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公开(公告)号：US20080210889A1
公开(公告)日：2008-09-04
申请号：US12073001
申请日：2008-02-28
申请人： Takashi Suganuma , Tamotsu Abe , Hiroshi Someya , Akira Sumitani
发明人： Takashi Suganuma , Tamotsu Abe , Hiroshi Someya , Akira Sumitani
IPC分类号： H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033
摘要： An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.
摘要翻译： EUV光源装置，能够防止过滤EUV光的过滤器的劣化和/或破损。 EUV光源装置包括产生EUV光的EUV产生室; 目标材料供应单元，用于将目标材料供应到EUV光产生室中; 激光源，用于将激光束施加到提供到EUV光产生室中的目标材料以产生等离子体; 用于收集从等离子体辐射的EUV光的收集光学器件; 用于过滤由收集光学器件收集的EUV光的滤光器; 以及设置在等离子体和过滤器之间的过滤器保护构件，用于通过阻挡从等离子体飞向过滤器的飞散物质来保护过滤器。
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公开(公告)号：US20090272919A1
公开(公告)日：2009-11-05
申请号：US12453058
申请日：2009-04-28
申请人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
发明人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70916 , G03F7/70941 , G03F7/7095 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
摘要翻译： 即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解 。 该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集器反射镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽部件，用于将诸如集电镜支架的结构部件与从等离子体产生的离子相屏蔽。
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公开(公告)号：US08450706B2
公开(公告)日：2013-05-28
申请号：US12453058
申请日：2009-04-28
申请人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
发明人： Tamotsu Abe , Hiroshi Someya , Takashi Suganuma , Takayuki Yabu
IPC分类号： G21F5/02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70916 , G03F7/70941 , G03F7/7095 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.
摘要翻译： 即使在从等离子体发射的快速离子体与真空室内的结构部件碰撞的情况下，仅将EuV光透射率高的粒子附着在EUV集光镜上的极紫外光源装置，其反射率也不易降解 。 该装置包括：真空室; 目标供给单元，用于将目标供给到真空室中的预定位置; 用于将激光束施加到靶以产生等离子体的驱动器激光器; 用于收集和输出从等离子体发射的极紫外光的收集镜; 用于支撑收集镜的收集镜支架; 以及由对于极紫外光具有高透射率的材料形成的屏蔽构件，用于将诸如集电镜支架的结构构件与从等离子体产生的离子相屏蔽。
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14.发明授权公开(公告)号：US08536550B2
公开(公告)日：2013-09-17
申请号：US12478083
申请日：2009-06-04
申请人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
发明人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
IPC分类号： B08B7/00
CPC分类号： B08B7/00 , B08B7/0035 , B08B13/00
摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
摘要翻译： 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。
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公开(公告)号：US08445877B2
公开(公告)日：2013-05-21
申请号：US13081148
申请日：2011-04-06
申请人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
发明人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
摘要翻译： 一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。 该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状 在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。
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公开(公告)号：US20120228527A1
公开(公告)日：2012-09-13
申请号：US13477940
申请日：2012-05-22
申请人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu ABE , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： G21K5/02
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。
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公开(公告)号：US08212228B2
公开(公告)日：2012-07-03
申请号：US12382108
申请日：2009-03-09
申请人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
发明人： Tamotsu Abe , Toshihiro Nishisaka , Hiroshi Someya , Masato Moriya , Takeshi Asayama , Hideo Hoshino , Hakaru Mizoguchi
IPC分类号： H05G2/00
CPC分类号： H05G2/001 , G03F7/70033 , G03F7/70916
摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。
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18.发明申请公开(公告)号：US20090301517A1
公开(公告)日：2009-12-10
申请号：US12478083
申请日：2009-06-04
申请人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
发明人： Takeshi Asayama , Hiroshi Someya , Masato Moriya , Hideo Hoshino , Tamotsu Abe
IPC分类号： B08B7/00
CPC分类号： B08B7/00 , B08B7/0035 , B08B13/00
摘要： A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
摘要翻译： 一种在EUV光发生器中清洁收集反射镜的方法，其中靶产生等离子体状态，并且通过集光镜收集产生的EUV光，该方法被用于EUV发光器，用于清除附着在其上的污染物，该方法包括 ：准备至少两个收集镜; 将其中一个反射镜定位在EUV聚光位置，同时将另一个反射镜定位在清洁位置; 确定在清洁位置处的反射镜是否被清洁，同时确定在聚光位置处的反射镜是否需要清洁; 并且一旦确定在清洁位置处的反射镜被清洁并且聚光位置处的反射镜需要清洁，则在反射镜处于聚光位置并且在将反射镜输送到清洁位置并且被清洁时需要清洁到清洁位置 到聚光位置。
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公开(公告)号：US20100019173A1
公开(公告)日：2010-01-28
申请号：US12385955
申请日：2009-04-24
申请人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
发明人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
摘要翻译： 一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。 该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状 在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。
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公开(公告)号：US08003962B2
公开(公告)日：2011-08-23
申请号：US12385955
申请日：2009-04-24
申请人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
发明人： Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
摘要： A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
摘要翻译： 一种喷嘴保护装置，其能够保护目标喷嘴免受等离子体的热量的干扰，而不会在LPP型EUV光源装置中形成稳定的目标材料流。 该喷嘴保护装置包括冷却单元，该冷却单元形成有用于使目标材料通过的开口，并且其形成有用于使冷却介质在内部循环的流路;以及致动器，其改变冷却单元的位置或形状 在从所述目标材料的轨迹排出所述冷却单元的第一状态和通过所述冷却单元阻止从所述等离子体到所述喷嘴的热辐射的第二状态之间，同时确保所述目标材料在所述冷却单元中的路径。
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