公开(公告)号：US20230375463A1

公开(公告)日：2023-11-23

申请号：US18082040

申请日：2022-12-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seoyeon JEONG ,  Seungwoo LEE ,  Inho SHIN ,  Wookrae KIM ,  Myungjun LEE ,  Jaehwang JUNG

IPC: G01N21/21 ,  G02B27/28 ,  G01N21/956 ,  G01B11/24

CPC classification number: G01N21/211 ,  G02B27/283 ,  G01N21/956 ,  G01B11/2441 ,  G01B2210/56

Abstract: A semiconductor measurement apparatus includes an illumination unit configured to provide illumination light including linearly polarized light beams having different wavelengths, an optical unit including an objective lens configured to allow the illumination light to be incident on a sample, the optical unit being configured to transmit reflection light generated when the illumination light is reflected from the sample, a self-interference generator configured to self-interfere the reflection light transmitted from the optical unit and transmit the reflection light to a first image sensor, for each wavelength, and a controller. The controller is configured to process a measurement image output by the image sensor to divide the measurement image into a first image representing an intensity ratio of a polarization component of the reflection light and a second image representing a phase difference of the polarization component of the reflection light, for each wavelength.

公开(公告)号：US20230186460A1

公开(公告)日：2023-06-15

申请号：US18060830

申请日：2022-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Myungjun LEE ,  Jinseob KIM ,  Wookrae KIM ,  Jinyong KIM ,  Jaehwang JUNG ,  Sungho JANG

IPC: G06T7/00 ,  H04N23/56 ,  H04N23/10

CPC classification number: G06T7/001 ,  H04N23/56 ,  H04N23/10 ,  H01L27/108

Abstract: A semiconductor measurement device may include an illumination apparatus having a polarizer on a propagation path of light output from a light source; an optical assembly including an objective lens configured to allow light passing through the polarizer to be incident on a sample and a beam splitter configured to transmit light reflected from the sample to first and second sensors; and a controller. The controller may be configured to determine an alignment state of patterns in a first region of the sample using a first original image output by the first sensor and an alignment state of patterns in a second region of the sample using a second original image output by the second sensor. The first sensor includes a first image sensor and a self-interference generator in a path along which light is incident on the first image sensor. The second sensor includes a second image sensor.

公开(公告)号：US20230114817A1

公开(公告)日：2023-04-13

申请号：US17857291

申请日：2022-07-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Inho SHIN ,  Wookrae KIM ,  Changhyeong YOON ,  Myungjun LEE ,  Heonju SHIN ,  Sangil IM ,  Sungho JANG

IPC: G06T7/62 ,  G06T7/00

Abstract: A semiconductor measurement apparatus includes an illumination unit including a light source, and a polarizer disposed on a propagation path of light emitted from the light source; an optical unit configured to direct the light passing through the polarizer to be incident onto a sample, and to transmit the light, reflected from the sample, to an image sensor; and a controller configured to process an original image, output by the image sensor, to determine a critical dimension of a structure included in a region of the sample on which the light is incident. The controller acquires a two-dimensional image. The controller orthogonally decomposes the two-dimensional image corresponding to a selected wavelength into a plurality of bases, generates one-dimensional data including a plurality of weights corresponding to the plurality of bases, and uses the one-dimensional data to determine a selected critical dimension among critical dimensions of the structure.