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282 条记录 (耗时 0.04 秒)

    Aqueous ink
    1.
    发明授权
    Aqueous ink 失效
    水性油墨

    公开(公告)号：US06676735B2

    公开(公告)日：2004-01-13

    申请号：US09886949

    申请日：2001-06-21

    申请人： Yasuhiro Oki ,  Kazuhiko Kitamura ,  Tetsuya Aoyama ,  Nobuo Uotani ,  Hiroshi Takahashi ,  Yuji Ito

    发明人： Yasuhiro Oki ,  Kazuhiko Kitamura ,  Tetsuya Aoyama ,  Nobuo Uotani ,  Hiroshi Takahashi ,  Yuji Ito

    IPC分类号： C09D1100

    CPC分类号： C09D11/38 ,  C09D11/03

    摘要： An aqueous ink comprising at least a colorant, a water-soluble organic solvent and a compound represented by general formula (I) shown below, wherein said water-soluble organic solvent stays liquid at a temperature of not higher than 40° C., exhibits a water solubility of not lower than 1% by weight at a temperature of 20° C. and a saturated vapor pressure of not higher than 1.7 Pa at a temperature of 20° C. and is contained in an amount of from 5 to 35% by weight: wherein Y represents a nonmetallic atom group required to form a 5- to 7-membered ring with C and N; X represents a hydrogen atom, oxyradical group, hydroxyl group, alkyl group, alkenyl group, alkinyl group, aryl group, acyl group, sulfonyl group, sulfinyl group, alkoxy group, aryloxy group or acyloxy group; and R1 to R4 may be the same or different and each represent a hydrogen atom or alkyl group, with the proviso that any two of R1 to R4 and Y may be connected to each other to form a 5- to 7-membered ring.

    摘要翻译： 一种含有至少着色剂，水溶性有机溶剂和下述通式（I）表示的化合物的水性油墨，其中所述水溶性有机溶剂在不高于40℃的温度下保持液体，表现出 在20℃的温度下的水溶解度不低于1重量％，在20℃的温度下的饱和蒸汽压不高于1.7Pa，并且含量为5〜35％ ：其中Y表示与C和N形成5-至7-元环所需的非金属原子团; X代表氢原子，二酰基，羟基，烷基，烯基，炔基，芳基，酰基，磺酰基，亚磺酰基，烷氧基，芳氧基或酰氧基; R 1至R 4可以相同或不同，各自表示氢原子或烷基，条件是R 1至R 4和Y中的任何两个可以彼此连接 形成5-至7-元环。

    Ink composition, ink jet recording method and recorded matter
    4.
    发明授权
    Ink composition, ink jet recording method and recorded matter 失效
    油墨成分，喷墨记录方法和记录物

    公开(公告)号：US06761759B2

    公开(公告)日：2004-07-13

    申请号：US10103657

    申请日：2002-03-21

    申请人： Yasuhiro Oki ,  Kazuhiko Kitamura ,  Tetsuya Aoyama ,  Kyoichi Oka ,  Nobuo Uotani ,  Hiroshi Takahashi ,  Yuji Ito

    发明人： Yasuhiro Oki ,  Kazuhiko Kitamura ,  Tetsuya Aoyama ,  Kyoichi Oka ,  Nobuo Uotani ,  Hiroshi Takahashi ,  Yuji Ito

    IPC分类号： C09D1100

    CPC分类号： C09D11/38

    摘要： The ink composition of the present invention contains a coloring agent, water, a water-soluble organic solvent which is a liquid at least at temperatures of 40° C. or less, and which has a solubility of 1 wt % or greater with respect to water at a temperature of 20° C., and a saturation vapor pressure of 1.7 Pa or less at a temperature of 20° C. (with said organic solvent being contained in the ink composition at the rate of 10 to 35 wt %), and one or more amidine type compounds. As a result, the present invention provides an ink composition, a recording medium, recorded matter and an ink jet recording method that make it possible to obtain images with a high image quality which are superior in terms of the gas resistance of the recorded matter.

