Jinwook Jeong
Abstract: A light-emitting device may include a first electrode, a second electrode, and a light-emitting layer therebetween. The first electrode may include a reflection layer and a metal oxide layer provided on the reflection layer. The metal oxide layer may be provided between the reflection layer and the light-emitting layer. The metal oxide layer may include molybdenum dioxide and an oxide of a group-V element, and a content of the group-V element to a total amount of the metal oxide layer may range from 2 at % to 10 at.
-
公开(公告)号:US10283529B2
公开(公告)日:2019-05-07
申请号:US15337401
申请日:2016-10-28
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Shinil Choi , Hyunmin Cho , Sanggab Kim , Sunghoon Yang , Yugwang Jeong , Byungdu Ahn
IPC: G02F1/1368 , H01L27/12 , G02F1/1333 , G02F1/1343 , G02F1/1362 , H01L27/32 , H01L29/423 , H01L29/66 , H01L29/786
Abstract: A method of manufacturing a thin-film transistor includes forming an oxide semiconductor on a substrate, stacking an insulating layer and a metal layer on the substrate to cover the oxide semiconductor, forming a photosensitive pattern on the metal layer, forming a gate electrode by etching the metal layer using the photosensitive pattern as a mask, where a part of the gate electrode overlaps a first oxide semiconductor region of the oxide semiconductor, forming a gate insulating film by partially etching the insulating layer using the photosensitive pattern as a mask, where the gate insulating film includes a first insulating region with a first thickness under the photosensitive pattern and a second insulating region with a second thickness less than the first thickness, and performing plasma processing on the gate insulating film so that a second oxide semiconductor region of the oxide semiconductor under the second insulating region becomes conductive.
-
公开(公告)号:US12185593B2
公开(公告)日:2024-12-31
申请号:US18224083
申请日:2023-07-20
Applicant: Samsung Display Co., Ltd.
Inventor: Hyunmin Cho , Taesung Kim , Yunjong Yeo , Sanggab Kim , Daewon Choi
IPC: H10K59/122 , H10K50/813 , H10K50/822 , H10K71/00 , H10K102/00
Abstract: An embodiment of a display device includes a substrate including a display area; an organic layer and having a protrusion protruding in a thickness direction of the substrate and overlapping the display area; a first electrode on the organic layer and overlapping the display area; a pixel defining layer covering the protrusion and an edge of the first electrode and having an opening portion overlapping the first electrode; an emission layer on the first electrode and overlapping the opening portion; and a second electrode on the emission layer, wherein the pixel defining layer includes an inorganic material, and a first distance from an upper surface of the substrate to a lower surface of the first electrode is less than a second distance from the upper surface of the substrate to an upper surface of the protrusion, the lower surface of the first electrode facing the upper surface of the substrate.
-
公开(公告)号:US12016224B2
公开(公告)日:2024-06-18
申请号:US17821463
申请日:2022-08-22
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Taewook Kang , Kyeongsu Ko , Sanggab Kim , Wooyong Sung , Joongeol Lee , Shinil Choi
IPC: H10K59/131 , H10K50/82 , H10K50/84 , H10K59/00 , H10K59/10 , H10K59/124
CPC classification number: H10K59/131 , H10K50/82 , H10K50/84 , H10K59/00 , H10K59/10 , H10K59/124
Abstract: A display panel including a glass substrate having an opening area, and a display area at least partially surrounding the opening area; a thin film transistor on the display area including a semiconductor layer and a gate electrode; a display element electrically connected to the thin film transistor; a multi-layer including an insulating layer and a lower insulating layer. The insulating layer is between the glass substrate and the display element and the lower insulating layer is between the glass substrate and the insulating layer; and a thin-film encapsulation layer covering the display element including an inorganic encapsulation layer and an organic encapsulation layer. The multi-layer includes a first groove between the opening area and the display area. A first width of a portion of the first groove in the lower insulating layer is greater than a second width of a portion of the first groove in the insulating layer.
-
公开(公告)号:US11758788B2
公开(公告)日:2023-09-12
申请号:US17951200
申请日:2022-09-23
Applicant: Samsung Display Co., Ltd.
Inventor: Seon Uk Lee , Kanguk Kim , Sanggab Kim , Donchan Cho , Tae Hyung Hwang , KyeongSu Ko , Sungwon Cho
IPC: H10K59/38 , H10K50/84 , H10K50/856 , H10K50/86 , H10K59/122 , H10K59/126 , H10K71/00
CPC classification number: H10K59/38 , H10K50/841 , H10K50/856 , H10K50/865 , H10K59/122 , H10K59/126 , H10K71/00
Abstract: Disclosed are display panels and methods of manufacturing substrates. The display panel comprises a lower display substrate that includes a plurality of light emitting elements, and an upper display substrate that includes a color control layer and is on the lower display substrate. The color control layer includes a plurality of walls each of which includes a wall base including an organic material and a reflective layer including a metallic material, and the color control layer also includes a plurality of color control parts which are disposed between the plurality of walls and at least one of which includes a quantum dot. The reflective layer surrounds at least a portion of a sidewall of the wall base, which results in an increase in luminous efficiency and an improvement in brightness.
