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    Gas Supply Facility Of A Chamber And A Fethod For An Internal Pressure Control Of The Chamber For Which The Facility Is Employed
    13.
    发明申请
    Gas Supply Facility Of A Chamber And A Fethod For An Internal Pressure Control Of The Chamber For Which The Facility Is Employed 有权
    商会气体供应设施及设施使用室内部压力控制的方法

    公开(公告)号：US20070193628A1

    公开(公告)日：2007-08-23

    申请号：US10566495

    申请日：2004-07-28

    申请人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

    发明人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

    IPC分类号： G05D7/06

    CPC分类号： G05D7/0652 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

    摘要： The present invention makes it possible to prevent substantial reduction of flow rate control accuracy in a small flow quantity range, to achieve an accurate flow rate control over the entire range of a flow rate control, and also to allow control of a wide pressure range of a chamber with an accurate flow rate control. Namely, with a gas supply facility having a plurality of pressure type flow controllers connected in parallel and a controller to control operation of pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, one pressure type flow controller is made to be a controller to control a gas flow rate range up to 10% of the maximum flow rate to be supplied to a chamber, while the remaining pressure type flow controllers are made to be ones to control the rest of the gas flow rate range.

    摘要翻译： 本发明使得可以防止在小流量范围内的流量控制精度的显着降低，从而在流量控制的整个范围内实现精确的流量控制，并且还可以控制宽的压力范围 具有精确流量控制的室。 也就是说，具有并联连接的多个压力式流量控制器的气体供给装置和控制器，用于控制压力式流量控制器的操作，以在控制其流量的同时将由真空泵排出的所需气体供应到腔室，一个压力 型流量控制器被制成控制器，以控制最高流量的10％的气体流量范围供给到室，而剩余的压力式流量控制器被制成控制其余的 气体流量范围。

    Gas supply facility of a chamber and a method for an internal pressure control of the chamber for which the facility is employed
    14.
    发明授权
    Gas supply facility of a chamber and a method for an internal pressure control of the chamber for which the facility is employed 有权
    室的气体供应设备和用于对其进行设备的室的内部压力控制的方法

    公开(公告)号：US07594517B2

    公开(公告)日：2009-09-29

    申请号：US10566495

    申请日：2004-07-28

    申请人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

    发明人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

    IPC分类号： G05D7/06

    CPC分类号： G05D7/0652 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

    摘要： The present invention prevents substantial reduction of flow rate control accuracy in a small flow quantity range, achieves accurate flow rate control over the entire range of flow rate control, and also allows control of a wide pressure range of a chamber with accurate flow rate control. Specifically, a gas supply facility having a plurality of pressure type flow controllers connected in parallel, and a third controller to control operation of the pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, is provided wherein one pressure type flow controller is a controller used to control a gas flow rate range up to 10% of the maximum flow rate supplied to the chamber, while the remaining pressure type flow controllers are made to be ones controlling the rest of the gas flow rate range.

    摘要翻译： 本发明防止了在小流量范围内的流量控制精度的显着降低，在整个流量控制范围内实现精确的流量控制，并且还允许以精确的流量控制来控制腔室的宽压力范围。 具体而言，具有并联连接的多个压力式流量控制器的气体供给装置和控制压力式流量控制器的动作的第三控制装置，在控制其流量的同时将由真空泵排出的期望气体供给到室， 其中一个压力式流量控制器是用于控制高达提供给腔室的最大流量的10％的气体流量范围的控制器，而剩余的压力型流量控制器被制成控制其余的 气体流量范围。

    Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers
    15.
    发明授权
    Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers 有权
    用于检测压力型流量控制器孔堵塞的方法和装置

    公开(公告)号：US06302130B1

    公开(公告)日：2001-10-16

    申请号：US09529985

    申请日：2000-07-18

    申请人： Tadahiro Ohmi ,  Seiichi Iida ,  Satoshi Kagatsume ,  Jun Hirose ,  Kouji Nishino ,  Nobukazu Ikeda ,  Michio Yamaji ,  Ryousuke Dohi ,  Kazuhiro Yoshikawa ,  Mutsunori Koyomogi ,  Tomio Uno ,  Eiji Ideta ,  Takashi Hirose

    发明人： Tadahiro Ohmi ,  Seiichi Iida ,  Satoshi Kagatsume ,  Jun Hirose ,  Kouji Nishino ,  Nobukazu Ikeda ,  Michio Yamaji ,  Ryousuke Dohi ,  Kazuhiro Yoshikawa ,  Mutsunori Koyomogi ,  Tomio Uno ,  Eiji Ideta ,  Takashi Hirose

