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91 条记录 (耗时 0.022 秒)

    Hammer union restoration apparatus
    15.
    发明授权
    Hammer union restoration apparatus 有权
    锤联合修复装置

    公开(公告)号：US09174320B1

    公开(公告)日：2015-11-03

    申请号：US14120520

    申请日：2014-05-28

    申请人： Kevin R. Meyer

    发明人： Kevin R. Meyer

    IPC分类号： B24B21/02 ,  B24B7/10

    CPC分类号： B24B7/10 ,  B24B21/006 ,  B24B21/008 ,  B24B21/16 ,  B24B27/0076 ,  B24B27/0084

    摘要： The present invention relates to a hammer union restoration apparatus wherein a main sanding unit is mounted to a base. The main sanding unit including a sander for sanding the four side faces of a lug formed on the hammer union. The sander being resiliently movable in a direction away from a side face of the lug. The sander is movable under control of a motor to rotate the sander relative to the lug around the four faces of the lug with the sander floating across the corner edges of the four faces. The present invention further includes a sander for sanding the end face of the lug.

    摘要翻译： 本发明涉及一种锤组合修复装置，其中主砂磨装置安装在底座上。 主打磨单元包括砂磨机，用于打磨在锤结合体上形成的凸耳的四个侧面。 砂光机可以在远离凸耳的侧面的方向上弹性移动。 砂光机可以在电动机的控制下移动，以使磨砂机相对于凸耳四周的凸缘旋转，砂磨机漂浮在四个面的拐角边缘上。 本发明还包括一个砂光机，用于打磨凸耳的端面。

    Polishing apparatus and polishing method
    16.
    发明授权
    Polishing apparatus and polishing method 有权
    抛光设备和抛光方法

    公开(公告)号：US08986069B2

    公开(公告)日：2015-03-24

    申请号：US13459421

    申请日：2012-04-30

    申请人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    发明人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    IPC分类号： B24B9/00 ,  B24B1/00 ,  B24B21/00 ,  B24B9/06 ,  B24B37/04 ,  B24B37/30

    CPC分类号： B24B21/002 ,  B24B9/065 ,  B24B21/004 ,  B24B21/008 ,  B24B21/20 ,  B24B27/0076 ,  B24B37/042 ,  B24B37/30 ,  B24B41/068 ,  B24B49/00 ,  Y10T428/24777

    摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

    摘要翻译： 抛光装置抛光基板的周边。 该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带 以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。 胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。

    Surface Processing System for a Work Piece
    17.
    发明申请
    Surface Processing System for a Work Piece 有权
    工件表面处理系统

    公开(公告)号：US20150044944A1

    公开(公告)日：2015-02-12

    申请号：US14341785

    申请日：2014-07-26

    申请人： Qiyue Chen

    发明人： Qiyue Chen

    IPC分类号： B24B27/00 ,  B24B21/00

    CPC分类号： B24B27/0076 ,  B23Q7/047 ,  B23Q39/027 ,  B24B21/006 ,  B24B21/008 ,  B24B21/12 ,  B24B21/20 ,  B24B27/0023 ,  B24B27/0069 ,  B24B41/005 ,  B24B41/06 ,  B24B55/04 ,  B25J11/0065

    摘要： The present invention provides a surface processing system for a work piece in the mechanical technical field. The system comprises at least one group of polishing units. A manipulator and several polishers with different polishing precisions are provided on the polishing units. The polishers are arranged around the manipulator in turn. The work piece could be moved by the manipulator between the processing center and the polishing units. The machined work piece is loaded by the manipulator for one time when the manipulator is located at the processing center. When the manipulator is located at the polishing units, the manipulator keeps holding the work piece and transfers the work piece in a preset sequence to each polisher corresponding to the polishing unit where the manipulator is located. The surface of work pieces having different wall thicknesses and complex surfaces could be processed in a large batch with a high efficiency.

    摘要翻译： 本发明提供了一种在机械技术领域中用于工件的表面处理系统。 该系统包括至少一组抛光单元。 在抛光单元上提供了具有不同抛光精度的操纵器和多个抛光机。 抛光机依次安排在机械手周围。 工件可以通过操纵器在处理中心和抛光单元之间移动。 当操纵器位于加工中心时，加工的工件由操纵器装载一次。 当操纵器位于抛光单元时，操纵器保持保持工件并按预设的顺序将工件传送到对应于操纵器所在的抛光单元的每个抛光机。 具有不同壁厚和复杂表面的工件表面可以以大批量高效率地加工。

    Glass edge finish system, belt assembly, and method for using same
    18.
    发明授权
    Glass edge finish system, belt assembly, and method for using same 有权
    玻璃边缘整理系统，皮带组装及其使用方法

    公开(公告)号：US08540551B2

    公开(公告)日：2013-09-24

    申请号：US12968586

    申请日：2010-12-15

    申请人： James W. Brown ,  Jerome T. Firlik ,  Siva Venkatachalam ,  Liming Wang ,  Naiyue Zhou

