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    Positive photosensitive material
    11.
    发明授权
    Positive photosensitive material 有权
    正感光材料

    公开(公告)号：US09012126B2

    公开(公告)日：2015-04-21

    申请号：US13524790

    申请日：2012-06-15

    申请人： Weihong Liu ,  PingHung Lu ,  Chunwei Chen ,  Stephen Meyer ,  Medhat Toukhy ,  SookMee Lai

    发明人： Weihong Liu ,  PingHung Lu ,  Chunwei Chen ,  Stephen Meyer ,  Medhat Toukhy ,  SookMee Lai

    IPC分类号： G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/004 ,  G03F7/0392 ,  G03F7/0397

    摘要： The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.

    摘要翻译： 本发明涉及一种新型的正性光敏组合物，其具有：至少一种光致酸发生剂; 至少一种酚醛清漆聚合物; 至少一种具有聚合物主链的聚合物，所述聚合物包含下式的结构：其中R 1 -R 5独立地是-H或-CH 3，A是直链或支链C 1 -C 10亚烷基，B是C1 -C 12烷基或脂环基，D是可以是化学键的连接基团，其中羰基碳键合到聚合物主链上的羧酸酯基团或-COOCH 2 - 基团，其中羰基碳键合到聚合物上 骨架，Ar是取代或未取代的芳基或杂芳基，E是直链或支链C 2 -C 10亚烷基，G是酸可裂解基团。 本发明还涉及使用该组合物形成图像的方法。