p16 protein variant and use thereof for preventing or treating cancer
    11.
    发明授权
    p16 protein variant and use thereof for preventing or treating cancer 有权
    p16蛋白质变体及其用于预防或治疗癌症的用途

    公开(公告)号:US09573985B2

    公开(公告)日:2017-02-21

    申请号:US14615146

    申请日:2015-02-05

    CPC classification number: C07K14/4738 A61K38/00

    Abstract: A p16 protein variant; a polynucleotide encoding the p16 protein variant; a method for preparing the p16 protein variant; a pharmaceutical composition comprising the p16 protein variant; a method for preventing and/or treating cancer comprising administering the p16 protein variant to a subject; and use of the p16 protein variant in the prophylaxis and/or therapy of cancer.

    Abstract translation: p16蛋白变体; 编码p16蛋白质变体的多核苷酸; 制备p16蛋白质变体的方法; 包含p16蛋白质变体的药物组合物; 一种用于预防和/或治疗癌症的方法,其包括将p16蛋白质变体施用于受试者; 以及在预防和/或治疗癌症中使用p16蛋白质变体。

    Semiconductor device and method of fabricating the same

    公开(公告)号:US11830737B2

    公开(公告)日:2023-11-28

    申请号:US17520634

    申请日:2021-11-06

    CPC classification number: H01L21/0338 H01L21/0335 H01L21/0337

    Abstract: Disclosed are semiconductor device fabricating method and semiconductor device fabricated by the same. The method includes forming on a lower mask layer first upper mask patterns and sacrificial spacers that cover sidewalls of the first upper mask patterns, forming first holes in the lower mask layer below the first upper mask patterns, forming second holes in the lower mask layer not covered by the first upper mask patterns and the sacrificial spacers, forming second upper mask patterns filling a space between the sacrificial spacers on the lower mask layer and also forming sacrificial patterns filling the first and second holes, removing the sacrificial spacers, using the first and second upper mask patterns to etch the lower mask layer, and removing the sacrificial patterns.

Patent Agency Ranking