公开(公告)号：US20050045276A1

公开(公告)日：2005-03-03

申请号：US10922565

申请日：2004-08-19

申请人： Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

发明人： Satyadev Patel ,  Andrew Huibers ,  Gregory Schaadt ,  Peter Heureux

IPC分类号： B81B3/00 ,  C23F1/00 ,  H01L21/00 ,  H01L21/302 ,  H01L21/306 ,  H01L21/461

CPC分类号： B81C1/00476 ,  B81C1/00547 ,  B81C2201/0109 ,  B81C2201/0132 ,  B81C2201/0133 ,  B81C2201/112 ,  B82Y30/00

摘要： An etching method, such as for forming a micromechanical device, is disclosed. One embodiment of the method is for releasing a micromechanical structure, comprising, providing a substrate; providing a sacrificial layer directly or indirectly on the substrate; providing one or more micromechanical structural layers on the sacrificial layer; performing a first etch to remove a portion of the sacrificial layer, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of the sacrificial layer; performing a second etch to remove additional sacrificial material in the sacrificial layer, the second etch comprising providing a gas that chemically but not physically etches the additional sacrificial material. Another embodiment of the method is for etching a silicon material on or within a substrate, comprising: performing a first etch to remove a portion of the silicon, the first etch comprising providing an etchant gas and energizing the etchant gas so as to allow the etchant gas to physically, or chemically and physically, remove the portion of silicon; performing a second etch to remove additional silicon, the second etch comprising providing an etchant gas that chemically but not physically etches the additional silicon.

摘要翻译： 公开了一种诸如用于形成微机械装置的蚀刻方法。 该方法的一个实施例是用于释放微机械结构，包括：提供衬底; 在衬底上直接或间接提供牺牲层; 在所述牺牲层上提供一个或多个微机械结构层; 执行第一蚀刻以去除牺牲层的一部分，所述第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体，以允许蚀刻剂气体在物理或化学和物理上移除牺牲层的该部分; 执行第二蚀刻以去除牺牲层中的附加牺牲材料，第二蚀刻包括提供化学上但不物理蚀刻附加牺牲材料的气体。 该方法的另一实施例是用于在衬底上或衬底内蚀刻硅材料，包括：执行第一蚀刻以去除硅的一部分，第一蚀刻包括提供蚀刻剂气体并激发蚀刻剂气体以允许蚀刻剂 物理或化学和物理的气体去除硅的部分; 执行第二蚀刻以去除附加的硅，第二蚀刻包括提供蚀刻剂气体，其化学地但不物理地蚀刻附加的硅。

公开(公告)号：US08693082B2

公开(公告)日：2014-04-08

申请号：US12853411

申请日：2010-08-10

申请人： Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

发明人： Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

IPC分类号： G02B26/00 ,  G02B26/08

CPC分类号： G02B26/0841 ,  B81C3/001 ,  Y10S359/90 ,  Y10T156/10

摘要： The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

摘要翻译： 本发明提供了一种微结构器件，其包括多个衬底，其中器件的部件形成在衬底上。 为了保持基板之间的间隙的均匀性，提供并分布在间隙中的多个支柱以防止间隙尺寸的减小。 可以通过将支柱结合到微结构的部件来防止间隙尺寸的增加。 或者，可以通过将间隙内的压力维持在微结构将在其中操作的压力以下来防止间隙尺寸的增加。 形成微反射镜和电极的基板的电接触可以通过许多方式制成，例如电接触区域，电接触焊盘和电接触弹簧。

公开(公告)号：US07697193B2

公开(公告)日：2010-04-13

申请号：US11853812

申请日：2007-09-11

申请人： Andrew Huibers ,  Satyadev Patel

发明人： Andrew Huibers ,  Satyadev Patel

IPC分类号： G02B26/00

CPC分类号： G02B26/0841

摘要： A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

摘要翻译： 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

公开(公告)号：US20090190825A1

公开(公告)日：2009-07-30

申请号：US12360083

申请日：2009-01-26

申请人： Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

发明人： Igor Volfman ,  Andrew Huibers ,  Satyadev Patel ,  Peter Richards ,  Leonid Frenkel ,  Jim Dunphy ,  Regis Grasser ,  Greg Schaadt

IPC分类号： G06K9/00 ,  G01J1/42

CPC分类号： G01N21/55 ,  G01N21/95

摘要： The invention provides a method and apparatus for evaluating the product quality and performances of micromirror array devices through measurements of the electromechanical responses of the individual micromirrors to the driving forces of electric fields. The electromechanical responses of the micromirrors according to the present invention are described in terms of the rotational angles associated with the operational states, such as the ON and OFF state angles of the ON and OFF state when the micromirror array device is operated in the binary-state mode, and the response speed (i.e. the time interval required for a micromirror device to transit form one state to another) of the individual micromirrors to the driving fields.

