摘要:
A thermoelectric material is provided. The material can be a grain boundary modified nanocomposite that has a plurality of bismuth antimony telluride matrix grains and a plurality of zinc oxide nanoparticles within the plurality of bismuth antimony telluride matrix grains. In addition, the material has zinc antimony modified grain boundaries between the plurality of bismuth antimony telluride matrix grains.
摘要:
A thermoelectric material is provided. The material can be a grain boundary modified nanocomposite that has a plurality of bismuth antimony telluride matrix grains and a plurality of zinc oxide nanoparticles within the plurality of bismuth antimony telluride matrix grains. In addition, the material has zinc antimony modified grain boundaries between the plurality of bismuth antimony telluride matrix grains.
摘要:
A thermoelectric material is provided. The material can be a grain boundary modified nanocomposite that has a plurality of bismuth antimony telluride matrix grains and a plurality of zinc oxide nanoparticles within the plurality of bismuth antimony telluride matrix grains. In addition, the material has zinc antimony modified grain boundaries between the plurality of bismuth antimony telluride matrix grains.
摘要:
A process for producing particles from a thin film is provided. The process includes grinding the thin film using granules that afford for the particles to maintain a structure and/or one or more properties of the thin film. In addition, the process provides for a high recovery percentage of the source material.
摘要:
In one embodiment, the optical lock system may include an electronic control unit, a lock housing including a lock chamber, and an optical key including a multilayer photonic structure. The multilayer photonic structure may produce a unique intensity profile and includes a plurality of coating layers of high index dielectric material and a plurality of coating layers of low index dielectric. A light source may transmit a reference light to the multilayer photonic structure when the optical key is disposed within the lock chamber. A photo detector may receive an interaction light from the multilayer photonic structure and may transmit the unique intensity profile to the electronic control unit which may execute machine readable instructions to: compare the unique intensity profile to an electronic master; and cause the lock actuator to transition from a first state to a second state when the unique intensity profile corresponds to the electronic master.
摘要:
A process for manufacturing a nanocomposite thermoelectric material having a plurality of nanoparticle inclusions. The process includes determining a material composition to be investigated for the nanocomposite thermoelectric material, the material composition including a conductive bulk material and a nanoparticle material. In addition, a range of surface roughness values for the insulating nanoparticle material that can be obtained using current state of the art manufacturing techniques is determined. Thereafter, a plurality of Seebeck coefficients, electrical resistivity values, thermal conductivity values and figure of merit values as a function of the range of nanoparticle material surface roughness values is calculated. Based on these calculated values, a nanocomposite thermoelectric material composition or ranges of compositions is/are selected and manufactured.
摘要:
The present invention provides an omnidirectional ultraviolet (UV)-infrared (IR) reflector. The omnidirectional UV-IR reflector includes a multilayer stack having at least three layers, the at least three layers having at least one first index of refraction material A1 and at least one second index of refraction layer B1. The at least one first index of refraction material layer and the at least one second index of refraction material layer can be alternately stacked on top of each other to provide the at least three layers. In addition, the at least one first index of refraction material layer and the at least one second index of refraction material layer each have a predefined thickness of dA1 and dB1, respectively, with the thickness dA1 not being generally equal to the dB1 thickness such that the multilayer stack has a non-periodic layered structure.
摘要:
A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ≧1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.
摘要:
Disclosed is a multilayer structure wherein a first layer of a first material having an outer surface and a refracted index between 2 and 4 extends across an outer surface of a second layer having a refractive index between 1 and 3. The multilayer stack has a reflective band of less than 200 nanometers when viewed from angles between 0° and 80° and can be used to reflect a narrow range of electromagnetic radiation in the ultraviolet, visible and infrared spectrum ranges. In some instances, the reflection band of the multilayer structure is less than 100 nanometers. In addition, the multilayer structure can have a quantity defined as a range to mid-range ratio percentage of less than 2%.
摘要:
A process for designing and manufacturing an omnidirectional structural color (OSC) multilayer stack. The process can include providing a digital processor operable to execute at least one module and a table of index of refraction values corresponding to different materials that are usable for manufacturing an OSC multilayer stack. An initial design for the OSC multilayer stack can be provided and at least one additional layer is added to the initial design OSC multilayer stack to create a modified OSC multilayer stack. In addition, the thickness of each layer of the modified OSC multilayer stack is calculated using a merit function module until an optimized OSC multilayer stack has been calculated.