公开(公告)号：US20060164626A1

公开(公告)日：2006-07-27

申请号：US11387952

申请日：2006-03-23

Applicant: Steven Meeks ,  Mahendra Ramachandran ,  Alireza Moghadam

Inventor： Steven Meeks ,  Mahendra Ramachandran ,  Alireza Moghadam

IPC: G01N21/88

CPC classification number: G01B11/303 ,  G01N21/9501

Abstract: In one embodiment, a system for inspecting a first surface of a substrate, comprises a first reflected radiation collector to generate a first signal set representing one or more characteristics of radiation reflected from the first surface from a radiation source disposed in a first plane of incidence, a spatial filter in the radiation path between the surface and the first reflected radiation collector, a second reflected radiation collector to generate a second signal set representing one or more characteristics of radiation reflected from the first surface from a radiation source disposed in a first plane of incidence approximately orthogonal to the first plane of incidence, a spatial filter in the radiation path between the surface and the first reflected radiation collector, means for combining the first signal set and the second signal set to generate a signal set which represents one or more characteristics of the first surface, and means for processing the signal set to generate a data set representing one or more characteristics of the first surface.

Abstract translation: 在一个实施例中，用于检查衬底的第一表面的系统包括第一反射辐射收集器，以产生第一信号集合，其表示从设置在第一入射平面中的辐射源从第一表面反射的辐射的一个或多个特性 ，在表面和第一反射辐射收集器之间的辐射路径中的空间滤光器，第二反射辐射收集器，用于产生第二信号集合，其表示从设置在第一平面中的辐射源从第一表面反射的辐射的一个或多个特性 大致垂直于第一入射平面的入射光，在表面和第一反射辐射收集器之间的辐射路径中的空间滤光器，用于组合第一信号组和第二信号组的装置，以产生表示一个或多个 第一表面的特征，以及用于处理信号集合到属的装置 表示表示第一表面的一个或多个特征的数据集。

公开(公告)号：US20050057747A1

公开(公告)日：2005-03-17

申请号：US10973855

申请日：2004-10-25

Applicant: Steven Meeks

Inventor： Steven Meeks

IPC: G01B11/06 ,  G01B11/30 ,  H01L21/66 ,  G01N21/88

CPC classification number: G01B11/0616 ,  G01B11/0641 ,  G01B11/306 ,  H01L22/12

Abstract: Scratches, pits and particles which are smaller or larger than the beam size may be measured and identified by a dual beam technique. This invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction. The scattered light from radial and circumferential beams allows the detection and classification of particles, pits and scratches.

公开(公告)号：US20070153273A1

公开(公告)日：2007-07-05

申请号：US11681129

申请日：2007-03-01

Applicant: Steven Meeks

Inventor： Steven Meeks

IPC: G01J4/00

CPC classification number: G01N21/9501 ,  G01B11/0616 ,  G01B11/303 ,  G01B11/306 ,  G01N21/95607

Abstract: A material independent profiler system and method for measuring a slope on the surface of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed. In one embodiment, the system comprises an electromagnetic energy source to generate a beam of electromagnetic energy, a polarizer to polarize the beam of electromagnetic energy into a first component having a first polarization orientation and a second component having a second polarization orientation, a radiation targeting assembly to direct the first component onto the surface in a first direction and a first plane of orientation, direct the second component onto the surface in a second direction and a second plane of orientation, wherein the second direction is opposite the first direction, a radiation detector assembly to generate a first signal from a portion of the first component reflected from the surface, generate a second signal from a portion of the second component reflected from the surface, and a processor to generate a surface measurement from the first signal and the second signal.

Abstract translation: 公开了一种用于测量诸如薄膜盘，硅晶片或玻璃基板的物体表面上的斜率的材料独立的轮廓仪系统和方法。 在一个实施例中，系统包括产生电磁能束的电磁能源，将电磁能束偏振成具有第一极化取向的第一部件和具有第二极化取向的第二部件的偏振器， 组件，以将第一组分沿第一方向和第一取向平面引导到表面上，将第二组分沿第二方向和第二取向平面引导到表面上，其中第二方向与第一方向相反，辐射 检测器组件以从所述表面反射的所述第一分量的一部分产生第一信号，从所述表面反射的所述第二分量的一部分产生第二信号，以及处理器，用于从所述第一信号和所述第二信号产生表面测量值 信号。

公开(公告)号：US20070127016A1

公开(公告)日：2007-06-07

申请号：US11560477

申请日：2006-11-16

Applicant: Steven Meeks ,  Rusmin Kudinar ,  William Wheeler ,  Hung Nguyen ,  Vamsi Velidandla ,  Anoop Somanchi ,  Ronny Soetarman

Inventor： Steven Meeks ,  Rusmin Kudinar ,  William Wheeler ,  Hung Nguyen ,  Vamsi Velidandla ,  Anoop Somanchi ,  Ronny Soetarman

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01B11/303 ,  G01B11/306 ,  G01N21/21 ,  G01N21/211 ,  G01N21/55 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/556 ,  H01L22/12

Abstract: In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a radial motor to move an optical head in a radial direction to detect defects at locations displaced from the edge of the wafer, and a rotational motor to rotate the optical head around the edge of the wafer to detect defects on the edge of the wafer.