-
公开(公告)号:US11367742B2
公开(公告)日:2022-06-21
申请号:US16544602
申请日:2019-08-19
Applicant: Samsung Display Co., Ltd.
Inventor: Hyuneok Shin , Kyeongsu Ko , Sanggab Kim , Hongsick Park , Sangwoo Sohn , Dokeun Song , Sangwon Shin , Sukyoung Yang , Dongmin Lee
IPC: H01L27/12
Abstract: A display panel includes: a base layer; a signal line disposed on the base layer, the signal line including: a first layer including aluminum; and a second layer directly disposed on the first layer, the second layer including a niobium-titanium alloy; a first thin film transistor connected to the signal line; a second thin film transistor disposed on the base layer; a capacitor electrically connected to the second thin film transistor; and a light emitting element electrically connected to the second thin film transistor.
-
公开(公告)号:US20220173177A1
公开(公告)日:2022-06-02
申请号:US17369877
申请日:2021-07-07
Applicant: Samsung Display Co., Ltd.
Inventor: Hyunmin Cho , Taesung Kim , Yunjong Yeo , Sanggab Kim , Daewon Choi
Abstract: An embodiment of a display device includes a substrate including a display area; an organic layer and having a protrusion protruding in a thickness direction of the substrate and overlapping the display area; a first electrode on the organic layer and overlapping the display area; a pixel defining layer covering the protrusion and an edge of the first electrode and having an opening portion overlapping the first electrode; an emission layer on the first electrode and overlapping the opening portion; and a second electrode on the emission layer, wherein the pixel defining layer includes an inorganic material, and a first distance from an upper surface of the substrate to a lower surface of the first electrode is less than a second distance from the upper surface of the substrate to an upper surface of the protrusion, the lower surface of the first electrode facing the upper surface of the substrate.
-
18.
公开(公告)号:US11211441B2
公开(公告)日:2021-12-28
申请号:US16199226
申请日:2018-11-26
Applicant: Samsung Display Co., LTD.
Inventor: Yu-Gwang Jeong , Subin Bae , Joongeol Lee , Sanggab Kim
Abstract: An OLED device includes a substrate, a first active layer, a first gate electrode, a second gate electrode, first source and first drain electrodes, a first high dielectric constant (high-k) insulation structure, and a light emitting structure. The substrate has a first region and a second region. The first active layer is disposed in the first region on the substrate. The first gate electrode is disposed on the first active layer, and has a first thickness. The second gate electrode is disposed on the first gate electrode. The first source electrode and first drain electrode are disposed on the second gate electrode, and constitutes a first semiconductor element together with the first active layer and the first gate electrode. The first high-k insulation structure is disposed between the first gate electrode and the second gate electrode, and is spaced apart from the first source electrode and first drain electrode.
-
公开(公告)号:US11183554B2
公开(公告)日:2021-11-23
申请号:US16709457
申请日:2019-12-10
Applicant: Samsung Display Co., Ltd.
Inventor: Dongmin Lee , Sangwoo Sohn , Sukyoung Yang , Dokeun Song , Kyeong Su Ko , Sanggab Kim , Sangwon Shin , Hyuneok Shin , Yunjong Yeo , Joongeol Lee
Abstract: A display device includes a first signal line including a first layer disposed on a substrate and containing aluminum (Al), a second layer disposed on the first layer and containing titanium nitride (TiNx), and a third layer disposed on the second layer and containing titanium (Ti), a second signal line crossing the first signal line, a first transistor including a first gate electrode connected to the first signal line and a first source electrode connected to the second signal line, and an organic light emitting diode disposed in a display area of the substrate to generate light corresponding to a data signal applied to the second signal line.
-
公开(公告)号:US20180375057A1
公开(公告)日:2018-12-27
申请号:US15834524
申请日:2017-12-07
Applicant: Samsung Display Co., Ltd.
Inventor: Hyuneok Shin , Chanwoo Yang , Juhyun Lee , Sanggab Kim , Joonyong Park , Seungwook Chang , Jinwook Jeong
Abstract: A light-emitting device may include a first electrode, a second electrode, and a light-emitting layer therebetween. The first electrode may include a reflection layer and a metal oxide layer provided on the reflection layer. The metal oxide layer may be provided between the reflection layer and the light-emitting layer. The metal oxide layer may include molybdenum dioxide and an oxide of a group-V element, and a content of the group-V element to a total amount of the metal oxide layer may range from 2 at % to 10 at.
-
-
-
-
-
-
-
-
-