Spindle motor with fluid dynamic bearing and storage disk drive
    11.
    发明授权
    Spindle motor with fluid dynamic bearing and storage disk drive 有权
    主轴电机带流体动力轴承和存储磁盘驱动器

    公开(公告)号:US08810095B2

    公开(公告)日:2014-08-19

    申请号:US13198776

    申请日:2011-08-05

    摘要: A dynamic pressure bearing is defined in a first gap between a shaft portion and a sleeve portion. An upper seal portion extending upward and a lower seal portion extending downward are arranged radially outward of the dynamic pressure bearing. Each of the upper seal portion and the lower seal portion includes a surface including a lubricating oil located therein. The upper seal portion and the lower seal portion are arranged in communication with each other through a communicating hole defined in the sleeve portion. The communicating hole and a space ranging from the upper seal portion to the lower seal portion through the first gap are filled with the lubricating oil. The axial distance between the surfaces of the lubricating oil in the upper seal portion and the lower seal portion is arranged to be shorter than the axial distance between an upper end and a lower end of the dynamic pressure bearing.

    摘要翻译: 在轴部和套筒部之间的第一间隙中限定动态压力轴承。 向上延伸的上密封部分和向下延伸的下密封部分布置在动压轴承的径向外侧。 上密封部分和下密封部分中的每一个包括其中包括润滑油的表面。 上密封部分和下密封部分通过限定在套筒部分中的连通孔彼此连通。 连通孔和通过第一间隙从上密封部到下密封部的空间填充有润滑油。 上密封部中的润滑油的表面与下部密封部之间的轴向距离比动压轴承的上端和下端的轴向距离短。

    Intravascular indwelling catheter lock solution containing weak acid and container containing the same
    12.
    发明授权
    Intravascular indwelling catheter lock solution containing weak acid and container containing the same 失效
    含有弱酸性的血管内留置导管锁溶液和含有相同的容器

    公开(公告)号:US08703739B2

    公开(公告)日:2014-04-22

    申请号:US13133123

    申请日:2008-12-05

    IPC分类号: A61K31/727

    摘要: A catheter lock solution which is a catheter lock preparation having a bacteriostatic property at physiological osmotic pressure without practically containing a bacteriostatic component such as a preservative, an antimicrobial agent, or an antibiotic and having high safety, characterized in that the preparation contains a weak acid having an acid dissociation constant (pKa) of 3.0 to 6.5 as a buffer, a pH of the solution is less than 6.0, preferably from 3.0 to about 5.5, an osmotic pressure ratio is from 0.5 to 3.0, and a pH change (variation) can be suppressed to less than the 6.0 with the weak acid, and a container containing the catheter lock solution.

    摘要翻译: 一种导管锁定溶液,其是在生理渗透压下具有抑菌性质的导管锁定制剂,实际上不含抑菌组分如防腐剂,抗微生物剂或抗生素并具有高安全性,其特征在于所述制剂含有弱酸 酸性解离常数(pKa)为3.0〜6.5作为缓冲液,溶液的pH值小于6.0,优选为3.0〜5.5,渗透压比为0.5〜3.0,pH变化(变化) 可以用弱酸将其抑制到小于6.0,以及容纳导管锁定溶液的容器。

    Plasma etching method
    13.
    发明授权
    Plasma etching method 有权
    等离子蚀刻法

    公开(公告)号:US08628676B2

    公开(公告)日:2014-01-14

    申请号:US13638144

    申请日:2011-05-25

    IPC分类号: H01L21/3065

    CPC分类号: H01L21/3065 H01L21/32137

    摘要: A plasma etching method capable of forming a tapering etching structure having a smooth surface is provided. A fluorine-containing gas and a nitrogen gas are used and plasma is generated from these gases simultaneously, and a silicon substrate K is etched by the plasma while an etch-resistant layer is formed on the silicon substrate K by the plasma and then a fluorine-containing gas and an oxygen-containing gas are used and plasma is generated from these gases simultaneously, and the silicon substrate K is etched by the plasma while an etch-resistant layer is formed on the silicon substrate K by the plasma generated from the oxygen-containing gas, thereby forming a tapering etching structure H having a wide top opening width and a narrow bottom width.

