Semiconductor Device and Methods of Manufacture

    公开(公告)号:US20220302065A1

    公开(公告)日:2022-09-22

    申请号:US17206442

    申请日:2021-03-19

    Abstract: In an embodiment, a method includes forming a conductive feature adjacent to a substrate; treating the conductive feature with a protective material, the protective material comprising an inorganic core with an organic coating around the inorganic core, the treating the conductive feature comprising forming a protective layer over the conductive feature; and forming an encapsulant around the conductive feature and the protective layer. In another embodiment, the method further includes, before forming the encapsulant, rinsing the protective layer with water. In another embodiment, the protective layer is selectively formed over the conductive feature.

Patent Agency Ranking