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    Lithographic printing plate precursor and lithographic printing method
    262.
    发明授权
    Lithographic printing plate precursor and lithographic printing method 有权
    平版印刷版原版和平版印刷法

    公开(公告)号：US07998652B2

    公开(公告)日：2011-08-16

    申请号：US10951700

    申请日：2004-09-29

    Applicant: Naonori Makino ,  Toshifumi Inno ,  Sumiaki Yamasaki

    Inventor： Naonori Makino ,  Toshifumi Inno ,  Sumiaki Yamasaki

    IPC: G03C1/00 ,  G03C1/72 ,  G03F7/00 ,  B41F1/18 ,  B41F7/00 ,  B41N3/00 ,  B41M5/00

    CPC classification number: B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/04 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41N1/083

    Abstract: A lithographic printing plate precursor comprising: a support; and at least one layer comprising an image-recording layer, the image-recording layer comprising (A) an infrared absorber, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer, wherein the image recording layer is capable of being removed with at least one of a printing ink and a fountain solution, wherein at least one of said at least one layer comprises a copolymer having (a1) a unit comprising at least one ethylenically unsaturated bond, and (a2) a unit comprising at least one functional group interacting with a surface of the support. And a lithographic printing method in which the lithographic printing plate precursor is used. The copolymer preferably has a hydrophilic segment. The copolymer preferably is contained in an undercoat layer formed between the support and the image-recording layer.

    Abstract translation: 一种平版印刷版原版，包括：载体; 以及包含图像记录层的至少一层，所述图像记录层包含（A）红外线吸收剂，（B）聚合引发剂，（C）可聚合化合物和（D）粘合剂聚合物，其中所述图像 记录层能够用印刷油墨和润版液中的至少一种去除，其中所述至少一层中的至少一层包含具有（a1）包含至少一个烯键式不饱和键的单元的共聚物和（a2 ）包括与所述载体的表面相互作用的至少一个官能团的单元。 以及使用平版印刷版原版的平版印刷法。 共聚物优选具有亲水链段。 共聚物优选包含在形成在载体和图像记录层之间的底涂层中。

    METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE
    265.
    发明申请
    METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE 审中-公开
    制备平版印刷板的方法

    公开(公告)号：US20110159437A1

    公开(公告)日：2011-06-30

    申请号：US12975748

    申请日：2010-12-22

    Applicant: Toshifumi INNO

    Inventor： Toshifumi INNO

    IPC: G03F7/20 ,  G03F7/32

    CPC classification number: G03F7/322 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/06 ,  B41C2201/10 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/10 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/266

    Abstract: A plate-making method includes: exposing a lithographic printing plate precursor with laser; and rubbing a surface of the exposed lithographic printing plate precursor with a rubbing member in the presence of a developer having pH of from 2 to 11 and containing a water-soluble polymer compound to remove the protective layer and an unexposed area of the photosensitive layer, the lithographic printing plate precursor includes, in the following order, a hydrophilic support, a photosensitive layer containing a polymerization initiator, a polymerizable compound, a sensitizing dye and a binder polymer and a protective layer, and the water-soluble polymer compound is a vinyl copolymer containing a monomer unit having at least one functional group capable of interacting with a surface of the support and a monomer unit having at least one hydrophilic group which is different from the functional group capable of interacting with a surface of the support.

    Abstract translation: 制版方法包括：用激光曝光平版印刷版原版; 并在pH为2〜11的显影剂存在下用摩擦构件摩擦曝光的平版印刷版原版的表面，并含有水溶性高分子化合物以除去感光层的保护层和未曝光区域， 平版印刷版原版按以下顺序包括亲水性载体，含有聚合引发剂的感光层，可聚合化合物，敏化染料和粘合剂聚合物和保护层，并且水溶性高分子化合物是乙烯基 含有具有至少一个能够与载体表面相互作用的官能团的单体单元的共聚物和具有至少一个不同于能够与载体表面相互作用的官能团的亲水基团的单体单元。

    Photosensitive recording material, planographic printing plate precursor, and stacks of the same
    266.
    发明授权
    Photosensitive recording material, planographic printing plate precursor, and stacks of the same 失效
    感光记录材料，平版印刷版前体和它们的叠层

