-
公开(公告)号：US20240008955A1
公开(公告)日：2024-01-11
申请号：US18253699
申请日：2021-12-02
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Jonathan D. Gandrud , Alexandra R. Cunliffe , James D. Hansen , Cameron M. Fabbri , Wenbo Dong , En-Tzu Yang , Jianbing Huang , Himanshu Nayar , Guruprasad Somasundaram , Jineng Ren , Joseph C. Dingeldein , Seyed Amir Hossein Hosseini , Steven C. Demlow , Benjamin D. Zimmer
CPC classification number: A61C7/002 , A61C13/0004 , A61C2007/004
Abstract: Machine learning, or geometric deep learning, applied to various dental processes and 5 solutions. In particular, generative adversarial networks apply machine learning to smile design—finished smile, appliance rendering, scan cleanup, restoration appliance design, crown and bridges design, and virtual debonding. Vertex and edge classification apply machine learning to gum versus teeth detection, teeth type segmentation, and brackets and other orthodontic hardware. Regression applies machine learning to coordinate systems, diagnostics, case complexity, and 0 prediction of treatment duration. Automatic encoders and clustering apply machine learning to grouping of doctors, or technicians, and preferences.
-
公开(公告)号：US11853018B2
公开(公告)日：2023-12-26
申请号：US17438677
申请日：2019-09-11
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson
IPC: G05B13/04 , G05B13/02 , G06N5/043 , G05B23/02 , G06N5/046 , G05B19/4065 , G05B19/418 , G06Q10/0631 , G06Q10/0639 , G06Q30/0202 , B60W40/064 , B60W40/08 , B60W40/105 , G06F18/21 , G06N7/01 , G06Q10/087
CPC classification number: G05B13/042 , B60W40/064 , B60W40/08 , B60W40/105 , G05B13/021 , G05B13/024 , G05B13/0265 , G05B13/041 , G05B19/4065 , G05B19/41835 , G05B23/0229 , G06F18/2193 , G06N5/043 , G06N5/046 , G06N7/01 , G06Q10/06315 , G06Q10/06395 , G06Q30/0202 , G05B2219/36301 , G06Q10/087
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for determining causal models for controlling environments. One of the methods includes identifying a procedural instance; determining a temporal extent for the procedural instance based on temporal extent parameters for the one or more entities in the procedural instance; selecting control settings for the procedural instance; monitoring environment responses to the control settings that are received for the one or more entities; determining which of the environment responses to attribute to the procedural instance in a causal model; and adjusting, based at least in part on the environment responses that are attributed to the procedural instance, the temporal extent parameters for the one or more entities.
-
公开(公告)号：US20220180979A1
公开(公告)日：2022-06-09
申请号：US17436840
申请日：2019-10-28
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson , Susan L. Woulfe , Mark A. Tomai
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for designing a clinical trial. In one aspect, the method comprises repeatedly performing the following: i) selecting, from a population of patients, patients for being treated with the treatment using a configuration of input settings, wherein the configuration is selected based on a causal model that measures current causal relationships between input settings and a measure of success of the clinical trial; ii) determining the measure of success of the clinical trial for which patients were selected using the certain configuration of input settings; and iii) adjusting, based on the measure of success of the clinical trial, the causal model.
-
公开(公告)号：US20220163951A1
公开(公告)日：2022-05-26
申请号：US17436886
申请日：2019-10-03
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson , Brett R. Hemes , Thomas J. Strey , Jonathan B. Arthur , Nathan J. Herbst , Aaron K. Nienaber , Sarah M. Mullins , Mark W. Orlando , Cory D. Sauer , Timothy J. Clemens , Scott L. Barnett , Zachary M. Schaeffer , Patrick G. Zimmerman , Gregory P. Moriarty , Jeffrey P. Adolf , Steven P. Floeder , Andreas Backes , Peter J. Schneider , Maureen A. Kavanagh , Glenn E. Casner , Miaoding Dai , Christopher M. Brown , Lori A. Sjolund , Jon A. Kirschhoffer , Carter C. Hughes
IPC: G05B19/418 , B25J11/00
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for optimizing a process of manufacturing a product. In one aspect, the method comprises repeatedly performing the following: i) selecting a configuration of input settings for manufacturing a product, based on a causal model that measures causal relationships between input settings and a measure of a quality of the product; ii) determining the measure of the quality of the product manufactured using the configuration of input settings; and iii) adjusting, based on the measure of the quality of the product manufactured using the configuration of input settings, the causal model.
