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公开(公告)号：US06872260B2
公开(公告)日：2005-03-29
申请号：US09813129
申请日：2001-03-21
CPC分类号： C23C14/505 , H01F1/0556 , H01F41/026
摘要： With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient formation of the deposited film on the surface of each of the work pieces accommodated in the tubular barrel and the inhibition of the softening of the formed film can be achieved simultaneously. Therefore, it is possible to inhibit the damaging of the deposited film formed on the surface of each of the work pieces and the production of projections on the deposited film, and to form a deposited film at a high quality in respect of a corrosion resistance and the like and at low cost.With the deposited-film forming apparatus according to the second embodiment of the present invention, the distance between the accommodating section defined in the tubular barrel and the evaporating section can be varied and hence, this deposited-film forming apparatus also exhibits an effect similar to that in the deposited-film forming apparatus according to the first embodiment of the present invention.
摘要翻译： 利用根据本发明第一实施例的沉积膜形成装置，可以改变管状筒和蒸发部之间的距离，这与现有技术的沉积膜形成装置不同，因此有效地形成沉积膜 在容纳在管状筒体中的每个工件的表面上，可以同时实现对形成的膜的软化的抑制。 因此，可以抑制在每个工件的表面上形成的沉积膜的破坏和沉积膜上的突起的产生，并且在耐腐蚀性方面形成高质量的沉积膜， 通过根据本发明第二实施例的沉积膜形成装置，可以改变限定在管状筒体中的容纳部分与蒸发部分之间的距离，因此该沉积膜形成 装置也表现出与根据本发明的第一实施例的沉积膜形成装置类似的效果。
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12.发明授权Surface treating process, surface treating apparatus, vapor-depositing material, and rare earth metal-based permanent magnet with surface treated 有权表面处理工艺，表面处理装置，气相沉积材料和表面处理的稀土金属基永磁体公开(公告)号：US06617044B2
公开(公告)日：2003-09-09
申请号：US10094650
申请日：2002-03-12
IPC分类号： B32B900
CPC分类号： C23C14/223 , C23C14/16 , C23C14/246 , C23C14/505 , H01F41/026 , Y10S428/928 , Y10S428/938 , Y10T428/12063 , Y10T428/12465 , Y10T428/12778
摘要： A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. In addition, the use of the surface treating process ensures that a corrosion resistance can be provided to a rare earth metal-based permanent magnet extremely liable to be oxidized, without degradation of a high magnetic characteristic of the magnet. A surface treating apparatus according to the present invention includes a melting/evaporating source for melting and evaporating a wire-shaped vapor-depositing material containing a vapor deposition controlling gas, and a member for retaining a work on which the vapor-depositing material is deposited. The melting/evaporating source and the work retaining member are disposed in a treating chamber of the surface treating chamber. The apparatus further includes a vapor-depositing material supply means for supplying the wire-shaped vapor-depositing material containing the vapor deposition controlling gas to the melting-evaporating source.
摘要翻译： 根据本发明的表面处理方法，通过在已经供应气相沉积控制气体的状态下蒸发气相沉积材料，通过易于氧化的气相沉积材料在工件表面上形成气相沉积膜 至少在熔化/蒸发源附近的区域和处理室内的工作。 因此，可以在期望的工件的表面上稳定地形成蒸镀膜，而不需要长时间提供高真空度并且不需要特殊的装置。 此外，通过使用表面处理工序，能够确保对极易于氧化的稀土类金属系永磁体提供耐腐蚀性，而不会降低磁铁的高磁特性。 根据本发明的表面处理装置包括用于熔化和蒸发含有气相沉积控制气体的线状气相沉积材料的熔化/蒸发源，以及用于保持沉积有沉积材料的工件的构件 。 熔化/蒸发源和工件保持构件设置在表面处理室的处理室中。 该装置还包括用于将含有蒸镀控制气体的线状气相沉积材料供给到熔化蒸发源的气相沉积材料供给装置。
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公开(公告)号：US06391386B1
公开(公告)日：2002-05-21
申请号：US09568580
申请日：2000-05-11
IPC分类号： C23C1600
CPC分类号： C23C14/223 , C23C14/16 , C23C14/246 , C23C14/505 , H01F41/026 , Y10S428/928 , Y10S428/938 , Y10T428/12063 , Y10T428/12465 , Y10T428/12778
摘要： A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. In addition, the use of the surface treating process ensures that a corrosion resistance can be provided to a rare earth metal-based permanent magnet extremely liable to be oxidized, without degradation of a high magnetic characteristic of the magnet.