    公开(公告)号：US07968271B2

    公开(公告)日：2011-06-28

    申请号：US11715995

    申请日：2007-03-09

    Applicant: Hisao Yamamoto ,  Hiromitsu Yanaka ,  Takahiro Goto ,  Shigeo Koizumi

    Inventor： Hisao Yamamoto ,  Hiromitsu Yanaka ,  Takahiro Goto ,  Shigeo Koizumi

    IPC: G03F7/00 ,  G03F7/26

    CPC classification number: G03F7/092 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/04 ,  B41C2201/10 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  G03F7/11

    Abstract: The present invention provides a photosensitive recording material having a support, and a photosensitive layer and a protective layer formed in this order on or above the support. The photosensitive layer contains a polymerization initiator, a sensitizing agent, and a polymerizable compound. Further, the protective layer contains a water-insoluble and alkali-soluble dye that has an absorption wavelength region different from the absorption wavelength region of the sensitizing agent, and the dye is dispersed in a solid state in the protective layer. The present invention also provides a planographic printing plate precursor including the photosensitive recording material, a stack of the photosensitive recording materials, and a stack of the planographic printing plate precursors.

    Abstract translation: 本发明提供一种具有支持体的光敏记录材料，以及在该载体上或上方依次形成的感光层和保护层。 感光层含有聚合引发剂，增感剂和聚合性化合物。 此外，保护层含有具有与敏化剂的吸收波长区域不同的吸收波长区域的水不溶性碱溶性染料，染料在保护层中以固体状态分散。 本发明还提供了包括感光记录材料的平版印刷版原版，感光记录材料的叠层和平版印刷版前体的叠层。

    Negative-working photosensitive material and negative-working planographic printing plate precursor
    268.
    发明授权
    Negative-working photosensitive material and negative-working planographic printing plate precursor 有权
    负性感光材料和负性平版印刷版前体

    公开(公告)号：US07955781B2

    公开(公告)日：2011-06-07

    申请号：US12236525

    申请日：2008-09-24

    Applicant: Shigefumi Kanchiku ,  Toyohisa Oya

    Inventor： Shigefumi Kanchiku ,  Toyohisa Oya

    IPC: G03F7/004

    CPC classification number: G03F7/11 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/04 ,  B41C2201/06 ,  B41C2201/10 ,  B41C2201/12 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24

    Abstract: A negative-working photosensitive material is provided which includes: a support; an undercoat layer; and a photosensitive layer including a polymerization initiator, a polymerizable compound, and a binder polymer, wherein the support, the undercoat layer, and the photosensitive layer are sequentially layered, the undercoat layer includes a polymer including a structural unit (a) including at least one of a carboxylic acid or a carboxylic acid salt and a structural unit (b) including at least one carboxylic acid ester; and the content of the structural unit (a) in the polymer is from 30% to 90% by mole. Also, a negative-working planographic printing plate precursor including the negative-working photosensitive material is provided.

    Abstract translation: 提供负性感光材料，其包括：支撑体; 底漆层; 以及包含聚合引发剂，可聚合化合物和粘合剂聚合物的感光层，其中所述载体，底涂层和感光层依次层叠，所述底涂层包括包含至少包括结构单元（a）的结构单元 羧酸或羧酸盐之一和包含至少一种羧酸酯的结构单元（b）; 聚合物中的结构单元（a）的含量为30〜90摩尔％。 此外，提供了包含负性感光材料的负性平版印刷版原版。

    Photopolymer composition suitable for lithographic printing plates
    269.
    发明授权
    Photopolymer composition suitable for lithographic printing plates 有权
    适用于平版印刷版的光聚合物组合物

    公开(公告)号：US07955776B2

    公开(公告)日：2011-06-07

    申请号：US11995213

    申请日：2006-07-03

    Applicant: Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    Inventor： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    IPC: G03F7/26 ,  G03F7/00

    CPC classification number: G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

    Abstract: Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

    Abstract translation: 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）式（I）的至少一种低聚物A，其中X 1，X 2和X 3独立地选自直链或环状的C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和两个或多个 上述更多的R 1，R 2和R 3独立地选自（II）和（III），条件是（1）在R1，R2和R3中的至少一个中n = 0，和（2）n> 2中的至少一个基团R 1，R 2和R 3中的至少一个，和（3）至少一个基团R 6与式（III）中的H不同。

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