公开(公告)号：US06228552B1

公开(公告)日：2001-05-08

申请号：US08927411

申请日：1997-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Makoto Nakase

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Makoto Nakase

IPC分类号： G03F7021

CPC分类号： G03F7/0212 ,  G03F7/0045 ,  G03F7/0233 ,  G03F7/095 ,  G03F7/2024

摘要： A photosensitive material, which comprises, an alkali-soluble resin moiety having an alicyclic skeleton, a polycyclic condensation skeleton, or both alicyclic and polycyclic condensation skeletons, and a diazo compound moiety. The diazo compound moiety may be contained in a side chain of the alkali-soluble resin moiety or included in the photosensitive material in separate from the alkali-soluble resin moiety.

摘要翻译： 一种感光材料，其包含具有脂环骨架的碱可溶性树脂部分，多环缩合骨架或脂环族和多环缩合骨架以及重氮化合物部分。 重氮化合物部分可以包含在碱溶性树脂部分的侧链中，或者包含在与碱溶性树脂部分分开的感光材料中。

公开(公告)号：US07163781B2

公开(公告)日：2007-01-16

申请号：US10937853

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/20 ,  G03F7/30 ,  G03F7/36

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性均优异的抗蚀剂图案。

公开(公告)号：US20050048400A1

公开(公告)日：2005-03-03

申请号：US10937832

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

公开(公告)号：US06541597B2

公开(公告)日：2003-04-01

申请号：US09884977

申请日：2001-06-21

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： C08G6302

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

公开(公告)号：US06291129B1

公开(公告)日：2001-09-18

申请号：US09143533

申请日：1998-08-28

申请人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

发明人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

IPC分类号： G03C173

CPC分类号： G03F7/0397 ,  C08F246/00 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3  (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.

摘要翻译： 由以下通式（m-1）表示的单体：其中R是具有脂环骨架的基团，R 2可以相同或不同，分别为氢原子，卤素原子或一价有机基团，X 1为二价有机基团 含有杂原子，j为0〜3的整数，R1为选自下列基团的基团，具有Si（R1-1）的一价有机基团，X2和X3中的任一个为含有杂原子的二价有机基团，k m为0〜3的整数，R4为二价烷基，R6可以相同或不同，分别为氢原子，卤素原子或一价有机基团。

公开(公告)号：US06280897B1

公开(公告)日：2001-08-28

申请号：US08997623

申请日：1997-12-23

申请人： Koji Asakawa ,  Naoko Kihara ,  Naomi Shida ,  Toru Ushirogouchi ,  Takeshi Okino ,  Makoto Nakase ,  Takuya Naito ,  Satoshi Saito

发明人： Koji Asakawa ,  Naoko Kihara ,  Naomi Shida ,  Toru Ushirogouchi ,  Takeshi Okino ,  Makoto Nakase ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03F7004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.

摘要翻译： 一种感光性组合物，其含有具有下述通式（1A）表示的重复链段的聚合物和能够通过照射光化辐射而产生酸的化合物。其中，R 11为氢原子，脂肪族烃基，烷氧基 基团，卤素原子或氰基，R 12是脂族烃基或环状烯烃，R 13是（a）具有2〜12个碳原子的直链烯烃，环状烯烃或杂环基中的任一种和（ b）由 - （CH 2）m - （m为3〜9的整数）表示的烃基，R 14为亲水性基团。

公开(公告)号：US07119156B2

公开(公告)日：2006-10-10

申请号：US10937313

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/04

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

公开(公告)号：US20050031991A1

公开(公告)日：2005-02-10

申请号：US10937853

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性均优异的抗蚀剂图案。

公开(公告)号：US20050031990A1

公开(公告)日：2005-02-10

申请号：US10937577

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性均优异的抗蚀剂图案。

公开(公告)号：US06303266B1

公开(公告)日：2001-10-16

申请号：US09401181

申请日：1999-09-23

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7004

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。