公开(公告)号：US06410748B1

公开(公告)日：2002-06-25

申请号：US09847387

申请日：2001-05-03

申请人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

发明人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

IPC分类号： C07D20948

CPC分类号： G03F7/0397 ,  C08F246/00 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3  (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.

摘要翻译： 由以下通式（m-1）表示的单体：其中R是具有脂环骨架的基团，R 2可以相同或不同，分别为氢原子，卤素原子或一价有机基团，X 1为二价有机基团 含有杂原子，j为0〜3的整数，R1为选自下列基团的基团，具有Si（R1-1）的一价有机基团，X2和X3中的任一个为含有杂原子的二价有机基团，k m为0〜3的整数，R4为二价烷基，R6可以相同或不同，分别为氢原子，卤素原子或一价有机基团。

公开(公告)号：US5932391A

公开(公告)日：1999-08-03

申请号：US697009

申请日：1996-08-16

申请人： Toru Ushirogouchi ,  Koji Asakawa ,  Naoko Kihara ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

发明人： Toru Ushirogouchi ,  Koji Asakawa ,  Naoko Kihara ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/021

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A resist for alkali development, which comprises an alicyclic compound attached with an acidic substituent group exhibiting pKa of 7 to 11 in an aqueous solution of 25.degree. C. This alicyclic compound is preferably a copolymer comprising as a comonomer component a vinyl compound and exhibiting a light absorbency of 3 or less per 1 .mu.m to the light of 193 nm in wavelength.

摘要翻译： 一种碱显影用抗蚀剂，其包含在25℃的水溶液中具有表现出pKa为7〜11的酸性取代基的脂环族化合物。该脂环族化合物优选为包含乙烯基化合物作为共聚单体成分的共聚物， 对于波长为193nm的光，每1μm的光吸收率为3以下。

公开(公告)号：US06228552B1

公开(公告)日：2001-05-08

申请号：US08927411

申请日：1997-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Makoto Nakase

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Makoto Nakase

IPC分类号： G03F7021

CPC分类号： G03F7/0212 ,  G03F7/0045 ,  G03F7/0233 ,  G03F7/095 ,  G03F7/2024

摘要： A photosensitive material, which comprises, an alkali-soluble resin moiety having an alicyclic skeleton, a polycyclic condensation skeleton, or both alicyclic and polycyclic condensation skeletons, and a diazo compound moiety. The diazo compound moiety may be contained in a side chain of the alkali-soluble resin moiety or included in the photosensitive material in separate from the alkali-soluble resin moiety.

摘要翻译： 一种感光材料，其包含具有脂环骨架的碱可溶性树脂部分，多环缩合骨架或脂环族和多环缩合骨架以及重氮化合物部分。 重氮化合物部分可以包含在碱溶性树脂部分的侧链中，或者包含在与碱溶性树脂部分分开的感光材料中。

公开(公告)号：US06291129B1

公开(公告)日：2001-09-18

申请号：US09143533

申请日：1998-08-28

申请人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

发明人： Naomi Shida ,  Toru Ushirogouchi ,  Koji Asakawa ,  Takeshi Okino ,  Shuji Hayase ,  Yoshihiko Nakano ,  Makoto Nakase

IPC分类号： G03C173

CPC分类号： G03F7/0397 ,  C08F246/00 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115

摘要： A monomer represented by the following general formula (m-1): wherein R is a group having an alicyclic skeleton, R2s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group, X1 is a bivalent organic group containing a heteroatom, j is an integer of 0 to 3, and R1 is a group selected from the following groups, a monovalent organic group having Si (R1-1), and —(X2)k—R4—(X3)m—C(R6)3  (R1-2), wherein X2 and X3 are a bivalent organic group containing a heteroatom, k and m are an integer of 0 to 3, R4 is a bivalent alkyl group, R6s may be the same or different and are individually hydrogen atom, halogen atom or monovalent organic group.

摘要翻译： 由以下通式（m-1）表示的单体：其中R是具有脂环骨架的基团，R 2可以相同或不同，分别为氢原子，卤素原子或一价有机基团，X 1为二价有机基团 含有杂原子，j为0〜3的整数，R1为选自下列基团的基团，具有Si（R1-1）的一价有机基团，X2和X3中的任一个为含有杂原子的二价有机基团，k m为0〜3的整数，R4为二价烷基，R6可以相同或不同，分别为氢原子，卤素原子或一价有机基团。

公开(公告)号：US06280897B1

公开(公告)日：2001-08-28

申请号：US08997623

申请日：1997-12-23

申请人： Koji Asakawa ,  Naoko Kihara ,  Naomi Shida ,  Toru Ushirogouchi ,  Takeshi Okino ,  Makoto Nakase ,  Takuya Naito ,  Satoshi Saito

发明人： Koji Asakawa ,  Naoko Kihara ,  Naomi Shida ,  Toru Ushirogouchi ,  Takeshi Okino ,  Makoto Nakase ,  Takuya Naito ,  Satoshi Saito

IPC分类号： G03F7004

CPC分类号： G03F7/038 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.