    摘要翻译: 提供能够形成具有光滑表面的锥形蚀刻结构的等离子体蚀刻方法。 使用含氟气体和氮气,同时从这些气体产生等离子体,并且通过等离子体蚀刻硅衬底K,同时通过等离子体在硅衬底K上形成耐蚀刻层,然后将氟 使用含气体和含氧气体,并且同时从这些气体产生等离子体,并且通过等离子体蚀刻硅衬底K,同时通过由氧气产生的等离子体在硅衬底K上形成耐蚀刻层 从而形成具有宽的顶部开口宽度和窄的底部宽度的锥形蚀刻结构H.

    SOFT CONTACT LENS APPLICATION METHOD, LIQUID FOR CONTACT LENSES AND SOFT CONTACT LENS PACKAGE
    16.
    发明申请
    SOFT CONTACT LENS APPLICATION METHOD, LIQUID FOR CONTACT LENSES AND SOFT CONTACT LENS PACKAGE 有权
    软接触镜应用方法,液体接触镜和软接触镜套

    公开(公告)号:US20130293833A1

    公开(公告)日:2013-11-07

    申请号:US13988016

    申请日:2010-11-17

    IPC分类号: G02C7/04

    摘要: An object of the invention is to provide an application method capable of facilitating the application of the soft contact lens without using any instrument, a liquid for contact lenses capable of being used for the application method, and a soft contact lens package. The present invention is a method for applying a soft contact lens, including a shrinkage step of shrinking a soft contact lens by contacting the soft contact lens with a liquid for contact lenses, the liquid for contact lenses being capable of shrinking the soft contact lens to a state of being more intensively shrunken than an equilibrium state thereof in a physiological saline; and an application step of applying the shrunken soft contact lens to the eye, in which after the application step, the size of the soft contact lens is restored.

    摘要翻译: 本发明的目的是提供一种能够方便使用软性隐形眼镜而不使用任何仪器的应用方法,能够用于该应用方法的隐形眼镜用液体和软性隐形眼镜包装。 本发明是一种应用软性隐形眼镜的方法,包括收缩步骤,通过使软性隐形眼镜与隐形眼镜液体接触来收缩软性隐形眼镜,用于隐形眼镜的液体能够将软性隐形眼镜收缩到 在生理盐水中比其平衡状态更加紧缩的状态; 以及将收缩的软性隐形眼镜应用于眼睛的应用步骤,其中在应用步骤之后恢复软性隐形眼镜的尺寸。

    Microscope and focusing method
    17.
    发明授权
    Microscope and focusing method 有权
    显微镜和聚焦法

    公开(公告)号:US08576483B2

    公开(公告)日:2013-11-05

    申请号:US13157718

    申请日:2011-06-10

    IPC分类号: G02B21/00

    CPC分类号: G02B21/0032 G02B21/06

    摘要: Disclosed herein is a microscope, including: an illumination optical system; a first image creation optical system; a second image creation optical system; an illumination-field-diaphragm focus adjustment section; and a characteristic-quantity computation block, wherein the illumination-field-diaphragm focus adjustment section adjusts the image creation position for the illumination field diaphragm on the basis of the characteristic quantity computed by the characteristic-quantity computation block.

    摘要翻译: 本文公开了一种显微镜,包括:照明光学系统; 第一图像创建光学系统; 第二图像创建光学系统; 照明场光阑聚焦调节部; 以及特征量计算块,其中,所述照明场光阑聚焦调整部基于由所述特征量计算块计算的特征量来调整所述照明场光阑的图像创建位置。

    Access control apparatus and access control method
    18.
    发明授权
    Access control apparatus and access control method 有权
    访问控制装置和访问控制方法

    公开(公告)号:US08549526B2

    公开(公告)日:2013-10-01

    申请号:US12046740

    申请日:2008-03-12

    IPC分类号: G06F9/46

    CPC分类号: G06F9/4881

    摘要: The disclosed access control apparatus and method controls an I/O device to perform processing of access requests in a predetermined order including inputting access requests from multiple tasks to cause the I/O device to perform file processing, storing and managing information about file priorities, obtaining a file priority corresponding to an access request, managing a queue having multiple queues for which the processing priorities corresponding to the file priorities are set and causing the access request to be stored in any of the queues corresponding to the file priority, and obtaining the access requests stored in the queues in an order based on the processing priorities set for the queues and sends the access requests to the I/O device.

