公开(公告)号：US20220220423A1

公开(公告)日：2022-07-14

申请号：US17604083

申请日：2020-04-16

申请人： BRISTOL-MYERS SQUIBB COMPANY

发明人： James ANGELO ,  Xuankuo XU

IPC分类号： C11D11/00 ,  B01D15/20 ,  B01D15/38 ,  C11D3/00 ,  C11D7/06 ,  C11D7/26

摘要： The invention provides improved methods of regenerating and using affinity chromatography resin, in particular Protein A affinity chromatography resins.

公开(公告)号：US11377627B2

公开(公告)日：2022-07-05

申请号：US16492338

申请日：2018-01-23

申请人： FUJIMI INCORPORATED

发明人： Yukinobu Yoshizaki ,  Koichi Sakabe ,  Satoru Yarita ,  Kenichi Komoto

IPC分类号： C11D7/34 ,  C11D11/00 ,  C11D7/10 ,  C11D7/20 ,  C11D7/26 ,  C11D7/32 ,  C11D7/36 ,  H01L21/02 ,  B08B1/00 ,  B08B3/02 ,  B08B3/08

摘要： The present invention provides a means by which it is possible to sufficiently suppress an organic residue while favorably decreasing a ceria residue on a polished object to be polished obtained after being polished using a polishing composition containing ceria.
The present invention relates to a composition for surface treatment, which is for a surface treatment of a polished object to be polished obtained after being polished using a polishing composition containing ceria, contains a carboxy group-containing (co)polymer having a structural unit derived from a monomer having a carboxy group or a salt group of the carboxy group, a SOx or NOy partial structure-containing compound having a partial structure represented by SOx or NOy (where x and y each independently denote a real number 1 to 5), and a dispersing medium, and has a pH of 1 or more and 8 or less.

公开(公告)号：US20220154099A1

公开(公告)日：2022-05-19

申请号：US17439521

申请日：2020-03-13

申请人： BASF SE

发明人： Heike BRUESER ,  Ralf PELZER ,  Florian GARLICHS ,  Silke WEYLAND

IPC分类号： C11B9/00 ,  C11D3/50 ,  C11D7/26

摘要： The present invention is directed to the use 4,8,11-dodecatrienal to impart a clean aroma impression to a composition. The present invention is further directed to compositions comprising 4,8,11-dodecatrienal and at least one aroma chemical as well as to compositions comprising 4,8,11-dodecatrienal and at least one further component selected from the group consisting of aroma chemicals, surfactants, oil components, anti-oxidants, deodorant-active agents and solvents, wherein the composition does not comprise 1,5,9-cyclododecatriene.

公开(公告)号：US11326049B2

公开(公告)日：2022-05-10

申请号：US16330034

申请日：2017-08-09

申请人： FUJIMI INCORPORATED

发明人： Jingzhi Chen

IPC分类号： C11D3/37 ,  C11D7/26 ,  C11D7/32 ,  C08L29/04 ,  H01L21/02 ,  C08G61/04 ,  C08L33/02 ,  C08L33/24 ,  C11D11/00 ,  C11D7/22 ,  H01L21/304 ,  C11D3/30 ,  C11D7/34

摘要： To provide a composition for surface treatment capable of treating a surface of a polished object to be polished having both of a silicon-silicon bond and a nitrogen-silicon bond by sufficiently removing defects on the surface of the polished object to be polished. The composition for surface treatment contains a nonionic water-soluble polymer (A) having a main chain including only a carbon atom or a main chain consisting of a carbon atom and a nitrogen atom, and an anionic water-soluble polymer (B) having a main chain including only a carbon atom and a side chain having a sulfonic acid group or a group having a salt thereof or a carboxyl group or a group having a salt thereof, and being bonded to the main chain including only a carbon atom, and the composition is used for surface treatment of a polished object to be polished containing a silicon-silicon bond and a nitrogen-silicon bond and a pH of the composition is less than 9.0.

公开(公告)号：US20220135913A1

公开(公告)日：2022-05-05

申请号：US17430978

申请日：2020-02-14

申请人： NISSAN CHEMICAL CORPORATION

发明人： Hiroshi OGINO ,  Tetsuya SHINJO ,  Ryo KARASAWA ,  Takahisa OKUNO

IPC分类号： C11D11/00 ,  C11D7/50 ,  C11D7/32 ,  C11D7/26 ,  H01L21/02

摘要： A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains a lactam compound represented by formula (1) and a ring-structure-having ether compound including at least one species selected from among a cyclic ether compound, a cycloalkyl (chain alkyl) ether compound, a cycloalkyl (branched alkyl) ether compound, and a di(cycloalkyl) ether compound. (in formula (1), R101 represents a C1 to C6 alkyl group; and R102 represents a C1 to C6 alkylene group.)