摘要翻译： 一种感光性组合物，其含有具有下述通式（1A）表示的重复链段的聚合物和能够通过照射光化辐射而产生酸的化合物。其中，R 11为氢原子，脂肪族烃基，烷氧基 基团，卤素原子或氰基，R 12是脂族烃基或环状烯烃，R 13是（a）具有2〜12个碳原子的直链烯烃，环状烯烃或杂环基中的任一种和（ b）由 - （CH 2）m - （m为3〜9的整数）表示的烃基，R 14为亲水性基团。

公开(公告)号：US6071670A

公开(公告)日：2000-06-06

申请号：US948425

申请日：1997-10-10

申请人： Toru Ushirogouchi ,  Takeshi Okino ,  Naomi Shida ,  Makoto Nakase ,  Yoshiaki Kawamonzen ,  Rumiko Hayase ,  Koji Asakawa

发明人： Toru Ushirogouchi ,  Takeshi Okino ,  Naomi Shida ,  Makoto Nakase ,  Yoshiaki Kawamonzen ,  Rumiko Hayase ,  Koji Asakawa

IPC分类号： G03F7/004 ,  G03F7/039

CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/107 ,  Y10S430/109

摘要： A photosensitive composition comprising, an oligomer having a backbone chain comprising an alicyclic skeleton and/or a conjugated polycondensed aromatic skeleton, the backbone chain being acid-decomposable or hydrolyzable, and a photo-acid-generating agent.

摘要翻译： 一种光敏组合物，其包含具有包含脂环骨架和/或共轭缩聚芳族骨架的主链的低聚物，所述主链是酸可分解的或可水解的，以及光酸产生剂。

公开(公告)号：US6045968A

公开(公告)日：2000-04-04

申请号：US98537

申请日：1998-06-17

申请人： Toru Ushirogouchi ,  Koji Asakawa ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

发明人： Toru Ushirogouchi ,  Koji Asakawa ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

IPC分类号： C08L61/04 ,  C08L61/10 ,  G03F7/004 ,  G03F7/023 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0236 ,  Y10S430/106 ,  Y10S430/111

摘要： A photosensitive composition contains an acid-decomposable resin, a photo-acid-generating agent, and a naphthol novolak compound with a molecular weight of 2000 or less. The acid-decomposable resin is preferably a copolymer consisting of a polymerizable compound having an alicyclic skeleton as a monomer.

摘要翻译： 感光性组合物含有酸分解性树脂，光酸产生剂和分子量为2000以下的萘酚酚醛清漆化合物。 酸分解性树脂优选为具有作为单体的脂环式骨架的聚合性化合物的共聚物。

公开(公告)号：US5837419A

公开(公告)日：1998-11-17

申请号：US705260

申请日：1996-08-29

申请人： Toru Ushirogouchi ,  Koji Asakawa ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

发明人： Toru Ushirogouchi ,  Koji Asakawa ,  Makoto Nakase ,  Naomi Shida ,  Takeshi Okino

IPC分类号： C08L61/04 ,  C08L61/10 ,  G03F7/004 ,  G03F7/023 ,  G03F7/033 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0236 ,  Y10S430/106 ,  Y10S430/111

摘要： A photosensitive composition contains an acid-decomposable resin, a photo-acid-generating agent, and a naphthol novolak compound with a molecular weight of 2000 or less. The acid-decomposable resin is preferably a copolymer consisting of a polymerizable compound having an alicyclic skeleton as a monomer.

公开(公告)号：US20050037284A1

公开(公告)日：2005-02-17

申请号：US10937357

申请日：2004-09-10

申请人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

发明人： Takeshi Okino ,  Koji Asakawa ,  Naomi Shida ,  Toru Ushirogouchi ,  Satoshi Saito

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03C1/76

CPC分类号： G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。

公开(公告)号：USRE38256E1

公开(公告)日：2003-09-23

申请号：US09448977

申请日：1999-11-24

申请人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

发明人： Toru Ushirogouchi ,  Naomi Shida ,  Takuya Naito ,  Koji Asakawa ,  Akinori Hongu ,  Makoto Nakase ,  Hirokazu Niki

IPC分类号： G03F7021

CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0215 ,  G03F7/038 ,  Y10S430/107 ,  Y10S430/11 ,  Y10S430/111

摘要： Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin. This water-soluble photosensitive composition is coated on a substrate and irradiated with light or ionizing radiation in accordance with a desired pattern. The resultant substrate is chemically amplified by heating and developed with water. This makes it possible to safely form a pattern without using any ventilator.