公开(公告)号：US11501956B2

公开(公告)日：2022-11-15

申请号：US16878443

申请日：2020-05-19

Applicant: ASM IP Holding B.V.

Inventor： Carl White ,  Todd Dunn ,  Eric Shero ,  Kyle Fondurulia

IPC: H01J37/32 ,  C23C16/455

Abstract: A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.

公开(公告)号：US10832903B2

公开(公告)日：2020-11-10

申请号：US15861418

申请日：2018-01-03

Applicant: ASM IP Holding B.V.

Inventor： Fred Pettinger ,  Carl White ,  Dave Marquardt ,  Sokol Ibrani ,  Eric Shero ,  Todd Dunn ,  Kyle Fondurulia ,  Mike Halpin

IPC: H01L21/02 ,  C23C16/455 ,  H01J37/32 ,  C23C16/44

Abstract: Embodiments related to managing the process feed conditions for a semiconductor process module are provided. In one example, a gas channel plate for a semiconductor process module is provided. The example gas channel plate includes a heat exchange surface including a plurality of heat exchange structures separated from one another by intervening gaps. The example gas channel plate also includes a heat exchange fluid director plate support surface for supporting a heat exchange fluid director plate above the plurality of heat exchange structures so that at least a portion of the plurality of heat exchange structures are spaced from the heat exchange fluid director plate.

公开(公告)号：US09299595B2

公开(公告)日：2016-03-29

申请号：US14563044

申请日：2014-12-08

Applicant: ASM IP Holding B.V.

Inventor： Todd Dunn ,  Fred Alokozai ,  Jerry Winkler ,  Michael Halpin

IPC: F27D11/00 ,  H01L21/67 ,  H01L21/687 ,  F28D15/00

CPC classification number: H01L21/67103 ,  F28D15/00 ,  H01L21/67109 ,  H01L21/68714 ,  H01L21/68742

Abstract: A wafer processing apparatus may include a susceptor having a top side and a backside, a susceptor heater having a spacing member and a heating member, a shim removably mounted between the susceptor and the susceptor heater, a cavity formed by the susceptor backside, the susceptor heater, and the shim, a fluid inlet communicating with the cavity, and a plurality of fluid outlets communicating with the cavity.

公开(公告)号：US20150167159A1

公开(公告)日：2015-06-18

申请号：US14634342

申请日：2015-02-27

Applicant: ASM IP Holding B.V.

Inventor： Michael Halpin ,  Eric Shero ,  Carl White ,  Fred Alokozai ,  Jerry Winkler ,  Todd Dunn

IPC: C23C16/44

CPC classification number: C23C16/4409 ,  B01J8/0035 ,  B01J19/0073 ,  C23C16/4585 ,  H01L21/67126

Abstract: A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.

Abstract translation: 一种反应室，包括用于处理基板的上部区域，用于装载基板的下部区域，可在反应室内移动的基座，位于基座周边的第一密封构件，位于上部区域和 下部区域，其中第一和第二密封构件彼此选择性地接合以限制上部区域和下部区域之间的连通。

公开(公告)号：US20140103145A1

公开(公告)日：2014-04-17

申请号：US13651144

申请日：2012-10-12

Applicant: ASM IP HOLDING B.V.

Inventor： Carl White ,  Todd Dunn ,  Eric Shero ,  Kyle Fondurulia

IPC: B05B1/14

Abstract: A showerhead including a body having an opening, a first plate positioned within the opening and having a plurality of slots, a second plate positioned within the opening and having a plurality of slots, and wherein each of the first plate plurality of slots are concentrically aligned with the second plate plurality of slots.

Abstract translation: 一种喷头，包括具有开口的主体，位于开口内的第一板，并具有多个槽，第二板位于开口内并具有多个槽，并且其中，每个第一板多个槽同心对准 与第二板多个槽。