Overhang-compensating annular plating layer in through hole of component carrier

    公开(公告)号:US11510316B2

    公开(公告)日:2022-11-22

    申请号:US17249339

    申请日:2021-02-26

    发明人: Abderrazzaq Ifis

    IPC分类号: H05K1/11 H05K3/42 H05K3/00

    摘要: A component carrier with an electrically insulating layer having a front side and a back side, a first and a second electrically conductive layer covering the front side and the back side of the electrically insulating layer, respectively. A through hole extends through both electrically conductive layers and the electrically insulating layer. An overhang is formed along one of the electrically conductive layers and sidewalls of the electrically insulating layer structure delimiting the through hole. An annular plating layer covers the sidewalls and fills part of the overhang such that a horizontal extension of the overhang after plating is less than 20 μm and/or such that a ratio between a horizontal extension of the overhang after plating and a width of a first window through the first electrically conductive layer and/or a width of a second window through the second electrically conductive layer is smaller than 20%.

    Component carrier and method of manufacturing a component carrier

    公开(公告)号:US11445601B2

    公开(公告)日:2022-09-13

    申请号:US17247832

    申请日:2020-12-24

    摘要: A component carrier includes a stack having at least one electrically conductive layer structure, a first electrically insulating layer structure and a second electrically insulating layer structure. The first electrically insulating layer structure is made of a material which has first physical properties. The second electrically insulating layer structure is made of another material which has second physical properties differing from the first physical properties. The first electrically insulating layer structure and the second electrically insulating layer structure are at least partially in direct physical contact with each other. A method of manufacturing a component carrier is also disclosed.

    Solder-Free Component Carrier Connection Using an Elastic Element and Method

    公开(公告)号:US20220158366A1

    公开(公告)日:2022-05-19

    申请号:US17649969

    申请日:2022-02-04

    摘要: An arrangement is illustrated and described. The arrangement includes a component carrier including ia) a stack with at least one electrically conductive layer structure and/or at least one electrically insulating layer structure, and ib) at least one elastic element attached to the stack and configured to reversibly connect the component carrier with a further component carrier by elastically deforming the at least one elastic element and essentially not deforming the stack and the further component carrier; ii) the further component carrier connected with the component carrier by the at least one elastic element, wherein the further component carrier includes: iia) a further recess configured such that the component carrier is at least partially placeable into the further recess; iii) the component carrier is a smaller unit than the further component carrier, and iv) the component carrier is at least partially placed into the further recess.

    Component Carrier and Method of Manufacturing the Same

    公开(公告)号:US20210329779A1

    公开(公告)日:2021-10-21

    申请号:US17301756

    申请日:2021-04-13

    发明人: Artan Baftiri

    IPC分类号: H05K1/02 H05K3/46 H05K3/00

    摘要: A component carrier includes a stack having a first electrically insulating layer structure and a first electrically conductive layer structure arranged on the first electrically insulating layer structure. The first electrically insulating layer structure has at least one first covered portion, which is covered by the first electrically conductive layer structure, and at least one first non-covered portion, which is not covered by the first electrically conductive layer structure. The first electrically insulating layer structure defines a recess at the at least one first non-covered portion.

    Anisotropic Etching Using Photosensitive Compound

    公开(公告)号:US20210315104A1

    公开(公告)日:2021-10-07

    申请号:US17301130

    申请日:2021-03-25

    发明人: Jolanta Klocek

    IPC分类号: H05K3/06

    摘要: A method of etching an electrically conductive layer structure during manufacturing a component carrier is provided. The method includes subjecting the electrically conductive layer structure to an etching composition having an etchant and a photosensitive compound to thereby form a recess in the electrically conductive layer structure; while, at least for a part of time, irradiating and/or heating the recess. In addition, an apparatus for etching an electrically conductive layer structure during manufacturing a component carrier, an etched electrically conductive layer structure and a component carrier are provided.