公开(公告)号：US20110222043A1

公开(公告)日：2011-09-15

申请号：US13112357

申请日：2011-05-20

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

IPC分类号： G03B27/72

CPC分类号： G02B1/11 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

摘要翻译： 本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。 本公开特别涉及光学元件的涂层以增加或降低反射率。

公开(公告)号：US20080297754A1

公开(公告)日：2008-12-04

申请号：US12031595

申请日：2008-02-14

申请人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

发明人： Vladimir Kamenov ,  Daniel Kraehmer ,  Toralf Gruner ,  Karl-Stefan Weissenrieder ,  Heiko Feldmann ,  Achim Zirkel ,  Alexandra Pazidis ,  Bruno Thome ,  Stephan Six

IPC分类号： G03B27/54 ,  G02B5/00

CPC分类号： G02B1/11 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70958

摘要： The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

摘要翻译： 本公开涉及一种微光刻投影曝光装置，例如用于生产大型集成电路和其它微结构元件的微光投影曝光装置。 本公开特别涉及光学元件的涂层以增加或降低反射率。

公开(公告)号：US20060238735A1

公开(公告)日：2006-10-26

申请号：US11401505

申请日：2006-04-10

申请人： Vladimir Kamenov ,  Erwin Gaber ,  Daniel Kraehmer ,  Toralf Gruner

发明人： Vladimir Kamenov ,  Erwin Gaber ,  Daniel Kraehmer ,  Toralf Gruner

IPC分类号： G03B27/54

CPC分类号： G03F7/70966 ,  G03F7/70191 ,  G03F7/70266 ,  G03F7/70308

摘要： An optical system of a microlithographic exposure apparatus has a pupil plane, a field plane and at least one intrinsically birefringent optical element that is positioned in or in close proximity to the field plane. A force application unit exerts mechanical forces to a correction optical element, which is positioned in or in close proximity to the pupil plane. The forces cause stress that induces a birefringence in the correction optical element such that a retardance distribution in an exit pupil is at least substantially rotationally symmetrical. An optical surface may be aspherically deformed such that a wavefront error, which is as result of deformations caused by the application of forces, is at least substantially corrected.

摘要翻译： 微光刻曝光设备的光学系统具有光瞳平面，场平面以及至少一个本征双折射光学元件，其位于或靠近场平面。 力施加单元对矫正光学元件施加机械力，校正光学元件位于或靠近瞳孔平面。 力引起在校正光学元件中引起双折射的应力，使得出射光瞳中的延迟分布至少基本上是旋转对称的。 光学表面可以被非球面变形，使得由于施加力而引起的变形的波前误差至少被基本上校正。

公开(公告)号：US20050180023A1

公开(公告)日：2005-08-18

申请号：US11071699

申请日：2005-03-02

申请人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

发明人： Michael Totzeck ,  Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02B1/02 ,  G02B5/30 ,  G02B13/14 ,  G03F7/20 ,  G02B3/00

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966 ,  Y10S359/90

摘要： A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimizing method, an optimizing function which takes at least one birefringence-related image aberration into account is minimized. The birefringence-related image aberration is determined from a calculation for a light ray passing through the fluoride crystal lenses. To the extent that the birefringence-related image aberration is a function of parameters of the light ray, it depends only on geometric parameters of the light ray. The numerical optimizing method is used to produce objectives in which an optical retardation as well as an asymmetry of the optical retardation are corrected. The lenses are arranged in homogeneous groups, where each homogeneous group is corrected for the optical retardation asymmetry.

摘要翻译： 数值优化方法用于减少物镜中的立方晶体结构的氟化物晶体材料的透镜中的固有双折射引起的有害影响，特别是微光刻系统的投影物镜。 在优化方法下，考虑到至少一个双折射相关图像像差的优化函数被最小化。 从通过氟化物晶体透镜的光线的计算确定双折射相关图像像差。 在双折射相关图像像差是光线参数的函数的程度上，其仅取决于光线的几何参数。 使用数值优化方法来产生其中光学延迟以及光学延迟的不对称性被校正的目标。 透镜被排列成均匀的组，其中每个均匀组被校正用于光学延迟不对称。

公开(公告)号：US09063439B2

公开(公告)日：2015-06-23

申请号：US12624993

申请日：2009-11-24

申请人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

发明人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

IPC分类号： G03B27/68 ,  G03F7/20

CPC分类号： G03F7/70958 ,  G03F7/70308 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70941

摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective. The parameter of the second projection objective is a stray light component at an exposure field of the second projection objective and/or a variation of the stray light component at the exposure field of the second projection objective. The second projection objective is different from the projection objective.

