POLISHING COMPOSITION
    11.
    发明申请
    POLISHING COMPOSITION 审中-公开
    抛光组合物

    公开(公告)号:US20090093118A1

    公开(公告)日:2009-04-09

    申请号:US11911508

    申请日:2006-04-14

    IPC分类号: H01L21/461 C09G1/02

    摘要: In order to polish a wiring metal, a polishing composition ensuring that etching and erosion are suppressed and the residual wiring metal on the portion other than wiring is decreased, is provided, in which a polishing composition comprising (A) an azole group-containing compound having 3 or more azole groups within the molecule and a molecular weight of 300 to 15,000, (B) an oxidant, and (C) one, two or more acids selected from the group consisting of an amino acid, an organic acid and an inorganic acid is provided.

    摘要翻译: 为了研磨布线金属,可以提供确保蚀刻和侵蚀的抛光组合物,并且布线以外的部分上的残留布线金属减少,其中包含(A)含唑类化合物 在分子内具有3个或更多个唑基,分子量为300至15,000,(B)氧化剂,和(C)选自氨基酸,有机酸和无机酸的一种或多种酸 提供酸。

    Aqueous ink
    12.
    发明授权
    Aqueous ink 失效
    水性油墨

    公开(公告)号:US06676735B2

    公开(公告)日:2004-01-13

    申请号:US09886949

    申请日:2001-06-21

    IPC分类号: C09D1100

    CPC分类号: C09D11/38 C09D11/03

    摘要: An aqueous ink comprising at least a colorant, a water-soluble organic solvent and a compound represented by general formula (I) shown below, wherein said water-soluble organic solvent stays liquid at a temperature of not higher than 40° C., exhibits a water solubility of not lower than 1% by weight at a temperature of 20° C. and a saturated vapor pressure of not higher than 1.7 Pa at a temperature of 20° C. and is contained in an amount of from 5 to 35% by weight: wherein Y represents a nonmetallic atom group required to form a 5- to 7-membered ring with C and N; X represents a hydrogen atom, oxyradical group, hydroxyl group, alkyl group, alkenyl group, alkinyl group, aryl group, acyl group, sulfonyl group, sulfinyl group, alkoxy group, aryloxy group or acyloxy group; and R1 to R4 may be the same or different and each represent a hydrogen atom or alkyl group, with the proviso that any two of R1 to R4 and Y may be connected to each other to form a 5- to 7-membered ring.

    摘要翻译: 一种含有至少着色剂,水溶性有机溶剂和下述通式(I)表示的化合物的水性油墨,其中所述水溶性有机溶剂在不高于40℃的温度下保持液体,表现出 在20℃的温度下的水溶解度不低于1重量%,在20℃的温度下的饱和蒸汽压不高于1.7Pa,并且含量为5〜35% :其中Y表示与C和N形成5-至7-元环所需的非金属原子团; X代表氢原子,二酰基,羟基,烷基,烯基,炔基,芳基,酰基,磺酰基,亚磺酰基,烷氧基,芳氧基或酰氧基; R 1至R 4可以相同或不同,各自表示氢原子或烷基,条件是R 1至R 4和Y中的任何两个可以彼此连接 形成5-至7-元环。

    Polymer having isoindole structure
    13.
    发明授权
    Polymer having isoindole structure 失效
    具有异吲哚结构的聚合物

    公开(公告)号:US4833231A

    公开(公告)日:1989-05-23

    申请号:US92916

    申请日:1987-08-06

    IPC分类号: C08G73/06 C08G61/12 H01B1/12

    CPC分类号: C08G61/124 H01B1/127

    摘要: A polymer having an isoindole structure represented by the following general formula: ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 independently represent a hydrogen atom or a hydrocarbon group having 1 to 5 carbon atoms X.sup.- represents an anion of an electrolyte, y is a number of from 0.01 to 1, which indicates the proportion of the anion to 1 mole of the monomer, and n is a number of from 5 to 500, which indicates the degree of polymerization,shows a high electroconductivity when doped, and the stability of the polymer in the oxidized state is high. This polymer is obtained by subjecting an isoindole compound represented by the following general formula: ##STR2## wherein R.sup.1, R.sup.2 and R.sup.3 are as defined above, to (1) electrochemical polymerization in the presence of an electrolyte in a solvent or (2) oxidative polymerization in a solvent by the action of an oxidant.

    Polishing composition and polishing method
    14.
    发明申请
    Polishing composition and polishing method 审中-公开
    抛光组合物和抛光方法

    公开(公告)号:US20070082456A1

    公开(公告)日:2007-04-12

    申请号:US10579406

    申请日:2004-11-15

    IPC分类号: H01L21/76

    CPC分类号: C09G1/02 H01L21/3212

    摘要: To provide a polishing composition which allows high-speed polishing while etching and erosion are prevented and the flatness of metal film is maintained, there is provided a a polishing composition, comprising (A) a compound having three or more azole moieties, (B) an oxidizing agent, and (C) one or more species selected from among an amino acid, an organic acid, and an inorganic acid.