公开(公告)号：US20220106542A1

公开(公告)日：2022-04-07

申请号：US17492257

申请日：2021-10-01

申请人： Entegris, Inc.

发明人： Daniela WHITE ,  YoungMin KIM ,  Michael L. WHITE

IPC分类号： C11D11/00 ,  C11D7/32 ,  C11D7/26 ,  C11D7/34 ,  C11D7/50 ,  H01L21/02

摘要： In general, the invention provides high pH cleaning compositions for dielectric surfaces such as PETEOS, SiO2, thermal oxide, silicon nitride, silicon, etc. The compositions of the invention afford superior surface wetting, dispersion of particles and organic residues, and prevents redeposition and re-agglomeration of the dispersed residue during cleaning to afford superior cleaning and low defectivity.

公开(公告)号：US11292992B2

公开(公告)日：2022-04-05

申请号：US16753908

申请日：2018-10-09

申请人： Dow Global Technologies LLC ,  Rohm and Haas Company

发明人： Marianne Creamer ,  Severine Ferrieux ,  Eric Wasserman

IPC分类号： C11D3/37 ,  C11D7/26 ,  C11D7/34 ,  C08F220/06 ,  C11D1/66 ,  C11D3/08 ,  C11D3/10 ,  C11D3/20 ,  C11D3/36 ,  C11D3/39 ,  C11D11/00

摘要： A polymer comprising a first fraction and a second fraction, wherein the first fraction comprises from 90 to 100 wt % polymerized C3-C6 carboxylic acid monomer units; and the second fraction comprises from 30 to 80 wt % polymerized C3-C6 carboxylic acid monomer units and from 20 to 70 wt % polymerized sulfonic acid monomer units; wherein the first fraction is from 10 to 40 wt % of the polymer and the second fraction is from 60 to 90 wt % of the polymer; the polymer has Mw from 3,000 to 30,000; and monomers are randomly distributed within each fraction.

公开(公告)号：US20220095877A1

公开(公告)日：2022-03-31

申请号：US17423302

申请日：2020-01-09

申请人： DAIO PAPER CORPORATION

发明人： Yuhei YAMASAKI

IPC分类号： A47L13/17 ,  D21H11/18 ,  D21H15/02 ,  D21H19/34 ,  C11D17/06 ,  C11D7/26

摘要： A cleaning sheet includes a base paper sheet that is impregnated with an aqueous agent. The aqueous agent includes butyldiglycol that is a glycol ether.

公开(公告)号：US11279903B2

公开(公告)日：2022-03-22

申请号：US16923535

申请日：2020-07-08

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Thomas Dory ,  Mick Bjelopavlic ,  Joshua Guske ,  Kazutaka Takahashi

IPC分类号： C11D7/34 ,  C11D7/32 ,  C11D7/06 ,  H01L21/02 ,  C11D7/26

摘要： This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; and 3) at least one aminoalcohol.

公开(公告)号：US20220056381A1

公开(公告)日：2022-02-24

申请号：US17390977

申请日：2021-08-01

申请人： Beratherm AG

发明人： Alexander Pohl ,  Gunter Rolf BLUMHOFER ,  Michael Hugo GOEBEL

IPC分类号： C11D7/26 ,  C11D11/00 ,  C11D7/06 ,  C11D7/10 ,  C23G1/08 ,  C23G1/02

摘要： An aqueous cleaning solution for removing rouging deposits on media-contacted surfaces of stainless steels comprises a first component and a second component. The first component is an alkali sulfite and the second component is an alkali formate, wherein the concentrations thereof are adjusted in such manner that formate is present in a molar ratio of 1.5 to 4.2 relative to sulfite, and that the pH value of the cleaning solution is 4.0 to 4.8. For preparing the aqueous cleaning solution, an aqueous solution of an alkali hydroxide is provided initially, thereafter a first amount of concentrated aqueous formic acid is admixed in an excess in such manner that a pH value of 3.5 to 4.5 is established, then a second amount of solid alkali sulfite is admixed in accordance with the sulfite concentration to be established, thus resulting in a pH value of 5.5 to 6.5, and finally a third amount of concentrated aqueous formic acid is admixed until a pH value of 4.0 to 4.8 is attained.