公开(公告)号：US09234275B2

公开(公告)日：2016-01-12

申请号：US14102792

申请日：2013-12-11

Applicant: TOKYO ELECTRON LIMITED

Inventor： Yoshihiro Takezawa ,  Katsushige Harada

IPC: C23C16/00 ,  C23C16/30 ,  C23C16/40 ,  C23C16/455 ,  H01L21/02 ,  H01L21/28 ,  C23C16/06 ,  H01L29/51

CPC classification number: C23C16/308 ,  C23C16/401 ,  C23C16/45531 ,  H01L21/02148 ,  H01L21/02219 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/28194 ,  H01L21/28229 ,  H01L29/517

Abstract: Provided is a method of forming a film of metal compound of first and second materials on an object to be processed, one of the first and second materials being metal, which includes: supplying a raw material gas containing the first material to the object such that the first material is adsorbed onto the object; supplying a raw material gas containing the second material to the object with the first material adsorbed thereon such that the second material is adsorbed onto the object with the first material adsorbed thereon; and supplying a third material different from the first and second materials onto the first and second materials adsorbed onto the object such that the first to third materials are chemically combined with one another.

Abstract translation: 提供一种在被处理物上形成第一和第二材料的金属化合物的膜的方法，所述第一和第二材料中的一种是金属，其包括：向所述物体供应含有所述第一材料的原料气体，使得 第一种材料被吸附到物体上; 向所述物体供给含有所述第二材料的原料气体，其中吸附有所述第一材料，使得所述第二材料被所述第一材料吸附在所述物体上被吸附; 以及将不同于所述第一和第二材料的第三材料供应到吸附到所述物体上的所述第一和第二材料上，使得所述第一至第三材料彼此化学结合。