利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

41 条记录 (耗时 0.02 秒)

    Projection objective for microlithography with stray light compensation and related methods
    1.
    发明授权
    Projection objective for microlithography with stray light compensation and related methods 有权
    具有杂散光补偿和相关方法的微光刻的投影目标

    公开(公告)号：US09063439B2

    公开(公告)日：2015-06-23

    申请号：US12624993

    申请日：2009-11-24

    申请人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

    发明人： Aksel Goehnermeier ,  Daniel Kraehmer ,  Vladimir Kamenov ,  Michael Totzeck

    IPC分类号： G03B27/68 ,  G03F7/20

    CPC分类号： G03F7/70958 ,  G03F7/70308 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/70941

    摘要： A projection objective for applications in microlithography, a microlithography projection exposure apparatus with a projection objective, a microlithographic manufacturing method for microstructured components, and a component manufactured using such a manufacturing method are disclosed. The projection objective includes an optical component configured so that, during use of the projection objective, the optical component generates a stray light component in the exposure field of the projection objective which adapts a parameter of the projection objective to a parameter of a second projection objective. The parameter is the stray light component at the exposure field of the projection objective and/or a variation of the stray light component at the exposure field of the projection objective. The parameter of the second projection objective is a stray light component at an exposure field of the second projection objective and/or a variation of the stray light component at the exposure field of the second projection objective. The second projection objective is different from the projection objective.

    摘要翻译： 公开了一种用于微光刻的投影物镜，具有投影物镜的微光刻投影曝光设备，微结构元件的微光刻制造方法以及使用这种制造方法制造的元件。 投影物镜包括一个光学元件，其被构造成使得在投影物镜的使用期间，光学元件在投影物镜的曝光区域中产生杂散光分量，该投射物镜将投射物镜的参数适应于第二投影物镜的参数 。 该参数是在投影物镜的曝光场处的杂散光分量和/或投影物镜的曝光场处的杂散光分量的变化。 第二投影物镜的参数是在第二投影物镜的曝光场处的杂散光分量和/或第二投影物镜的曝光场处的杂散光分量的变化。 第二个投影目标与投影目标不同。

    Objective with crystal lenses
    8.
    发明申请
    Objective with crystal lenses 有权
    目标水晶镜片

    公开(公告)号：US20050157401A1

    公开(公告)日：2005-07-21

    申请号：US10931745

    申请日：2004-09-01

    申请人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    发明人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    IPC分类号： G02B1/02 ,  G02B5/30 ,  G03F7/20 ,  G02B21/02

    CPC分类号： G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G02B13/14 ,  G02B27/0043 ,  G02B27/286 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

    摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

    摘要翻译： 目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。 在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。 双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    9.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置

    公开(公告)号：US20090073398A1

    公开(公告)日：2009-03-19

    申请号：US12210514

    申请日：2008-09-15

    申请人： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

    发明人： Michael Totzeck ,  Aksel Goehnermeier ,  Wolfgang Singer ,  Helmut Beierl ,  Heiko Feldmann ,  Hans-Juergen Mann ,  Jochen Hetzler

    IPC分类号： G03B27/52 ,  G03B27/72

    CPC分类号： G03F7/70308 ,  G03F7/70216 ,  G03F7/70566

    摘要： The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.

    摘要翻译： 本发明涉及微光刻投影曝光装置和微光刻投影曝光装置，以及通过该方法制造的相关部件，方法和制品。 微光刻投影曝光装置包括照明系统和投影物镜。 照明系统可以照亮布置在投影物镜的物平面中的掩模。 掩模可以具有待成像的结构。 该方法可以包括用光照射照明系统的光瞳平面。 该方法还可以包括在投影物镜的平面中修改通过该平面的光的相位，幅度和/或极化。 可以以相互不同的方式对至少两个衍射级进行修改。 与没有修改的方法相比，在结构成像中获得的掩模诱导的图像对比损失可以减少。

    Objective with crystal lenses
    10.
    发明申请
    Objective with crystal lenses 审中-公开
    目标水晶镜片

    公开(公告)号：US20070242250A1

    公开(公告)日：2007-10-18

    申请号：US11765200

    申请日：2007-06-19

    申请人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    发明人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

    IPC分类号： G02B27/28 ,  G03B27/52 ,  H01L21/00

    CPC分类号： G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G02B13/14 ,  G02B27/0043 ,  G02B27/286 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

    摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

    摘要翻译： 目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。 在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。 双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。