    摘要翻译: 为了提供一种抛光组合物,其能够防止腐蚀和侵蚀而进行高速抛光,并且保持金属膜的平坦度,提供了一种抛光组合物,其包含(A)具有三个或更多个唑单元的化合物,(B) 氧化剂和(C)选自氨基酸,有机酸和无机酸中的一种或多种。

    Photocatalytic metal oxide composition, thin film, and composite
    15.
    发明授权
    Photocatalytic metal oxide composition, thin film, and composite 有权
    光催化金属氧化物组成,薄膜和复合材料

    公开(公告)号:US06337301B1

    公开(公告)日:2002-01-08

    申请号:US09585621

    申请日:2000-06-02

    IPC分类号: B01J2100

    摘要: A composition comprising metal oxide particles having photo-catalytic activity, a solvent-soluble zirconium compound and a solvent. Preferably, the metal oxide particles having photocatalytic activity are titanium oxide particles; the metal oxide particles have an average particle diameter of about 0.005 to 0.3 &mgr;m; and the amount of the zirconium compound is in the range of about 3-200 parts by weight, as ZrO2, per 100 parts by weight of the metal oxide articles. A composite of a film having a photo-catalytic activity with a base material is made by coating the base material with the above composition to form a film, and curing the film on the base material.

    摘要翻译: 包含具有光催化活性的金属氧化物颗粒,溶剂可溶性锆化合物和溶剂的组合物。 优选具有光催化活性的金属氧化物颗粒是氧化钛颗粒; 金属氧化物颗粒的平均粒径为约0.005至0.3μm; 相对于金属氧化物制品100重量份,锆化合物的量为ZrO 2约3〜200重量份。 通过用上述组合物涂覆基材以形成膜并使基材上的膜固化,制成具有光催化活性的膜与基材的复合物。

    LSI device polishing composition and method for producing LSI device
    17.
    发明授权
    LSI device polishing composition and method for producing LSI device 失效
    LSI器件抛光组合物和LSI器件的制造方法

    公开(公告)号:US06844263B2

    公开(公告)日:2005-01-18

    申请号:US10370603

    申请日:2003-02-24

    摘要: The present invention provides an LSI device polishing composition containing water, abrasive grains, an organic acid, and an oxidizing agent, and having a pH of 5.5-10.0 adjusted by an alkaline substance, the LSI device polishing composition being used for polishing a copper-containing metal wiring layer in which copper is deposited on an insulating film via barrier metal formed of Ta or TaN; and a method for producing LSI devices by use of the polishing composition. During polishing of a barrier metal such as Ta or TaN and a copper wiring layer, the rate of polishing Ta or TaN can be enhanced, to thereby prevent dishing and erosion.

    摘要翻译: 本发明提供一种含有水,磨粒,有机酸,氧化剂,pH值为5.5〜10.0的碱性物质的LSI装置研磨用组合物,所述LSI装置用研磨用组合物用于研磨铜 - 其中通过由Ta或TaN形成的阻挡金属将铜沉积在绝缘膜上的含金属布线层; 以及通过使用该研磨用组合物来制造LSI器件的方法。 在对Ta,TaN等阻挡金属和铜布线层进行研磨的过程中,可以提高Ta,TaN的研磨速度,从而防止凹陷和侵蚀。

    Ink composition, ink jet recording method and recorded matter
    18.
    发明授权
    Ink composition, ink jet recording method and recorded matter 失效
    油墨成分,喷墨记录方法和记录物

    公开(公告)号:US06761759B2

    公开(公告)日:2004-07-13

    申请号:US10103657

    申请日:2002-03-21

    IPC分类号: C09D1100

    CPC分类号: C09D11/38

    摘要: The ink composition of the present invention contains a coloring agent, water, a water-soluble organic solvent which is a liquid at least at temperatures of 40° C. or less, and which has a solubility of 1 wt % or greater with respect to water at a temperature of 20° C., and a saturation vapor pressure of 1.7 Pa or less at a temperature of 20° C. (with said organic solvent being contained in the ink composition at the rate of 10 to 35 wt %), and one or more amidine type compounds. As a result, the present invention provides an ink composition, a recording medium, recorded matter and an ink jet recording method that make it possible to obtain images with a high image quality which are superior in terms of the gas resistance of the recorded matter.

    摘要翻译: 本发明的油墨组合物含有着色剂,水,水溶性有机溶剂,其至少在40℃以下的温度下为液体,相对于本发明的溶解度为1重量%以上 温度为20℃的水,饱和蒸气压在20℃的温度下为1.7Pa以下(油墨组合物中的所述有机溶剂的含量为10〜35重量%), 和一种或多种脒型化合物。 结果,本发明提供了一种油墨组合物,记录介质,记录物质和喷墨记录方法,使得可以获得在记录物质的气体阻力方面优异的图像质量高的图像。