公开(公告)号：US20150266233A1

公开(公告)日：2015-09-24

申请号：US14221165

申请日：2014-03-20

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Michael R. Feldbaum ,  Koichi Wago ,  Gennady Gauzner ,  Kim Y. Lee ,  David S. Kuo

IPC: B29C59/02 ,  B29D17/00 ,  G03F7/00 ,  G11B5/84 ,  B29C33/38

CPC classification number: C23F1/00 ,  B29C33/3842 ,  B29D17/00 ,  B29K2101/00 ,  B29K2909/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/09 ,  G03F7/2002 ,  G11B5/855 ,  Y10T428/24802 ,  Y10T428/24851 ,  Y10T428/24917

Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Abstract translation: 本文提供了一种包括基板的装置; 覆盖衬底的蚀刻停止层，其中蚀刻停止层基本上抵抗蚀刻条件; 以及覆盖在蚀刻停止层上的图案层，其中所述图案化层对于蚀刻条件基本不稳定，并且其中所述图案化层包括多个特征，所述特征包括高特征密度区域和低特征密度区域之间的基本一致的特征轮廓。