-
公开(公告)号：US20220146991A1
公开(公告)日：2022-05-12
申请号：US17438027
申请日：2019-10-03
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson , Vincent J. Laraia , Don V. West
IPC: G05B13/02 , B24B37/005 , H01L21/461 , H01L21/66
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for optimizing a process of polishing semiconductor wafers. In one aspect, the method comprises repeatedly performing the following: i) selecting a configuration of input settings for polishing a semiconductor wafer, based on a causal model that measures current causal relationships between input settings and a quality of semiconductor wafers; ii) receiving a measure of the quality of the semiconductor wafer polished with the configuration of input settings; and iii) adjusting, based on the measure of the quality of the semiconductor wafer polished with the configuration of input settings, the causal model.
-
Patent Agency Ranking
公开(公告)号：US12282304B2
公开(公告)日：2025-04-22
申请号：US18210700
申请日：2023-06-16
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson
IPC: G05B13/04 , B60W40/064 , B60W40/08 , B60W40/105 , G05B13/02 , G05B19/4065 , G05B19/418 , G05B23/02 , G06F18/21 , G06N5/043 , G06N5/046 , G06N7/01 , G06Q10/0631 , G06Q10/0639 , G06Q30/0202 , G06Q10/087
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for determining causal models for controlling environments. One of the methods includes obtaining data specifying baseline probability distributions for each of a plurality of controllable elements; maintaining a causal model; repeatedly performing the following: selecting control settings for the environment based on the causal model and values for a particular internal parameter of the control system that are sampled from a range of possible values; selecting control settings for the environment based on the baseline probability distributions; monitoring environment responses to the control settings selected based on the causal model and the control settings selected based on the baseline probability distributions; determining, for each of the possible values, a measure of a difference between a current system performance and a baseline system performance; and updating how frequently each of the possible values is sampled.
-
公开(公告)号：US20250036112A1
公开(公告)日：2025-01-30
申请号：US18917251
申请日：2024-10-16
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson , Brett R. Hemes , Thomas J. Strey , Jonathan B. Arthur , Nathan J. Herbst , Aaron K. Nienaber , Sarah M. Mullins , Mark W. Orlando , Cory D. Sauer , Timothy J. Clemens , Scott L. Barnett , Zachary M. Schaeffer , Patrick G. Zimmerman , Gregory P. Moriarty , Jeffrey P. Adolf , Steven P. Floeder , Andreas Backes , Peter J. Schneider , Maureen A. Kavanagh , Glenn E. Casner , Miaoding Dai , Christopher M. Brown , Lori A. Sjolund , Jon A. Kirschhoffer , Carter C. Hughes
IPC: G05B19/418 , B25J11/00
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for optimizing a process of manufacturing a product. In one aspect, the method comprises repeatedly performing the following: i) selecting a configuration of input settings for manufacturing a product, based on a causal model that measures causal relationships between input settings and a measure of a quality of the product; ii) determining the measure of the quality of the product manufactured using the configuration of input settings; and iii) adjusting, based on the measure of the quality of the product manufactured using the configuration of input settings, the causal model.
-
公开(公告)号：US12140938B2
公开(公告)日：2024-11-12
申请号：US17436886
申请日：2019-10-03
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson , Brett R. Hemes , Thomas J. Strey , Jonathan B. Arthur , Nathan J. Herbst , Aaron K. Nienaber , Sarah M. Mullins , Mark W. Orlando , Cory D. Sauer , Timothy J. Clemens , Scott L. Barnett , Zachary M. Schaeffer , Patrick G. Zimmerman , Gregory P. Moriarty , Jeffrey P. Adolf , Steven P. Floeder , Andreas Backes , Peter J. Schneider , Maureen A. Kavanagh , Glenn E. Casner , Miaoding Dai , Christopher M. Brown , Lori A. Sjolund , Jon A. Kirschhoffer , Carter C. Hughes
IPC: G05B19/00 , B25J11/00 , G05B19/418
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for optimizing a process of manufacturing a product. In one aspect, the method comprises repeatedly performing the following: i) selecting a configuration of input settings for manufacturing a product, based on a causal model that measures causal relationships between input settings and a measure of a quality of the product; ii) determining the measure of the quality of the product manufactured using the configuration of input settings; and iii) adjusting, based on the measure of the quality of the product manufactured using the configuration of input settings, the causal model.
