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    RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARALKYL RESIN
    1.
    发明申请
    RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NAPHTHOL ARALKYL RESIN 审中-公开

    公开(公告)号：US20190302616A1

    公开(公告)日：2019-10-03

    申请号：US16094609

    申请日：2017-04-17

    申请人： NISSAN CHEMICAL CORPORATION

    发明人： Ryo KARASAWA ,  Keisuke HASHIMOTO

    IPC分类号： G03F7/038 ,  G03F7/11 ,  H01L21/027 ,  G03F7/20 ,  H01L21/266 ,  H01L21/308 ,  G03F7/16

    摘要： A resist underlayer film not undergoing intermixing with a resist layer, having high dry etching and heat resistance, exhibiting high temperature low mass loss, and exhibiting even stepped substrate coatability, includes a polymer containing a unit structure of the formula (1): The unit structure of formula (1) is a unit structure of the formula (2): A method for producing a semiconductor device, includes forming, on a semiconductor substrate, a resist underlayer film using a resist underlayer film-forming composition, forming a hard mask on the resist underlayer film, a resist film on the hard mask, a resist pattern by irradiation with light or an electron beam and development of the resist film, a pattern by etching the hard mask using the resist pattern, a pattern by etching the underlayer film using the patterned hard mask, and processing the substrate using the patterned resist underlayer film.

    CLEANING AGENT COMPOSITION AND CLEANING METHOD
    3.
    发明申请
    CLEANING AGENT COMPOSITION AND CLEANING METHOD 有权

    公开(公告)号：US20220135913A1

    公开(公告)日：2022-05-05

    申请号：US17430978

    申请日：2020-02-14

    申请人： NISSAN CHEMICAL CORPORATION

    发明人： Hiroshi OGINO ,  Tetsuya SHINJO ,  Ryo KARASAWA ,  Takahisa OKUNO

    IPC分类号： C11D11/00 ,  C11D7/50 ,  C11D7/32 ,  C11D7/26 ,  H01L21/02

    摘要： A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains a lactam compound represented by formula (1) and a ring-structure-having ether compound including at least one species selected from among a cyclic ether compound, a cycloalkyl (chain alkyl) ether compound, a cycloalkyl (branched alkyl) ether compound, and a di(cycloalkyl) ether compound. (in formula (1), R101 represents a C1 to C6 alkyl group; and R102 represents a C1 to C6 alkylene group.)

    CLEANING AGENT COMPOSITION AND CLEANING METHOD
    9.
    发明申请
    CLEANING AGENT COMPOSITION AND CLEANING METHOD 有权

    公开(公告)号：US20220010242A1

    公开(公告)日：2022-01-13

    申请号：US17430966

    申请日：2020-02-14

    申请人： NISSAN CHEMICAL CORPORATION

    发明人： Hiroshi OGINO ,  Tetsuya SHINJO ,  Ryo KARASAWA ,  Takahisa OKUNO

    IPC分类号： C11D7/50 ,  C11D7/32 ,  C11D7/24 ,  C11D11/00 ,  H01L21/02

    摘要： A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate, the composition containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains an aromatic compound represented by formula (1) and a lactam compound represented by formula (2). (in formulas (1) and (2), s represents the number of substituents R100s of the benzene ring and is 2 or 3; s groups of R100s each independently represent a C1 to C6 alkyl group; the total number of carbon atoms in s groups of C1 to C6 alkyl groups is 3 or greater; R101 represents a C1 to C6 alkyl group; and R102 represents a C1 to C6 alkylene group.)