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    Photopolymer composition suitable for lithographic printing plates
    1.
    发明授权
    Photopolymer composition suitable for lithographic printing plates 有权
    适用于平版印刷版的光聚合物组合物

    公开(公告)号：US07955776B2

    公开(公告)日：2011-06-07

    申请号：US11995213

    申请日：2006-07-03

    申请人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    发明人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    IPC分类号： G03F7/26 ,  G03F7/00

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

    摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

    摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）式（I）的至少一种低聚物A，其中X 1，X 2和X 3独立地选自直链或环状的C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族基团和两个或多个 上述更多的R 1，R 2和R 3独立地选自（II）和（III），条件是（1）在R1，R2和R3中的至少一个中n = 0，和（2）n> 2中的至少一个基团R 1，R 2和R 3中的至少一个，和（3）至少一个基团R 6与式（III）中的H不同。

    Photopolymer Composition Suitable for Lithographic Printing Plates
    2.
    发明申请
    Photopolymer Composition Suitable for Lithographic Printing Plates 有权
    适用于平版印刷版的光聚合物组合物

    公开(公告)号：US20080248424A1

    公开(公告)日：2008-10-09

    申请号：US11995213

    申请日：2006-07-03

    申请人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    发明人： Harald Baumann ,  Bernd Strehmel ,  Detlef Pietsch ,  Udo Dwars ,  Tanja Ebhardt ,  Axel Draber

    IPC分类号： G03F7/004 ,  G03F7/26

    CPC分类号： G03F7/027 ,  B41C1/1008 ,  B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41M5/368 ,  B41M5/41 ,  B41M5/42 ,  B41M2205/40

    摘要： Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).

    摘要翻译： 辐射敏感元件包括（a）基底和（b）辐射敏感性涂层，其包含（i）至少一种选自光引发剂和敏化剂/共引发剂体系的组分，其吸收在250至1,200nm范围内的波长的辐射; （ii）至少一种式（I）的低聚物A，其中X 1，X 2和X 3 3独立地选自直链 或环C 4 -C 12亚烷基和C 6 -C 10亚芳基，杂环基，杂芳族 基团和上述两个或多个的组合，R 1，R 2和R 3独立地选自（II）和（III ），条件是在基团R 1，R 2和R 3 3中的至少一个中（1）n = 0，和（ 2）在R 1，R 2和R 3中的至少一个中n≥2，和（3）至少一个基团 R 6不同于式（III）中的H。

    Lithographic printing plate precursors with oligomeric or polymeric sensitizers
    3.
    发明授权
    Lithographic printing plate precursors with oligomeric or polymeric sensitizers 失效
    具有低聚物或聚合物敏化剂的平版印刷版前体

    公开(公告)号：US07615323B2

    公开(公告)日：2009-11-10

    申请号：US11718809

    申请日：2005-11-11

    申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    IPC分类号： G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  B41C1/10

    CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

    摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.

    摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于 结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。

    Lithographic Printing Plate Precursors with Oligomeric Or Polymeric Sensitizers
    4.
    发明申请
    Lithographic Printing Plate Precursors with Oligomeric Or Polymeric Sensitizers 失效
    具有低聚物或聚合物敏化剂的平版印刷版前体

    公开(公告)号：US20070269745A1

    公开(公告)日：2007-11-22

    申请号：US11718809

    申请日：2005-11-11

    申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

    IPC分类号： G03C1/00

    CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

    摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer

    摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得 在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自 卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物

    Method for making a lithographic plate
    5.
    发明授权
    Method for making a lithographic plate 失效
    用于生产平版印刷版的方法

    公开(公告)号：US07829261B2

    公开(公告)日：2010-11-09

    申请号：US11573916

    申请日：2005-08-23

    申请人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Detlef Pietsch

    发明人： Bernd Strehmel ,  Harald Baumann ,  Ulrich Fiebag ,  Tanja Ebhardt ,  Detlef Pietsch

    IPC分类号： B41N1/00 ,  G03F7/00 ,  G03F7/26

    CPC分类号： B41N3/08

    摘要： Process for the posttreatment of an imaged lithographic printing plate comprising (a) providing a lithographic printing plate comprising image areas and non-image areas on a lithographic substrate; (b) bringing the lithographic printing plate of step (a) into contact with a solution comprising a hydrophilic polymer comprising structural units derived from the following compounds: (i) a compound comprising both polyalkylene oxide chains and at least one structural unit which is free-radical polymerizable, and (ii) a monomer capable of copolymerizing with the free-radical polymerizable structural unit of (i) and furthermore comprising at least one acidic functional group with pKs

    摘要翻译： 一种成像的平版印刷版的后处理方法，包括：（a）在平版印刷基板上提供包括图像区域和非图像区域的平版印刷版; （b）使步骤（a）的平版印刷版与包含亲水聚合物的溶液接触，所述溶液包含衍生自以下化合物的结构单元：（i）包含聚环氧烷链和至少一个自由基的结构单元的化合物 - 可聚合的，和（ii）能够与（i）的自由基可聚合结构单元共聚并且还包含至少一个pK <5的酸性官能团的单体，其中酸性官能团可以作为游离基 酸基或盐的形式; （c）干燥。

    Negative-working imageable elements with overcoat
    10.
    发明授权
    Negative-working imageable elements with overcoat 有权
    负面工作可成像元素与大衣

    公开(公告)号：US08318405B2

    公开(公告)日：2012-11-27

    申请号：US12403458

    申请日：2009-03-13

    申请人： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

    发明人： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

    IPC分类号： B32B3/10 ,  G03F7/09 ,  G03F7/11

    CPC分类号： G03F7/092 ,  G03F7/11 ,  Y10T428/24802

    摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.

    摘要翻译： 负性可成像元件可用于提供平版印刷版。 可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。 该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。