-
公开(公告)号：US12055903B2
公开(公告)日：2024-08-06
申请号：US17439105
申请日：2019-09-11
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson , Brian E. Brooks , Gilles J. Benoit , Peter O. Olson , Tyler W. Olson
IPC: G05B13/04 , B60W40/064 , B60W40/08 , B60W40/105 , G05B13/02 , G05B19/4065 , G05B19/418 , G05B23/02 , G06F18/21 , G06N5/043 , G06N5/046 , G06N7/01 , G06Q10/0631 , G06Q10/0639 , G06Q30/0202 , G06Q10/087
CPC classification number: G05B13/042 , B60W40/064 , B60W40/08 , B60W40/105 , G05B13/021 , G05B13/024 , G05B13/0265 , G05B13/041 , G05B19/4065 , G05B19/41835 , G05B23/0229 , G05B23/0248 , G06F18/2193 , G06N5/043 , G06N5/046 , G06N7/01 , G06Q10/06315 , G06Q10/06395 , G06Q30/0202 , G05B2219/36301 , G06Q10/087
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for determining causal models for controlling environments. One of the methods includes identifying a procedural instance; selecting control settings for the procedural instance, comprising, for a particular one of the controllable elements: assigning the procedural instance to a cluster for the particular controllable element in accordance with current values of a set of clustering parameters for the particular controllable element; and selecting a setting for the particular controllable element for the procedural instances based on a causal model that is specific to the cluster; obtaining environment responses to the selected control settings that define a value of the performance metric for the procedural instance; and updating, for the particular controllable element, the causal model for the cluster for the controllable element to which the procedural instance was assigned based on the value of the performance metric.
-
公开(公告)号：US11966204B2
公开(公告)日：2024-04-23
申请号：US17438725
申请日：2019-09-11
Applicant: 3M INNOVATIVE PROPERTIES COMPANY
Inventor： Gilles J. Benoit , Brian E. Brooks , Peter O. Olson , Tyler W. Olson , Himanshu Nayar , Frederick J. Arsenault , Nicholas A. Johnson
IPC: G05B13/04 , B60W40/064 , B60W40/08 , B60W40/105 , G05B13/02 , G05B19/4065 , G05B19/418 , G05B23/02 , G06F18/21 , G06N5/043 , G06N5/046 , G06N7/01 , G06Q10/0631 , G06Q10/0639 , G06Q10/087 , G06Q30/0202
CPC classification number: G05B13/042 , B60W40/064 , B60W40/08 , B60W40/105 , G05B13/021 , G05B13/024 , G05B13/0265 , G05B13/041 , G05B19/4065 , G05B19/41835 , G05B23/0229 , G05B23/0248 , G06F18/2193 , G06N5/043 , G06N5/046 , G06N7/01 , G06Q10/06315 , G06Q10/06395 , G06Q30/0202 , G05B2219/36301 , G06Q10/087
Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for determining causal models for controlling environments. One of the methods includes repeatedly selecting, by a control system for the environment, control settings for the environment based on internal parameters of the control system, wherein: at least some of the control settings for the environment are selected based on a causal model, and the internal parameters include a first set of internal parameters that define a number of previously received performance metric values that are used to generate the causal model for a particular controllable element; obtaining, for each selected control setting, a performance metric value; determining that generating the causal model for the particular controllable element would result in higher system performance; and adjusting, based on the determining, the first set of internal parameters.
-
-
-
-
-
-
-
-
-
Search Results
34
records
(took 0.014 seconds)