摘要翻译： 根据本发明的表面处理方法，通过在已经供应气相沉积控制气体的状态下蒸发气相沉积材料，通过易于氧化的气相沉积材料在工件表面上形成气相沉积膜 至少在熔化/蒸发源附近的区域和处理室内的工作。 因此，可以在期望的工件的表面上稳定地形成蒸镀膜，而不需要长时间提供高真空度并且不需要特殊的装置。 此外，通过使用表面处理工序，能够确保对极易于氧化的稀土类金属系永磁体提供耐腐蚀性，而不会降低磁铁的高磁特性。
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公开(公告)号：US07270714B2
公开(公告)日：2007-09-18
申请号：US10615381
申请日：2003-07-09
IPC分类号： C23C14/24
CPC分类号： C23C14/223 , C23C14/16 , C23C14/246 , C23C14/505 , H01F41/026 , Y10S428/928 , Y10S428/938 , Y10T428/12063 , Y10T428/12465 , Y10T428/12778
摘要： A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. In addition, the use of the surface treating process ensures that a corrosion resistance can be provided to a rare earth metal-based permanent magnet extremely liable to be oxidized, without degradation of a high magnetic characteristic of the magnet. A surface treating apparatus according to the present invention includes a melting/evaporating source for melting and evaporating a wire-shaped vapor-depositing material containing a vapor deposition controlling gas, and a member for retaining a work on which the vapor-depositing material is deposited. The melting/evaporating source and the work retaining member are disposed in a treating chamber of the surface treating chamber. The apparatus further includes a vapor-depositing material supply means for supplying the wire-shaped vapor-depositing material containing the vapor deposition controlling gas to the melting-evaporating source.
摘要翻译： 根据本发明的表面处理方法，通过在已经供应气相沉积控制气体的状态下蒸发气相沉积材料，通过易于氧化的气相沉积材料在工件表面上形成气相沉积膜 至少在熔化/蒸发源附近的区域和处理室内的工作。 因此，可以在期望的工件的表面上稳定地形成蒸镀膜，而不需要长时间提供高真空度并且不需要特殊的装置。 此外，通过使用表面处理工序，能够确保对极易于氧化的稀土类金属系永磁体提供耐腐蚀性，而不会降低磁铁的高磁特性。 根据本发明的表面处理装置包括用于熔化和蒸发含有气相沉积控制气体的线状气相沉积材料的熔化/蒸发源，以及用于保持沉积有沉积材料的工件的构件 。 熔化/蒸发源和工件保持构件设置在表面处理室的处理室中。 该装置还包括用于将含有蒸镀控制气体的线状气相沉积材料供给到熔化蒸发源的气相沉积材料供给装置。
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公开(公告)号：US06861089B2
公开(公告)日：2005-03-01
申请号：US10311353
申请日：2001-07-06
CPC分类号： C23C14/223 , C23C14/505 , C23C14/541 , H01F41/026
摘要： A method of inhibiting production of projections in a metal deposited-film according to the present invention is characterized by using a vapor deposition apparatus comprising, in a vacuum-treating chamber, an evaporating section for a depositing material, and an accommodating member and/or a holding member for accommodation and/or hold of work pieces, respectively, and, in depositing a metal depositing material on each of the surface of the work pieces with the accommodating member and/or the holding member being made rotated about the horizontal rotational axis thereof, carrying out vapor deposition with a Vickers hardness of a film formed on each of the surface of the work pieces maintained at 25 or more. According to the present invention, production of projections in a metal deposited-film can be effectively inhibited when forming the metal deposited-film of aluminum, zinc or the like on the surface of a work piece such as a rare earth metal-based permanent magnet.
