LENS AND LENS UNIT
    22.
    发明公开
    LENS AND LENS UNIT 审中-公开

    公开(公告)号:US20240069301A1

    公开(公告)日:2024-02-29

    申请号:US18235049

    申请日:2023-08-17

    Inventor: Kenji YAMANAKA

    CPC classification number: G02B7/02

    Abstract: A lens includes: an optical-functioning portion that is a glass press-molded product and has both lens surfaces in an optical axis direction and a volume absorption portion allowing a shape error due to press-molding around the lens surfaces; and a flange portion made of a material different from the glass of the optical-functioning portion, fixed to the optical-functioning portion to surround the volume absorption portion, and having a position reference surface serving as a reference of a lens position. An outer diameter D in an orthogonal direction to the optical axis defined by the flange portion and a thickness t of the flange portion satisfy the following condition (1) or (2).


    when 2 mm≤D≤5 mm, 0.15≤t≤0.35  (1)



    when D>5 mm, 0.15+(D−5)×0.03≤t≤0.15+(D−5)×0.07  (2)

    Reflective mask blank, reflective mask, and method for manufacturing semiconductor device

    公开(公告)号:US11914281B2

    公开(公告)日:2024-02-27

    申请号:US17311662

    申请日:2019-12-23

    Inventor: Yohei Ikebe

    CPC classification number: G03F1/24 G03F1/26

    Abstract: A reflective mask blank comprises a substrate; a multilayer reflective film which is formed on the substrate and reflects EUV light; and a layered film which is formed on the multilayer reflective film. The layered film has an absolute reflectance of 2.5% or less with respect to EUV light, and comprises a first layer and a second layer formed on the first layer; and the first layer comprises a phase shift film which shifts the phase of EUV light. Alternatively, the layered film is a phase shift film which comprises a first layer and a second layer formed on the first layer, and which shifts the phase of EUV light; and the first layer comprises an absorption layer that has an absolute reflectance of 2.5% or less with respect to EUV light.

    Imaging module and endoscope having image sensor and mounting board

    公开(公告)号:US11903566B2

    公开(公告)日:2024-02-20

    申请号:US17259735

    申请日:2020-03-12

    Inventor: Atsushi Komoro

    CPC classification number: A61B1/051 A61B1/00124 H04N23/54 H04N23/555

    Abstract: An imaging module includes: an image sensor; and a mounting board on which the image sensor is mounted together with a plurality of passive components. The mounting board includes: a first surface on which the image sensor is surface-mounted; a second surface that is located on an opposite side to the first surface and on which the passive component is mounted; a third surface that is continuous with the second surface via a step and on which the passive component is mounted; and a columnar cable connection block that rises from the second and third surfaces and to which a cable is connected.

    Reflective mask blank, reflective mask and method of manufacturing semiconductor device

    公开(公告)号:US11880130B2

    公开(公告)日:2024-01-23

    申请号:US17946709

    申请日:2022-09-16

    CPC classification number: G03F1/24 G03F1/26

    Abstract: Provided are a reflective mask blank, having a phase shift film having little dependence of phase difference and reflectance on film thickness, and a reflective mask. The reflective mask blank is characterized in that the phase shift film is composed of a material comprised of an alloy having two or more types of metal so that reflectance of the surface of the phase shift film is more than 3% to not more than 20% and so as to have a phase difference of 170 degrees to 190 degrees, and when a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k>α*n+β is defined as Group A and a group of metal elements that satisfies the refractive index n and the extinction coefficient k of k

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