    摘要翻译： 本发明的油墨组合物含有着色剂，水，水溶性有机溶剂，其至少在40℃以下的温度下为液体，相对于本发明的溶解度为1重量％以上 温度为20℃的水，饱和蒸气压在20℃的温度下为1.7Pa以下（油墨组合物中的所述有机溶剂的含量为10〜35重量％）， 和一种或多种脒型化合物。 结果，本发明提供了一种油墨组合物，记录介质，记录物质和喷墨记录方法，使得可以获得在记录物质的气体阻力方面优异的图像质量高的图像。

    Water resistance imparter, ink composition, reactive fluid, and method of ink-jet recording with two fluids
    5.
    发明授权
    Water resistance imparter, ink composition, reactive fluid, and method of ink-jet recording with two fluids 有权
    耐水突变体，油墨组合物，反应性流体以及用两种流体喷墨记录的方法

    公开(公告)号：US06498222B1

    公开(公告)日：2002-12-24

    申请号：US09744090

    申请日：2001-03-09

    申请人： Kazuhiko Kitamura ,  Hitoshi Ota ,  Tetsuya Aoyama ,  Nobuo Uotani ,  Yuji Ito ,  Hiroshi Takahashi

    发明人： Kazuhiko Kitamura ,  Hitoshi Ota ,  Tetsuya Aoyama ,  Nobuo Uotani ,  Yuji Ito ,  Hiroshi Takahashi

    IPC分类号： C08F22602

    CPC分类号： C09D11/30 ,  B41J2/17 ,  B41J2/2114 ,  B41M5/5245 ,  C08F220/60 ,  C09D11/54

    摘要： Disclosed is a cationic water-soluble resin which comprises a (co)polymer of, in formula (I), repeating units (a) represented by formula (a) and repeating units (b) represented by formula (b), the content of the repeating units (a) in the (co)polymer being 100 to 0% by mole, the (co)polymer having in its molecule a carboxyl-containing group as one of the terminal groups and an aromatic ring-containing group as the other terminal group. The addition of this resin to ink compositions can realize the formation of images possessing excellent waterfastness and lightfastness and having no significant feathering or color bleeding. Likewise, the addition of this resin to a reaction solution for ink jet recording involving the deposition of two liquids, an ink composition and a reaction solution, onto a recording medium, can realize the formation of images possessing excellent waterfastness and lightfastness and no significant feathering or color bleeding. wherein R1 represents hydrogen or methyl; R2 and R3 represent C1-3 alkyl; R4 represents hydrogen or methyl; R5, R6, and R7 represent C1-3 alkyl; Z− represents a counter ion; and k and 1 are each 1, 2, or 3.

    摘要翻译： 公开了一种阳离子型水溶性树脂，其包含式（I）中的（共）聚合物，由式（a）表示的重复单元（a）和由式（b）表示的重复单元（b）），其含量 （共）聚合物中的重复单元（a）为100〜0摩尔％，在其分子中具有含羧基的端基中的（共）聚合物和作为其它的含芳环的基团 终端组。 将这种树脂添加到油墨组合物中可以实现具有优异的耐水性和耐光性并且没有明显的羽化或着色渗色的图像的形成。 同样地，将这种树脂添加到用于喷墨记录的反应溶液中，包括将两种液体，油墨组合物和反应溶液沉积在记录介质上，可以实现具有优异耐水性，耐光性和无明显羽化的图像的形成 或颜色渗色。其中R1表示氢或甲基; R2和R3表示C1-3烷基; R4代表氢或甲基; R5，R6和R7表示C1-3烷基; Z-表示抗衡离子; 而k和1分别为1,2或3。