摘要翻译： 根据本发明的抑制在金属沉积膜中产生突起的方法的特征在于使用一种蒸镀装置，在真空处理室中包括用于沉积材料的蒸发部分和一个容纳部件和/或 用于分别容纳和/或保持工件的保持构件，并且在使工件的每个表面上沉积金属沉积材料的同时，使容纳构件和/或保持构件围绕水平旋转轴线旋转 进行蒸镀，其中维氏硬度为维氏25度以上的工件表面上形成的膜。 根据本发明，当在诸如稀土金属基永磁体的工件的表面上形成铝，锌等的金属沉积膜时，可以有效地抑制金属沉积膜中的突起的制造 。
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公开(公告)号：US06821560B2
公开(公告)日：2004-11-23
申请号：US09883334
申请日：2001-06-19
IPC分类号： C23C1450
CPC分类号： C23C14/505
摘要： A surface-treating support member for supporting a plurality of works, including an upper cage and a lower cage including a plurality of compartments, so that the cages are openable and closeable in a lengthwise direction. A process for surface-treating a plurality of works rotates the works about their axes using the support member.
摘要翻译： 一种用于支撑多个工件的表面处理支撑构件，包括具有多个隔室的上保持架和下保持架，使得所述保持架能够沿长度方向打开和关闭。 用于表面处理多个作品的处理使用支撑构件围绕其轴旋转作品。
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17.发明授权公开(公告)号：US06280792B1
公开(公告)日：2001-08-28
申请号：US09407304
申请日：1999-09-29
IPC分类号： C23C1644
CPC分类号： C23C14/505
摘要： A process for surface-treating a plurality of works which includes the step of surface-treating the works in a treating chamber, while rotating the works about their axes in spaced apart states, wherein the surface treatment is a vapor deposition on a sintered article and the support member includes plate-like elements openably and closably foldable in a lengthwise direction, the plate-like elements defining a plurality of narrow sections each having a length in opened states corresponding to an inside diameter of a work. The support member may also include an upper cage and a lower cage which are openable and closable in a lengthwise direction.
摘要翻译： 一种用于表面处理多个工件的方法，其包括在处理室中对工件进行表面处理的步骤，同时围绕其轴线间隔开的状态旋转工件，其中表面处理是在烧结制品上的气相沉积， 支撑构件包括沿长度方向可开启和关闭地折叠的板状元件，板状元件限定多个狭窄部分，每个狭窄部分具有对应于工件内径的打开状态的长度。 支撑构件还可以包括在长度方向上可打开和关闭的上保持架和下保持架。
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18.发明授权公开(公告)号：US06878210B2
公开(公告)日：2005-04-12
申请号：US09883232
申请日：2001-06-19
IPC分类号： C23C14/50 , C23C14/24 , C23C16/458 , H01L21/00 , C23C16/00
CPC分类号： C23C14/505
摘要： A surface treating holder includes a wire which is coiled at distances in such a manner that it is formed as a spring-like tubular structure having spiral-line faces at opposite ends thereof, so that works are accommodated in the tubular structure. A process for surface-treating a pluarlity of works accommodates the works in the holder, and surface treating the works in the holder while being rotated about an axis of the works.
摘要翻译： 表面处理保持器包括线材，该线材以这样的方式卷绕，使得其形成为在其相对端处具有螺旋线面的弹簧状管状结构，使得工程容纳在管状结构中。 用于表面处理工程的方法可容纳保持器中的工件，并且在围绕工件的轴线旋转的同时对保持器中的工件进行表面处理。
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