PRODUCTION OF MULTILAYERED THIN FILM PARTICLES
    21.
    发明申请
    PRODUCTION OF MULTILAYERED THIN FILM PARTICLES 有权
    生产多层薄膜片

    公开(公告)号:US20120153056A1

    公开(公告)日:2012-06-21

    申请号:US12968570

    申请日:2010-12-15

    CPC classification number: B01J2/24

    Abstract: A process for producing particles from a thin film is provided. The process includes grinding the thin film using granules that afford for the particles to maintain a structure and/or one or more properties of the thin film. In addition, the process provides for a high recovery percentage of the source material.

    Abstract translation: 提供了从薄膜制备颗粒的方法。 该方法包括使用提供颗粒以保持薄膜的结构和/或一种或多种性质的颗粒研磨薄膜。 此外,该方法提供了源材料的高回收率。

    UV-REFLECTIVE STRUCTURAL COLOR
    22.
    发明申请
    UV-REFLECTIVE STRUCTURAL COLOR 有权
    紫外反射结构颜色

    公开(公告)号:US20100290109A1

    公开(公告)日:2010-11-18

    申请号:US12467656

    申请日:2009-05-18

    Abstract: The present invention discloses a non-quarter wave multilayer structure having a plurality of alternating low index of refraction material stacks and high index of refraction material stacks. The plurality of alternating stacks can reflect electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region. The non-quarter wave multilayer structure, i.e. nLdL≠nHdH≠λ0/4, can be expressed as [A 0.5qH pL(qH pL)N 0.5qH G], where q and p are multipliers to the quarter-wave thicknesses of high and low refractive index material, respectively, H is the quarter-wave thickness of the high refracting index material; L is the quarter-wave thickness of the low refracting index material; N represents the total number of layers between bounding half layers of high index of refraction material (0.5qH); G represents a substrate and A represents air.

    Abstract translation: 本发明公开了一种非四分之一波长多层结构,其具有多个交替折射率较低的折射材料堆叠和高折射率折射材料堆叠。 多个交替的堆叠可以反射紫外区域中的电磁辐射和可见光区域中的电磁辐射的窄带。 非四分之一波长多层结构,即nLdL≠nHdH≠λ0/ 4,可以表示为[A 0.5qH pL(qH pL)N 0.5qH G],其中q和p是四分之一波长厚度的乘数 和低折射率材料,H是高折射率材料的四分之一波长厚度; L是低折射率材料的四分之一波长厚度; N表示高折射率材料的折射半层之间的总层数(0.5qH); G表示底物,A表示空气。

    Semi-transparent reflectors
    23.
    发明授权

    公开(公告)号:US10067265B2

    公开(公告)日:2018-09-04

    申请号:US12902763

    申请日:2010-10-12

    CPC classification number: G02B1/005 G02B1/10 G02B5/0825 G02B5/0833

    Abstract: In one embodiment, a semi-transparent reflector may include a multilayered photonic structure. The multilayered photonic structure includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric material. The plurality of coating layers of high index dielectric material and the plurality of coating layers of low index dielectric material of the multilayered photonic structure are arranged in an [LH . . . (LH)N . . . L] structure. L is one of the plurality of coating layers of low index dielectric material. H is one of the plurality of coating layers of high index dielectric material. N is a positive integer. The multilayered photonic structure has substantially constant reflectance values for wavelengths of electromagnetic radiation in a visible spectrum over a range of angles of incidence of the electromagnetic radiation.

    Method of producing thermoelectric material

    公开(公告)号:US09978924B2

    公开(公告)日:2018-05-22

    申请号:US13166860

    申请日:2011-06-23

    CPC classification number: H01L35/26 C01B19/007 H01L35/14 H01L35/22 H01L35/34

    Abstract: A process for manufacturing a nanocomposite thermoelectric material having a plurality of nanoparticle inclusions. The process includes determining a material composition to be investigated for the nanocomposite thermoelectric material, the material composition including a conductive bulk material and a nanoparticle material. In addition, a range of surface roughness values for the insulating nanoparticle material that can be obtained using current state of the art manufacturing techniques is determined. Thereafter, a plurality of Seebeck coefficients, electrical resistivity values, thermal conductivity values and figure of merit values as a function of the range of nanoparticle material surface roughness values is calculated. Based on these calculated values, a nanocomposite thermoelectric material composition or ranges of compositions is/are selected and manufactured.

    Omnidirectional UV-IR reflector
    25.
    发明授权
    Omnidirectional UV-IR reflector 有权
    全向UV-IR反射器

    公开(公告)号:US09229140B2

    公开(公告)日:2016-01-05

    申请号:US13014398

    申请日:2011-01-26

    CPC classification number: G02B5/281 G02B5/282 G02B5/283 G02B5/285

    Abstract: The present invention provides an omnidirectional ultraviolet (UV)-infrared (IR) reflector. The omnidirectional UV-IR reflector includes a multilayer stack having at least three layers, the at least three layers having at least one first index of refraction material A1 and at least one second index of refraction layer B1. The at least one first index of refraction material layer and the at least one second index of refraction material layer can be alternately stacked on top of each other to provide the at least three layers. In addition, the at least one first index of refraction material layer and the at least one second index of refraction material layer each have a predefined thickness of dA1 and dB1, respectively, with the thickness dA1 not being generally equal to the dB1 thickness such that the multilayer stack has a non-periodic layered structure.