    IPC分类号： F17D116

    CPC分类号： G05D7/0635 ,  Y10T137/0396 ,  Y10T137/7759 ,  Y10T137/7761 ,  Y10T137/8326

    摘要： A method and apparatus for detection of clogging of an orifice by measuring the upstream side pressure without breaking up the piping system in a flow rate control unit using an orifice, so as to extend the life of the flow rate control unit and enhance its safety. The apparatus of detecting clogging of an orifice in a pressure-type flow rate controller has a control valve (CV), an orifice (2), a pressure detector (14) for measuring the upstream pressure P1 therebetween, and a flow rate setting circuit (32) wherein, with the upstream pressure P1 maintained about two or more times higher than the downstream pressure P2, the downstream flow rate QC is calculated with the equation QC=KP1 (K=constant) and wherein the control valve (CV) is controlled by the difference signal QY between the calculated flow rate QC and the set flow rate QS. The apparatus comprises: a storage memory M memorizing standard pressure attenuation data Y(t) of the upstream pressure P1 measured with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) not clogged, a pressure detector (14) for determination of the pressure attenuation data P(t) of the upstream pressure P1 with the flow rate switched from the high set flow rate QSH to the low set flow rate QSL with the orifice (2) in the actual conditions, a central processing unit CPU for checking the pressure attenuation data P(t) against standard pressure attenuation data Y(t), and an alarm circuit (46) that turns on a clogging alarm when the pressure attenuation data P(t) deviates from standard pressure attenuation data Y(t) to a specific degree or beyond that.

    摘要翻译： 一种用于通过测量上游侧压力而不破坏使用孔口的流量控制单元中的管道系统来检测孔口堵塞的方法和装置，以延长流量控制单元的寿命并提高其安全性。 检测压力型流量控制器中的孔口堵塞的装置具有控制阀（CV），用于测量其上游压力P1的孔口（2），压力检测器（14）和流量设定电路 （32）其中，在上游压力P1保持大于下游压力P2的两倍或更多倍的情况下，下游流量QC用等式QC = KP1（K =常数）计算，并且其中控制阀（CV）为 由计算流量QC和设定流量QS之间的差分信号QY控制。 该装置包括：存储存储器M，存储以从高设定流量QSH切换到低设定流量QSL的流量测量的上游压力P1的标准压力衰减数据Y（t），其中孔口（2）没有堵塞 ，用于确定上游压力P1的压力衰减数据P（t）的压力检测器（14），其中流量从高设定流量QSH切换到具有孔口（2）的低设定流量QSL 实际情况是用于根据标准压力衰减数据Y（t）检测压力衰减数据P（t）的中央处理单元CPU以及当压力衰减数据P（t）偏离时引起堵塞报警的报​​警电路（46） 从标准压力衰减数据Y（t）到特定程度或以上。

    Pressure-type flow rate control apparatus
    16.
    发明授权
    Pressure-type flow rate control apparatus 有权
    压力式流量控制装置

    公开(公告)号：US06152168A

    公开(公告)日：2000-11-28

    申请号：US284352

    申请日：1999-05-24

    申请人： Tadahiro Ohmi ,  Tetu Kagazume ,  Kazuhiko Sugiyama ,  Ryousuke Dohi ,  Tomio Uno ,  Kouji Nishino ,  Hiroyuki Fukuda ,  Nobukazu Ikeda ,  Michio Yamaji

    发明人： Tadahiro Ohmi ,  Tetu Kagazume ,  Kazuhiko Sugiyama ,  Ryousuke Dohi ,  Tomio Uno ,  Kouji Nishino ,  Hiroyuki Fukuda ,  Nobukazu Ikeda ,  Michio Yamaji