    发明人： James W. Brown ,  Jerome T. Firlik ,  Siva Venkatachalam ,  Liming Wang ,  Naiyue Zhou

    IPC分类号： B24B1/00

    CPC分类号： B24B9/102 ,  B24B21/002 ,  B24B21/008

    摘要： A glass edge finishing system, a belt assembly and a method are described herein for finishing an edge of a glass sheet. The glass edge finishing system comprises: (a) a base; and (b) one or more belt assemblies located on the base, where each belt assembly includes: (i) a support frame; (ii) a motor; (iii) a pair of pulleys rotatably mounted on the support frame and driven by the motor; (iv) a belt engaged to and driven by the pair of pulleys, where the belt contacts and finishes the edge of the glass sheet; (v) a belt cleaning device that removes glass debris from the belt as the belt moves past the belt cleaning device; and (vi) a cleaning containment enclosure within which there is located the belt cleaning device, where the cleaning containment enclosure contains the glass debris removed from the belt by the belt cleaning device.

    摘要翻译： 本文描述了玻璃边缘整理系统，带组件和方法来完成玻璃板的边缘。 玻璃边缘整理系统包括：（a）底座; 和（b）位于基座上的一个或多个皮带组件，其中每个皮带组件包括：（i）支撑框架; （ii）电机; （iii）可旋转地安装在支撑框架上并由电动机驱动的一对皮带轮; （iv）接合并由所述一对滑轮驱动的皮带，所述皮带接触并完成所述玻璃板的边缘; （v）皮带清洁装置，当皮带移动通过皮带清洁装置时，该皮带清洁装置从皮带上移除玻璃碎片; 和（vi）清洁容纳外壳，其中位于皮带清洁装置中，其中清洁容纳外壳包含通过皮带清洁装置从皮带上移除的玻璃碎片。

    POLISHING APPARATUS AND POLISHING METHOD
    19.
    发明申请
    POLISHING APPARATUS AND POLISHING METHOD 有权
    抛光装置和抛光方法

    公开(公告)号：US20120244787A1

    公开(公告)日：2012-09-27

    申请号：US13308857

    申请日：2011-12-01

    申请人： Masaya SEKI ,  Tetsuji TOGAWA ,  Masayuki NAKANISHI ,  Naoki MATSUDA ,  Atsushi YOSHIDA

    发明人： Masaya SEKI ,  Tetsuji TOGAWA ,  Masayuki NAKANISHI ,  Naoki MATSUDA ,  Atsushi YOSHIDA

    IPC分类号： B24B21/06

    CPC分类号： B24B21/002 ,  B24B9/065 ,  B24B21/004 ,  B24B21/006 ,  B24B21/008 ,  B24B21/20

    摘要： The polishing apparatus has a polishing unit capable of polishing a peripheral portion of the substrate to form a right-angled cross section. The polishing apparatus includes: a substrate holder that holds and rotates the substrate; guide rollers that support a polishing tape; and a polishing head having a pressing member that presses an edge of the polishing tape against the peripheral portion of the substrate from above. The guide rollers are arranged such that the polishing tape extends parallel to a tangential direction of the substrate and a polishing surface of the polishing tape is parallel to a surface of the substrate. The substrate holder includes: a holding stage that holds the substrate; and a supporting stage that supports a lower surface of the peripheral portion of the substrate in its entirety. The supporting stage rotates in unison with the holding stage.

    摘要翻译： 抛光装置具有能够抛光基板的周边部分以形成直角横截面的抛光单元。 抛光装置包括：保持和旋转衬底的衬底保持器; 支撑抛光带的导辊; 以及抛光头，其具有从上方将研磨带的边缘压靠在基板的周边部分的按压部件。 引导辊布置成使得抛光带平行于基板的切线方向延伸，并且抛光带的抛光表面平行于基板的表面。 基板保持器包括：保持基板的保持台; 以及支撑台，其整体地支撑基板周边部分的下表面。 支撑台与保持台一致地旋转。

    Polishing apparatus and polishing method
    20.
    发明授权
    Polishing apparatus and polishing method 有权
    抛光设备和抛光方法

    公开(公告)号：US08187055B2

    公开(公告)日：2012-05-29

    申请号：US12292662

    申请日：2008-11-24

    申请人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    发明人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

    IPC分类号： B24B1/00 ,  B24B49/00

    CPC分类号： B24B21/002 ,  B24B9/065 ,  B24B21/004 ,  B24B21/008 ,  B24B21/20 ,  B24B27/0076 ,  B24B37/042 ,  B24B37/30 ,  B24B41/068 ,  B24B49/00 ,  Y10T428/24777

    摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

    摘要翻译： 抛光装置抛光基板的周边。 该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带 以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。 胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。