摘要翻译： 公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。 投影物镜包括一个光学元件，其被构造成使得在投影物镜的使用期间，光学元件在投影物镜的曝光区域中产生杂散光分量，该投射物镜将投射物镜的参数适应于第二投影物镜的参数 。 该参数是在投影物镜的曝光场处的杂散光分量和/或投影物镜的曝光场处的杂散光分量的变化。 第二投影物镜的参数是在第二投影物镜的曝光场处的杂散光分量和/或第二投影物镜的曝光场处的杂散光分量的变化。 第二个投影目标与投影目标不同。

公开(公告)号：US20100079739A1

公开(公告)日：2010-04-01

申请号：US12624993

申请日：2009-11-24

申请人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

发明人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

IPC分类号： G03B27/54

CPC分类号： G03F7/70958 ,  G03F7/70308 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70941

摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed.

摘要翻译： 公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。

公开(公告)号：US20060066764A1

公开(公告)日：2006-03-30

申请号：US11251300

申请日：2005-10-14

申请人： Vladimir Kamenov ,  Toralf Gruner

发明人： Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02F1/1335

CPC分类号： G03F7/70225 ,  G02B5/3091 ,  G02B17/02 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70241 ,  G03F7/70958 ,  G03F7/70966

摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.

摘要翻译： 光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。 晶体的晶格具有不同的取向，例如 通过相互补偿减少集团的整体延迟。 至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。 这降低了幅度，但并没有显着地改变固有双折射的取向。 通过选择适当的倾斜角度，可以实现光学系统的更好的性能。 例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。

公开(公告)号：US08446665B2

公开(公告)日：2013-05-21

申请号：US12562693

申请日：2009-09-18

申请人： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

发明人： Alexander Epple ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

IPC分类号： G02B5/08

CPC分类号： G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.

摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。 该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15） 物镜（19）将第二中间图像成像到图像场上。 第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。 第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。 第二部分物镜的透镜的至少一个表面（L21，L22）具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于 介于0°和30°之间。 作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

公开(公告)号：US20110038061A1

公开(公告)日：2011-02-17

申请号：US12562693

申请日：2009-09-18

申请人： Alexander EPPLE ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

发明人： Alexander EPPLE ,  Vladimir Kamenov ,  Toralf Gruner ,  Thomas Schicketanz

IPC分类号： G02B17/00 ,  G03B27/52

CPC分类号： G02B17/0892 ,  G02B1/11 ,  G02B17/08 ,  G02B17/0896 ,  G03F7/70 ,  G03F7/70225 ,  G03F7/70275

摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured such that the deviation from the marginal ray concentricity is greater than or equal to 20°.

摘要翻译： 用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7）上。 该目的包括将对象场成像到第一实际中间图像（13）上的第一部分目标（11），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15） 物镜（19）将第二中间图像成像到图像场上。 第二部分目标是具有恰好一个凹面镜并具有至少一个透镜（L21，L22）的反射折射物镜。 第一折叠镜（23）将来自物体平面的辐射偏转到凹面镜，并且第二折叠镜（25）将来自凹面镜的辐射偏转到图像平面。 第二部分物镜的透镜（L21，L22）的至少一个表面具有对于150nm至250nm的工作波长具有小于0.2％的反射率的抗反射涂层，并且对于 介于0°和30°之间。 作为替代或另外，第二部分物镜的透镜的所有表面被配置为使得与边缘射线同心度的偏差大于或等于20°。

公开(公告)号：US07355791B2

公开(公告)日：2008-04-08

申请号：US11251300

申请日：2005-10-14

申请人： Vladimir Kamenov ,  Toralf Gruner

发明人： Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02B5/30

CPC分类号： G03F7/70225 ,  G02B5/3091 ,  G02B17/02 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70241 ,  G03F7/70958 ,  G03F7/70966

摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.

摘要翻译： 光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。 晶体的晶格具有不同的取向，例如 通过相互补偿减少集团的整体延迟。 至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。 这降低了幅度，但并没有显着地改变固有双折射的取向。 通过选择适当的倾斜角度，可以实现光学系统的更好的性能。 例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。