    IPC分类号： F16K17/22 ,  G05D7/06

    CPC分类号： G05D7/0647 ,  Y10T137/7759 ,  Y10T137/7761

    摘要： A pressure-type flow rate control apparatus for use especially in the gas supply system in semiconductor manufacturing facilities. The flow control apparatus is provided with a bore-variable orifice, which permits easy switching of the fluid flow rate control range as well as size reduction of the pressure-type flow control apparatus, and offers other advantages including improved gas replaceability, prevention of dust formation, and reduced manufacturing costs of the flow control system. The apparatus comprises an orifice, a control valve provided on the upstream side of the orifice, a pressure detector provided between the control valve and the orifice, and a control unit to calculate a fluid flow rate Q on the basis of a pressure P1 detected by the pressure detector with the equation Q=KP1 (K=constant) and to output in a drive for the control valve the difference between the set flow rate signal Qs and the calculated flow rate signal Q as control signal Qy, wherein the pressure P1 on the upstream side of the orifice is regulated by actuating the control valve for controlling the flow rate of the fluid downstream of the orifice with the ratio P2/P1 between the pressure P1 on the upstream side of the orifice and the downstream pressure P2 maintained at not higher than the ratio of the critical pressure of the controlled fluid, characterized in that a direct touch type metal diaphragm valve unit functions as the orifice and that the ring-shaped gap between the valve seat and the diaphragm serves a variable orifice wherein the gap is adjusted by the orifice drive.

    摘要翻译： PCT No.PCT / JP98 / 03620 Sec。 371日期1999年5月24日 102（e）日期1999年5月24日PCT提交1998年8月13日PCT公布。 公开号WO99 /​​ 09463 日期1999年2月25日一种特别用于半导体制造设备中的气体供给系统的压力式流量控制装置。 流量控制装置设置有可变孔口，其允许容易地切换流体流量控制范围以及压力型流量控制装置的尺寸减小，并且提供其它优点，包括改进的气体替换性，防止灰尘 形成和降低流量控制系统的制造成本。 该装置包括孔口，设置在孔口的上游侧的控制阀，设置在控制阀和孔口之间的压力检测器，以及控制单元，用于根据检测到的压力P1计算流体流量Q 压力检测器具有等式Q = KP1（K =常数），并且在控制阀的驱动器中输出设定流量信号Qs和计算流量信号Q之间的差作为控制信号Qy，其中压力P1 on 孔口的上游侧通过致动用于控制孔口下游流体的流速的控制阀来调节，孔口上游侧的压力P1与保持在不同的孔口的下游压力P2之间的比率P2 / P1 高于受控流体的临界压力的比例，其特征在于，直接触摸式金属隔膜阀单元用作孔口，并且阀海之间的环形间隙 并且隔膜用于可变孔口，其中间隙由孔口驱动器调节。

    Gas supply system equipped with pressure-type flow rate control unit
    18.
    发明授权
    Gas supply system equipped with pressure-type flow rate control unit 有权
    供气系统配有压力式流量控制单元

    公开(公告)号：US06289923B1

    公开(公告)日：2001-09-18

    申请号：US09463514

    申请日：2000-06-02

    申请人： Tadahiro Ohmi ,  Satoshi Kagatsume ,  Nobukazu Ikeda ,  Kouji Nishino ,  Kazuhiro Yoshikawa ,  Eiji Ideta ,  Ryousuke Dohi ,  Tomio Uno ,  Michio Yamaji

    发明人： Tadahiro Ohmi ,  Satoshi Kagatsume ,  Nobukazu Ikeda ,  Kouji Nishino ,  Kazuhiro Yoshikawa ,  Eiji Ideta ,  Ryousuke Dohi ,  Tomio Uno ,  Michio Yamaji

    IPC分类号： G05D706

    CPC分类号： G05D7/0635 ,  Y10T137/7759 ,  Y10T137/7761

    摘要： An improved and reduced-size and low-cost gas supply system equipped with a pressure-type flow rate control unit, to be used, for instance, in semiconductor manufacturing facilities is disclosed. Transient flow rate characteristics are improved to prevent the gas from overshooting when the gas supply is started, and to raise the flow rate control accuracy and reliability of facilities. That eliminates non-uniformity of products or semiconductors and raises the production efficiency. The gas supply system equipped with a pressure-type flow rate control unit is so configured that with the pressure on the upstream side of the orifice held about twice or more higher than the downstream side pressure, the gas flow rate is controlled to supply the gas to a gas-using process through an orifice-accompanying valve, the gas supply system comprising a control valve to receive gas from the gas supply source, an orifice-accompanying valve provided on the downstream side of the control valve, a pressure detector provided between the control valve and the orifice-accompanying valve, an orifice provided on the downstream side of the valve mechanism of the orifice-accompanying valve and a calculation control unit where on the basis of the pressure P1 detected by the pressure detector, the flow rate Qc is calculated with an equation Qc=KP1 (K: constant) and the difference between the flow-rate specifying signal Qs and the calculated flow rate Qc is then input as control signal Qy in the drive for the control valve, thereby regulating the opening of the control valve for adjusting the pressure P1 so that the flow rate of the gas to supply can be controlled.