    Abstract translation: 本发明提供了全向紫外(UV) - 红外(IR)反射器。 全向UV-IR反射器包括具有至少三层的多层堆叠,所述至少三层具有至少一个第一折射材料折射率A1和至少一个第二折射率折射率层B1。 所述至少一个第一折射材料折射率层和所述至少一个第二折射材料折射率层可以交替地堆叠在彼此的顶部以提供所述至少三个层。 另外,折射材料层和至少一个第二折射材料层的至少一个第一折射率分别具有dA1和dB1的预定厚度,其厚度dA1通常不等于dB1厚度,使得 多层堆叠具有非周期性分层结构。

    Multi-layer photonic structures having omni-directional reflectivity and coatings incorporating the same
    26.
    发明授权
    Multi-layer photonic structures having omni-directional reflectivity and coatings incorporating the same 有权
    具有全向反射率的多层光子结构和包含其的涂层

    公开(公告)号:US08861087B2

    公开(公告)日:2014-10-14

    申请号:US12389221

    申请日:2009-02-19

    Abstract: A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ≧1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

    Abstract translation: 多层光子结构可以包括具有[H(LH)N]形式的高折射率材料和低折射率材料的交替层,其中H是高折射率材料层,L是低折射率材料层,N是 多层高指数材料和低折射率材料层。 N可以是≧1的整数。 低折射率介电材料可以具有约1.3至约2.5的折射率nL。 高折射率介电材料可以具有约1.8至约3.5的折射率nH,其中对于具有大约0度的入射角的光,nH> nL和多层光子结构包括大于约200nm的反射带 到大约80度相对于多层光子结构。 多层光子结构可以结合到涂料或涂料体系中,从而形成全向反射涂料或涂料。

    Narrow band omnidirectional reflectors and their use as structural colors
    27.
    发明授权
    Narrow band omnidirectional reflectors and their use as structural colors 有权
    窄带全向反射器及其作为结构颜色的用途

    公开(公告)号:US08749881B2

    公开(公告)日:2014-06-10

    申请号:US12388395

    申请日:2009-02-18

    CPC classification number: G02B5/26 G02B5/0825 G02B5/0833

    Abstract: Disclosed is a multilayer structure wherein a first layer of a first material having an outer surface and a refracted index between 2 and 4 extends across an outer surface of a second layer having a refractive index between 1 and 3. The multilayer stack has a reflective band of less than 200 nanometers when viewed from angles between 0° and 80° and can be used to reflect a narrow range of electromagnetic radiation in the ultraviolet, visible and infrared spectrum ranges. In some instances, the reflection band of the multilayer structure is less than 100 nanometers. In addition, the multilayer structure can have a quantity defined as a range to mid-range ratio percentage of less than 2%.

    Abstract translation: 公开了一种多层结构,其中具有外表面和2和4之间的折射率的第一材料的第一层延伸穿过折射率在1和3之间的第二层的外表面。多层堆叠具有反射带 从0°到80°之间的角度观察时,小于200纳米,可用于在紫外线,可见光和红外光谱范围内反射窄范围的电磁辐射。 在一些情况下,多层结构的反射带小于100纳米。 此外,多层结构可以具有定义为中等范围比例百分比的范围小于2%的量。

    FOCUSING DEVICE FOR LOW FREQUENCY OPERATION
    28.
    发明申请
    FOCUSING DEVICE FOR LOW FREQUENCY OPERATION 有权
    用于低频操作的聚焦装置

    公开(公告)号:US20130003245A1

    公开(公告)日:2013-01-03

    申请号:US13172109

    申请日:2011-06-29

    CPC classification number: G02B1/002 G01R33/38 G02B3/08 G02B5/3058

    Abstract: An example apparatus for obtaining a desired magnetic field distribution from an incident magnetic field, such as a kHz magnetic field, comprises a structure receiving the incident magnetic field and generating the desired magnetic field distribution at a predetermined distance from the transmitting side of the apparatus. The desired magnetic field distribution results from a spatial distribution of induced electrical current over the structure. Examples of the invention also include design methods and methods of using the apparatus.

    Abstract translation: 用于从诸如kHz磁场的入射磁场获得期望的磁场分布的示例性装置包括接收入射磁场并在与设备的发射侧预定距离处产生期望的磁场分布的结构。 所需的磁场分布来自结构上的感应电流的空间分布。 本发明的实例还包括使用该装置的设计方法和方法。

    OMNIDIRECTIONAL REFLECTOR
    29.
    发明申请

    公开(公告)号:US20120307369A1

    公开(公告)日:2012-12-06

    申请号:US13572071

    申请日:2012-08-10

    CPC classification number: G02B5/285 G02B5/0833 G02B5/085 G02B5/286 G02B27/0012

    Abstract: A process for designing and manufacturing an omnidirectional structural color (OSC) multilayer stack. The process can include providing a digital processor operable to execute at least one module and a table of index of refraction values corresponding to different materials that are usable for manufacturing an OSC multilayer stack. An initial design for the OSC multilayer stack can be provided and at least one additional layer is added to the initial design OSC multilayer stack to create a modified OSC multilayer stack. In addition, the thickness of each layer of the modified OSC multilayer stack is calculated using a merit function module until an optimized OSC multilayer stack has been calculated.

    Abstract translation: 一种设计和制造全向结构颜色(OSC)多层堆叠的方法。 该过程可以包括提供可操作以执行至少一个模块的数字处理器和对应于可用于制造OSC多层堆叠的不同材料的折射率值的表。 可以提供用于OSC多层堆叠的初始设计,并且至少一个附加层被添加到初始设计OSC多层堆叠中以创建修改的OSC多层堆叠。 此外,使用优点功能模块计算修改的OSC多层叠层的每层的厚度,直到已经计算了优化的OSC多层堆叠。

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