    摘要翻译: 所公开的访问控制装置和方法控制I / O设备以预定顺序执行访问请求的处理,包括输入来自多个任务的访问请求,以使I / O设备执行文件处理,存储和管理关于文件优先级的信息, 获取对应于访问请求的文件优先级,管理具有多个队列的队列,为此,具有与文件优先级相对应的处理优先级的队列被设置,并且使访问请求存储在与文件优先级对应的任何队列中,并获得 基于针对队列设置的处理优先级,按照顺序存取队列中存储的请求,并将访问请求发送到I / O设备。

    Plasma etching method capable of detecting end point and plasma etching device therefor
    19.
    发明授权
    Plasma etching method capable of detecting end point and plasma etching device therefor 有权
    能够检测端点和等离子体蚀刻装置的等离子体蚀刻方法

    公开(公告)号:US08518283B2

    公开(公告)日:2013-08-27

    申请号:US12089474

    申请日:2007-07-27

    IPC分类号: G01R31/00

    摘要: The present invention relates to a plasma etching method in which a special area for detecting an end point needs not to be set and an equipment therefor. At an etching step of forming SF6 gas into plasma to etch an etching ground on a Si film, the step is configured by two steps of: a large-amount supply step of supplying a large amount of SF6 gas; and a small-amount supply step of supplying a small amount of SF6 gas. An end-point detecting processor 34 measures an emission intensity of Si or SiFx in the plasma at the small-amount supply step, and determines that an etching end point is reached when the measured emission intensity becomes equal to or less than a previously set reference value.

    摘要翻译: 本发明涉及一种等离子体蚀刻方法,其中不需要设置用于检测终点的特殊区域及其设备。 在将SF 6气体形成等离子体以蚀刻Si膜上的蚀刻研磨的蚀刻步骤中,该步骤由以下两个步骤构成:供给大量SF 6气体的大量供给步骤; 以及供给少量的SF 6气体的小量供给工序。 终点检测处理器34在小量供给步骤中测量等离子体中的Si或SiFx的发射强度,并且当测量的发射强度变得等于或小于预先设定的参考值时,确定达到蚀刻终点 值。

    Control device for snoop tag
    20.
    发明授权
    Control device for snoop tag 失效
    窥探标签控制装置

    公开(公告)号:US08499125B2

    公开(公告)日:2013-07-30

    申请号:US11790272

    申请日:2007-04-24

    IPC分类号: G06F12/00 G06F13/00 G06F13/28

    CPC分类号: G06F12/0822 G06F12/123

    摘要: To prevent a decrease in performance of controlling a snoop tag. A queue is stored with REPLACE target WAY information and an index as an entry associated with a REPLACE request received from a processor, the index stored in the queue is compared with an index of a subsequent READ request, and, as a result of the comparison, a process based on the index-coincident READ request is executed with respect to the snoop tag corresponding to a content of a cache memory of the processor. Further, the REPLACE target WAY information of the READ request is replaced with the WAY information in the index-coincident entry within the queue.

    摘要翻译: 以防止控制snoop标签的性能下降。 存储REPLACE目标WAY信息和索引作为与从处理器接收到的REPLACE请求相关联的条目的队列,将存储在队列中的索引与后续READ请求的索引进行比较,并且作为比较的结果 相对于与处理器的高速缓冲存储器的内容相对应的窥探标签,执行基于索引一致的READ请求的处理。 此外,READ请求的REPLACE目标WAY信息被队列中符合条件的条目中的WAY信息所替代。