    摘要翻译： 公开了一种改进的，尺寸较小的低成本的气体供应系统，其配备有例如半导体制造设备中使用的压力式流量控制单元。 提高瞬态流量特性，防止气体开始时气体过冲，提高设备的流量控制精度和可靠性。 这消除了产品或半导体的不均匀性并提高了生产效率。 配置有压力式流量控制单元的气体供给系统被配置为使得在孔口的上游侧的压力保持为比下游侧压力高大约两倍或更多的气体，气体流量被控制以供应气体 通过孔口相关阀进行气体使用过程，所述气体供应系统包括用于接收来自气体供应源的气体的控制阀，设置在控制阀的下游侧的孔附件阀，设置在控制阀之间的压力检测器 所述控制阀和所述节流孔相关阀，设置在所述节流阀相关阀的阀机构的下游侧的孔口和计算控制单元，其中，基于由所述压力检测器检测到的压力P1，流量Qc 用公式Qc = KP1（K：常数）计算，然后输入流量指定信号Qs和计算流量Qc之间的差作为控制信号Qy i n是用于控制阀的驱动器，由此调节用于调节压力P1的控制阀的打开，从而可以控制供给气体的流量。

    Orifice for pressure type flow rate control unit and process for manufacturing orifice
    19.
    发明授权
    Orifice for pressure type flow rate control unit and process for manufacturing orifice 有权
    用于压力式流量控制单元的孔口和用于制造孔口的工艺

    公开(公告)号：US06158679A

    公开(公告)日：2000-12-12

    申请号：US284372

    申请日：1999-06-16

    申请人： Tadahiro Ohmi ,  Tetu Kagazume ,  Kazuhiko Sugiyama ,  Osamu Fukada ,  Susumu Ozawa ,  Yoshihiro Satou ,  Ryousuke Dohi ,  Tomio Uno ,  Kouji Nishino ,  Hiroyuki Fukuda ,  Nobukazu Ikeda ,  Michio Yamaji

    发明人： Tadahiro Ohmi ,  Tetu Kagazume ,  Kazuhiko Sugiyama ,  Osamu Fukada ,  Susumu Ozawa ,  Yoshihiro Satou ,  Ryousuke Dohi ,  Tomio Uno ,  Kouji Nishino ,  Hiroyuki Fukuda ,  Nobukazu Ikeda ,  Michio Yamaji

    IPC分类号： G01F1/40 ,  G05D7/01 ,  A62C31/02

    CPC分类号： G01F1/40 ,  G05D7/0186

    摘要： An orifice for a pressure-type flow rate controller, which can be produced by a simple method at a low cost, that provides a linearity--between the pressure P1 on the upstream side of the orifice and the flow rate--over a wide range of the pressure ratio P2/P1 of the pressure P2 on the downstream side of the orifice to the upstream pressure P1 and that permits adjustment with ease of flow characteristics among a plurality of orifices. The orifice comprises an inlet taper 1 in the shape of a bugle and a short narrowed straight section 2 adjoining the inlet taper 1, both formed by cutting one opening end of a preliminary hole 6 made in an orifice plate D, and further comprises a short inner taper 3 and an enlarged straight section 4 connecting with the taper 3 which are formed by enlarging the preliminary hole 6 at the other opening end, the short inner taper 3 adjoining the narrowed straight section 2 on one side and neighboring the enlarged straight section 4 on the other side.

    摘要翻译： PCT No.PCT / JP98 / 03621 Sec。 371日期1999年6月16日第 102（e）1999年6月16日PCT PCT 1998年8月13日PCT公布。 出版物WO99 /​​ 09324 日期1999年2月25日，一种用于压力式流量控制器的孔口，其可以通过简单的方法以低成本生产，其在孔口上游侧的压力P1和流量 - 在孔的下游侧的压力P2的压力比P2 / P1的宽范围到上游压力P1，并且允许在多个孔中容易地调节流动特性。 孔口包括一个具有插针形状的入口锥形1和邻近入口锥形1的短缩窄直线部分2，两者都是通过切割在孔板D中制成的预备孔6的一个开口端而形成的，还包括一个短 内圆锥体3和与锥体3连接的扩大的直线部分4，其通过在另一个开口端扩大预备孔6而形成，短内锥形件3在一侧邻接变窄的直线部分2并且与扩大的直线部分4相邻 另一方面。