摘要翻译： 本发明提供一种用于通过测量各个微镜对电场驱动力的机电响应来评估微镜阵列器件的产品质量和性能的方法和装置。 根据本发明的微反射镜的机电响应以与操作状态相关联的旋转角度进行描述，例如当微镜阵列器件在二进制编码器中操作时，ON和OFF状态的ON和OFF状态角， 状态模式以及各个微镜对驱动场的响应速度（即，微镜器件从一个状态转移到另一个状态所需的时间间隔）。

公开(公告)号：US07557932B2

公开(公告)日：2009-07-07

申请号：US11110338

申请日：2005-04-19

申请人： Jonathan Doan ,  Regis Grasser ,  Satyadev Patel ,  Andrew Huibers ,  Igor Volfman

发明人： Jonathan Doan ,  Regis Grasser ,  Satyadev Patel ,  Andrew Huibers ,  Igor Volfman

IPC分类号： G01B9/02

CPC分类号： G02B26/001 ,  G02B26/0841

摘要： The invention provides a method and apparatus for evaluating the quality of microelectromechanical devices having deformable and deflectable members using resonation techniques. Specifically, product quality characterized in terms of uniformity of the deformable and deflectable elements is inspected with an optical resonance mapping mechanism on a wafer-level.

摘要翻译： 本发明提供一种用于使用谐振技术来评估具有可变形和可偏转构件的微机电装置的质量的方法和装置。 具体地说，利用晶片级上的光学共振映射机构来检查以可变形和可偏转元件的均匀性为特征的产品质量。

公开(公告)号：US07498648B2

公开(公告)日：2009-03-03

申请号：US11332594

申请日：2006-01-12

申请人： Peter Richards ,  Andrew Huibers ,  Satyadev Patel

发明人： Peter Richards ,  Andrew Huibers ,  Satyadev Patel

IPC分类号： G09G3/34

CPC分类号： B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

摘要： A projection system is disclosed herein. The projection system employs a spatial light modulator comprising an array of individually addressable pixels for modulating the incident light based on image data. The modulated light is projected on a screen for viewing.

摘要翻译： 本文公开了一种投影系统。 投影系统采用包括可单独寻址的像素阵列的空间光调制器，用于基于图像数据调制入射光。 调制光投影在屏幕上以供观看。

公开(公告)号：US20080049290A1

公开(公告)日：2008-02-28

申请号：US11853812

申请日：2007-09-11

申请人： Andrew Huibers ,  Satyadev Patel

发明人： Andrew Huibers ,  Satyadev Patel

IPC分类号： G02B26/00

CPC分类号： G02B26/0841

摘要： A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

摘要翻译： 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

公开(公告)号：US07295363B2

公开(公告)日：2007-11-13

申请号：US11102531

申请日：2005-04-08

申请人： Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

发明人： Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

IPC分类号： G02B26/00

CPC分类号： G02B26/0841

摘要： Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

摘要翻译： 这里公开的是操作包括微镜阵列的装置的方法。 该方法包括可用于在操作期间修复微镜阵列的粘性微镜的过程。 修复过程在ON状态下，对阵列中的微镜的镜板施加两个连续的刷新电压，其中脉冲在时间上比微镜的特征振荡时间长。 修复过程可独立应用于微镜。 或者，修复过程可以结合偏置反转过程。

公开(公告)号：US07268934B2

公开(公告)日：2007-09-11

申请号：US11327697

申请日：2006-01-05

申请人： Andrew Huibers ,  Satyadev Patel

发明人： Andrew Huibers ,  Satyadev Patel

IPC分类号： G02B26/00

CPC分类号： G02B26/0841

摘要： A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

摘要翻译： 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。

公开(公告)号：US20060266730A1

公开(公告)日：2006-11-30

申请号：US10805610

申请日：2004-03-18

申请人： Jonathan Doan ,  Satyadev Patel

发明人： Jonathan Doan ,  Satyadev Patel

IPC分类号： B44C1/22 ,  C23F1/00

CPC分类号： B81C1/00793 ,  B81B2201/042 ,  B81C2201/053

摘要： A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.

摘要翻译： 本文公开了微结构及其制造方法。 微结构具有结构构件，其中至少一个包括金属间化合物。 在制造这样的微结构时，采用牺牲材料。 在完成形成结构层之后，牺牲材料通过自发气相化学腐蚀剂除去。