    POLISHING COMPOSITION
    6.
    发明申请
    POLISHING COMPOSITION 审中-公开
    抛光组合物

    公开(公告)号：US20090289217A1

    公开(公告)日：2009-11-26

    申请号：US12375325

    申请日：2007-07-26

    申请人： Takashi Sato ,  Hiroshi Takahashi ,  Yoshitomo Shimazu ,  Yuji Ito

    发明人： Takashi Sato ,  Hiroshi Takahashi ,  Yoshitomo Shimazu ,  Yuji Ito

    IPC分类号： C09G1/00 ,  C09G1/02

    CPC分类号： C09K3/1463 ,  C09G1/02 ,  C23F3/06 ,  C23F11/149 ,  H01L21/3212

    摘要： A polishing composition which achieves surfaces with high planarity and the reduction of corrosions in the wiring metal surface at the same time is provided.Such compositions include (A) an oxidizing agent; (B) at least one acid selected from an amino acid, a carboxylic acid of no more than 8 carbon atoms, and an inorganic acid; (C) a sulfonic acid having a concentration of 0.01% by mass or more and having an alkyl group of 8 or more carbon atoms; (D) a fatty acid having a concentration of 0.001% by mass or more and having an alkyl group of 8 or more carbon atoms; and (E) at least one compound selected from a pyridine carbonyl compound, a nonionic water-soluble polymer, 2-pyrrolidone, N-methylpyrrolidone, 1,3-dimethyl-2-imidazolidinone, gramine, adenine, N,N′-diisopropylethylenediamine, N,N′-bis(2-hydroxyethyl)ethylenediamine, N,N′-dibenzylethylenediamine, and N,N′-diphenylethylenediamine.

    摘要翻译： 提供了一种能够同时实现高平坦度的表面和布线金属表面的腐蚀降低的抛光组合物。 这样的组合物包括（A）氧化剂; （B）选自氨基酸，不超过8个碳原子的羧酸和无机酸中的至少一种酸; （C）浓度为0.01质量％以上且具有8个以上碳原子的烷基的磺酸; （D）浓度为0.001质量％以上且具有8个以上碳原子的烷基的脂肪酸; 和（E）选自吡啶羰基化合物，非离子水溶性聚合物，2-吡咯烷酮，N-甲基吡咯烷酮，1,3-二甲基-2-咪唑烷酮，格列胺，腺嘌呤，N，N'-二异丙基乙二胺中的至少一种化合物 ，N，N'-双（2-羟乙基）乙二胺，N，N'-二苄基乙二胺和N，N'-二苯基乙二胺。

    METHOD FOR PRODUCING ABRASIVE COMPOSITION
    7.
    发明申请
    METHOD FOR PRODUCING ABRASIVE COMPOSITION 审中-公开
    生产磨料组合物的方法

    公开(公告)号：US20090194504A1

    公开(公告)日：2009-08-06

    申请号：US12300762

    申请日：2007-05-14

    申请人： Takashi Sato ,  Hiroshi Takahashi ,  Yoshitomo Shimazu ,  Yuji Ito

    发明人： Takashi Sato ,  Hiroshi Takahashi ,  Yoshitomo Shimazu ,  Yuji Ito

    IPC分类号： C09K13/00 ,  B44C1/22 ,  C09K13/04 ,  C09K13/06

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1454 ,  C23F3/04 ,  H01L21/7684

    摘要： The present invention provides a method for producing an abrasive composition, which can control dishing, a method for polishing a substrate using the abrasive composition, and a method for producing a substrate. In the method for producing an abrasive composition, two kinds of preliminary compositions (A) and (B) having different compositions are mixed in different mixing ratios to produce plural kinds of abrasive compositions, wherein a composition containing (a) an abrasive grain, (b) an oxidizing agent, (c) one or more acids selected from the group consisting of amino acids, organic acids and inorganic acids, and (d) a surfactant is used as the preliminary composition (A); and a composition containing (a) an abrasive grain and (b) an oxidizing agent is used as the preliminary composition (B). The preliminary composition (B) may contain the foregoing acid (c) and surfactant (d). In this case, at least one of (a), (b), (c) and (d) in the preliminary composition (A) has a different concentration from that in the preliminary composition (B).

    摘要翻译： 本发明提供一种可以控制凹陷的研磨组合物的制造方法，使用该研磨剂组合物的基板的研磨方法及其制造方法。 在制造研磨剂组合物的方法中，以不同的混合比例混合两种具有不同组成的预备组合物（A）和（B），以制备多种磨料组合物，其中含有（a）磨粒，（ b）氧化剂，（c）一种或多种选自氨基酸，有机酸和无机酸的酸，和（d）表面活性剂用作初步组合物（A）; 并且使用含有（a）磨粒的组合物和（b）氧化剂作为初步组合物（B）。 初步组合物（B）可以含有上述酸（c）和表面活性剂（d）。 在这种情况下，初步组合物（A）中的（a），（b），（c）和（d）中的至少一种与初步组合物（B）的浓度不同。