Abstract translation: 在一个实施例中，使用单个工具测量晶片表面和晶片边缘上的缺陷的系统包括径向马达以沿径向方向移动光学头以检测从晶片边缘移位的位置处的缺陷 以及旋转电动机，用于围绕晶片的边缘旋转光学头以检测晶片边缘上的缺陷。

公开(公告)号：US20060072126A1

公开(公告)日：2006-04-06

申请号：US11268215

申请日：2005-11-07

Applicant: Steven Meeks

Inventor： Steven Meeks

IPC: G01B11/28

CPC classification number: G01B11/0616 ,  G01N21/9501

Abstract: A system and method for measuring defects, film thickness, contamination, particles and height of a thin film disk or a silicon wafer. The system includes a processor for determining height. In addition to measuring the height the system can measure film thickness and defects through the measurement of the phase shift of optical signals. An optical profilometer is described which can measure topography on thin film disks, optical substrates or silicon wafers and whose output is independent of the reflectivity of the substrate. This material independent optical profilometer uses a retro-reflector to achieve reflectivity independence and to increase the height sensitivity to 8 times the height of the surface. The reflectivity independent optical profilometer achieves perfect cancellation of the slope of the surface while measuring the topography of the substrate.

Abstract translation: 用于测量薄膜盘或硅晶片的缺陷，膜厚度，污染物，颗粒和高度的系统和方法。 该系统包括用于确定高度的处理器。 除测量高度之外，系统还可以通过测量光信号的相移来测量膜的厚度和缺陷。 描述了可以测量薄膜盘，光学衬底或硅晶片上的形貌并且其输出与衬底的反射率无关的光学轮廓仪。 该材料独立的光学轮廓仪使用后向反射镜实现反射率独立性，并将高度灵敏度提高到表面高度的8倍。 反射率独立的光学轮廓仪在测量衬底的形貌的同时实现了表面斜率的完美消除。

公开(公告)号：US06624884B1

公开(公告)日：2003-09-23

申请号：US08840351

申请日：1997-04-28

Applicant: Wayne Isami Imaino ,  Anthony Juliana, Jr. ,  Milton Russell Latta ,  Charles H. Lee ,  Wai Cheung Leung ,  Hal J. Rosen ,  Steven Meeks ,  Richard Sonningfeld

Inventor： Wayne Isami Imaino ,  Anthony Juliana, Jr. ,  Milton Russell Latta ,  Charles H. Lee ,  Wai Cheung Leung ,  Hal J. Rosen ,  Steven Meeks ,  Richard Sonningfeld

IPC: G01N2188

CPC classification number: G01N21/88

Abstract: A laser based inspection tool (LIT) for inspecting planar surfaces is described. In a preferred embodiment the LIT can simultaneously inspect both planar surfaces of disks for use in disk drives. In an embodiment of the invention, light reflected from the surface at an angle slightly offset from perpendicular is routed through a telecentric lens to a detector which converts the intensity of the reflected beam into an analog signal. The analog signal is sampled and digitized to generate pixel data. A data acquisition system sequentially stores the pixel data in a buffer. A median filter and derivative analysis can be applied to the pixel data to detect deviations indicating defects. An optional calibration system periodically reflects the scanning beam back to a detector to form a reference signal for use in absolute reflectivity measurements.

Abstract translation: 描述了一种用于检查平面的激光检测工具（LIT）。 在优选实施例中，LIT可以同时检查用于磁盘驱动器的磁盘的两个平面表面。 在本发明的一个实施例中，从表面以从垂直方向稍微偏离的角度反射的光通过远心透镜被路由到检测器，该检测器将反射光束的强度转换为模拟信号。 模拟信号被采样并数字化以产生像素数据。 数据采集​​系统将像素数据顺序存储在缓冲器中。 中值滤波器和导数分析可以应用于像素数据，以检测指示缺陷的偏差。 可选的校准系统周期性地将扫描光束反射回检测器以形成用于绝对反射率测量的参考信号。