摘要:
In order to polish a wiring metal, a polishing composition ensuring that etching and erosion are suppressed and the residual wiring metal on the portion other than wiring is decreased, is provided, in which a polishing composition comprising (A) an azole group-containing compound having 3 or more azole groups within the molecule and a molecular weight of 300 to 15,000, (B) an oxidant, and (C) one, two or more acids selected from the group consisting of an amino acid, an organic acid and an inorganic acid is provided.
摘要:
An aqueous ink comprising at least a colorant, a water-soluble organic solvent and a compound represented by general formula (I) shown below, wherein said water-soluble organic solvent stays liquid at a temperature of not higher than 40° C., exhibits a water solubility of not lower than 1% by weight at a temperature of 20° C. and a saturated vapor pressure of not higher than 1.7 Pa at a temperature of 20° C. and is contained in an amount of from 5 to 35% by weight: wherein Y represents a nonmetallic atom group required to form a 5- to 7-membered ring with C and N; X represents a hydrogen atom, oxyradical group, hydroxyl group, alkyl group, alkenyl group, alkinyl group, aryl group, acyl group, sulfonyl group, sulfinyl group, alkoxy group, aryloxy group or acyloxy group; and R1 to R4 may be the same or different and each represent a hydrogen atom or alkyl group, with the proviso that any two of R1 to R4 and Y may be connected to each other to form a 5- to 7-membered ring.
摘要翻译:一种含有至少着色剂,水溶性有机溶剂和下述通式(I)表示的化合物的水性油墨,其中所述水溶性有机溶剂在不高于40℃的温度下保持液体,表现出 在20℃的温度下的水溶解度不低于1重量%,在20℃的温度下的饱和蒸汽压不高于1.7Pa,并且含量为5〜35% :其中Y表示与C和N形成5-至7-元环所需的非金属原子团; X代表氢原子,二酰基,羟基,烷基,烯基,炔基,芳基,酰基,磺酰基,亚磺酰基,烷氧基,芳氧基或酰氧基; R 1至R 4可以相同或不同,各自表示氢原子或烷基,条件是R 1至R 4和Y中的任何两个可以彼此连接 形成5-至7-元环。
摘要:
A polymer having an isoindole structure represented by the following general formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 independently represent a hydrogen atom or a hydrocarbon group having 1 to 5 carbon atoms X.sup.- represents an anion of an electrolyte, y is a number of from 0.01 to 1, which indicates the proportion of the anion to 1 mole of the monomer, and n is a number of from 5 to 500, which indicates the degree of polymerization,shows a high electroconductivity when doped, and the stability of the polymer in the oxidized state is high. This polymer is obtained by subjecting an isoindole compound represented by the following general formula: ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, to (1) electrochemical polymerization in the presence of an electrolyte in a solvent or (2) oxidative polymerization in a solvent by the action of an oxidant.
摘要:
To provide a polishing composition which allows high-speed polishing while etching and erosion are prevented and the flatness of metal film is maintained, there is provided a a polishing composition, comprising (A) a compound having three or more azole moieties, (B) an oxidizing agent, and (C) one or more species selected from among an amino acid, an organic acid, and an inorganic acid.
摘要:
A composition comprising metal oxide particles having photo-catalytic activity, a solvent-soluble zirconium compound and a solvent. Preferably, the metal oxide particles having photocatalytic activity are titanium oxide particles; the metal oxide particles have an average particle diameter of about 0.005 to 0.3 &mgr;m; and the amount of the zirconium compound is in the range of about 3-200 parts by weight, as ZrO2, per 100 parts by weight of the metal oxide articles. A composite of a film having a photo-catalytic activity with a base material is made by coating the base material with the above composition to form a film, and curing the film on the base material.
摘要:
An ink composition, a recording medium or printed matter containing a compound expressed by General Formula 1 The compound has a weight reduction after 1 hour at 60°C. of no more than 1%. This makes it possible to provide the ink composition, a recording medium, printed matter, and an ink jet recording method wherein a light resistance of the printed matter is excellent, there is no ink clogging, and a high-quality image with almost no yellowing of the printed matter can be obtained.
摘要:
The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.
摘要:
The ink composition of the present invention contains a coloring agent, water, a water-soluble organic solvent which is a liquid at least at temperatures of 40° C. or less, and which has a solubility of 1 wt % or greater with respect to water at a temperature of 20° C., and a saturation vapor pressure of 1.7 Pa or less at a temperature of 20° C. (with said organic solvent being contained in the ink composition at the rate of 10 to 35 wt %), and one or more amidine type compounds. As a result, the present invention provides an ink composition, a recording medium, recorded matter and an ink jet recording method that make it possible to obtain images with a high image quality which are superior in terms of the gas resistance of the recorded matter.