公开(公告)号：US12078933B2

公开(公告)日：2024-09-03

申请号：US17501848

申请日：2021-10-14

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tai-Yu Chen ,  Shang-Chieh Chien ,  Sheng-Kang Yu ,  Li-Jui Chen ,  Heng-Hsin Liu

IPC: G03F7/00 ,  G06N20/00

CPC classification number: G03F7/70033 ,  G03F7/70025 ,  G03F7/709 ,  G06N20/00

Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a collector and a plurality of vibration sensors coupled to the collector. The vibration sensors generate sensor signals indicative of shockwaves from laser pulses and impacts from debris. The system utilizes the sensor signals to improve the quality of EUV light generation.

公开(公告)号：US10156794B1

公开(公告)日：2018-12-18

申请号：US15692098

申请日：2017-08-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-Kang Yu ,  Yu-Fu Lin ,  Chia-Chen Chen

IPC: G01C15/10 ,  G02B26/08 ,  G01B11/27 ,  G03F7/20 ,  H01L21/033 ,  H01L21/308 ,  H01L21/68 ,  G01B11/16 ,  G01B11/26 ,  G01D5/26 ,  G03F7/00

Abstract: Positioning devices and positioning methods are provided. The positioning device includes a laser source and an optical assembly. The optical assembly is configured to direct a laser beam projected from the laser source toward a floor and a ceiling of a semiconductor fabrication facility to generate a first laser line on the floor and a second laser line on the ceiling. The first laser line and the second laser line are parallel to and aligned with each other when viewed in a direction perpendicular to the floor and the ceiling. Accordingly, the first laser line and the second laser line can be used to align a semiconductor tool and an overhead hoist transport system in the semiconductor fabrication facility.