-
公开(公告)号:US20230317664A1
公开(公告)日:2023-10-05
申请号:US18330616
申请日:2023-06-07
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hung-Chun Cho , Sih-Hao Liao , Yu-Hsiang Hu , Hung-Jui Kuo
IPC: H01L23/00 , H01L23/29 , H01L23/31 , H01L25/065 , H01L21/56 , H01L23/48 , H01L23/538
CPC classification number: H01L24/20 , H01L23/293 , H01L23/3142 , H01L23/3135 , H01L25/0655 , H01L21/56 , H01L23/481 , H01L24/13 , H01L23/5384 , H01L2924/37001 , H01L2224/2101 , H01L2924/35121
Abstract: In an embodiment, a device includes: a semiconductor die including a semiconductor material; a through via adjacent the semiconductor die, the through via including a metal; an encapsulant around the through via and the semiconductor die, the encapsulant including a polymer resin; and an adhesion layer between the encapsulant and the through via, the adhesion layer including an adhesive compound having an aromatic compound and an amino group, the amino group bonded to the polymer resin of the encapsulant, the aromatic compound bonded to the metal of the through via, the aromatic compound being chemically inert to the semiconductor material of the semiconductor die.
-
公开(公告)号:US20200083189A1
公开(公告)日:2020-03-12
申请号:US16413591
申请日:2019-05-15
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Wei-Chih Chen , Hung-Jui Kuo , Yu-Hsiang Hu , Sih-Hao Liao , Po-Han Wang , Yung-Chi Chu , Hung-Chun Cho
IPC: H01L23/00 , H01L23/31 , H01L23/498 , H01L23/538 , H01L21/48 , H01L21/56 , H01L25/00 , H01L25/065 , H01L21/683 , C09J165/00
Abstract: A package structure includes a semiconductor die and a redistribution circuit structure. The redistribution circuit structure is disposed on and electrically connected to the semiconductor die and includes a patterned conductive layer, a dielectric layer, and an inter-layer film. The dielectric layer is disposed on the patterned conductive layer. The inter-layer film is sandwiched between the dielectric layer and the patterned conductive layer, and the patterned conductive layer is separated from the dielectric layer through the inter-layer film.
-
公开(公告)号:US20240395757A1
公开(公告)日:2024-11-28
申请号:US18791201
申请日:2024-07-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hung-Chun Cho , Hung-Jui Kuo , Yu-Hsiang Hu , Sih-Hao Liao
Abstract: In an embodiment, a method includes forming a conductive feature adjacent to a substrate; treating the conductive feature with a protective material, the protective material comprising an inorganic core with an organic coating around the inorganic core, the treating the conductive feature comprising forming a protective layer over the conductive feature; and forming an encapsulant around the conductive feature and the protective layer. In another embodiment, the method further includes, before forming the encapsulant, rinsing the protective layer with water. In another embodiment, the protective layer is selectively formed over the conductive feature.
-
公开(公告)号:US11605607B2
公开(公告)日:2023-03-14
申请号:US17206442
申请日:2021-03-19
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hung-Chun Cho , Hung-Jui Kuo , Yu-Hsiang Hu , Sih-Hao Liao
Abstract: In an embodiment, a method includes forming a conductive feature adjacent to a substrate; treating the conductive feature with a protective material, the protective material comprising an inorganic core with an organic coating around the inorganic core, the treating the conductive feature comprising forming a protective layer over the conductive feature; and forming an encapsulant around the conductive feature and the protective layer. In another embodiment, the method further includes, before forming the encapsulant, rinsing the protective layer with water. In another embodiment, the protective layer is selectively formed over the conductive feature.
-
公开(公告)号:US20220302065A1
公开(公告)日:2022-09-22
申请号:US17206442
申请日:2021-03-19
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hung-Chun Cho , Hung-Jui Kuo , Yu-Hsiang Hu , Sih-Hao Liao
IPC: H01L23/00 , H01L25/18 , H01L25/065 , H01L25/00
Abstract: In an embodiment, a method includes forming a conductive feature adjacent to a substrate; treating the conductive feature with a protective material, the protective material comprising an inorganic core with an organic coating around the inorganic core, the treating the conductive feature comprising forming a protective layer over the conductive feature; and forming an encapsulant around the conductive feature and the protective layer. In another embodiment, the method further includes, before forming the encapsulant, rinsing the protective layer with water. In another embodiment, the protective layer is selectively formed over the conductive feature.
-
公开(公告)号:US11270927B2
公开(公告)日:2022-03-08
申请号:US16547590
申请日:2019-08-22
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor: Hung-Chun Cho , Hung-Jui Kuo , Yu-Hsiang Hu , Sih-Hao Liao , Wei-Chih Chen
IPC: H01L23/48 , H01L21/56 , H01L21/768 , H01L23/31 , H01L23/00
Abstract: A package structure and method of forming the same are provided. The package structure includes a die, a TIV, an encapsulant, an adhesion promoter layer, a RDL structure and a conductive terminal. The TIV is laterally aside the die. The encapsulant laterally encapsulates the die and the TIV. The adhesion promoter layer is sandwiched between the TIV and the encapsulant. The RDL structure is electrically connected to the die and the TIV. The conductive terminal is electrically connected to the die through the RDL structure.
-
-
-
-
-