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公开(公告)号：US09299595B2
公开(公告)日：2016-03-29
申请号：US14563044
申请日：2014-12-08
Applicant: ASM IP Holding B.V.
Inventor： Todd Dunn , Fred Alokozai , Jerry Winkler , Michael Halpin
IPC: F27D11/00 , H01L21/67 , H01L21/687 , F28D15/00
CPC classification number: H01L21/67103 , F28D15/00 , H01L21/67109 , H01L21/68714 , H01L21/68742
Abstract: A wafer processing apparatus may include a susceptor having a top side and a backside, a susceptor heater having a spacing member and a heating member, a shim removably mounted between the susceptor and the susceptor heater, a cavity formed by the susceptor backside, the susceptor heater, and the shim, a fluid inlet communicating with the cavity, and a plurality of fluid outlets communicating with the cavity.
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2.发明申请公开(公告)号：US20150240359A1
公开(公告)日：2015-08-27
申请号：US14188760
申请日：2014-02-25
Applicant: ASM IP Holding B.V.
Inventor： Lucian C. Jdira , Herbert Terhorst , Michael Halpin , Carl White , Todd Robert Dunn , Eric Shero , Melvin Verbass , Christopher Wuester , Kyle Fondurulia
IPC: C23C16/455 , H01L21/02
Abstract: A gas inlet system for a wafer processing reactor includes a tubular gas manifold conduit adapted to be connected to a gas inlet port of the wafer processing reactor; and gas feeds including a first feed for feeding a first gas into the tubular gas manifold conduit and a second feed for feeding a second gas into the tubular gas manifold conduit. Each feed has two or more injection ports connected to the tubular gas manifold conduit at a first axial position of the tubular gas manifold conduit, and the injection ports of each of the gas feeds are evenly distributed along a circumference of the tubular gas manifold conduit at the first axial position.
Abstract translation: 用于晶片处理反应器的气体入口系统包括适于连接到晶片处理反应器的气体入口的管状气体歧管管道; 以及包括用于将第一气体输送到管状气体歧管导管中的第一进料和用于将第二气体供给到管状气体歧管导管中的第二进料的气体进料。 每个进料具有在管状气体歧管导管的第一轴向位置处连接到管状气体歧管导管的两个或更多个喷射端口，并且每个气体进料的喷射端口沿管状气体歧管导管的圆周均匀分布 第一个轴向位置。
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公开(公告)号：US20150167159A1
公开(公告)日：2015-06-18
申请号：US14634342
申请日：2015-02-27
Applicant: ASM IP Holding B.V.
Inventor： Michael Halpin , Eric Shero , Carl White , Fred Alokozai , Jerry Winkler , Todd Dunn
IPC: C23C16/44
CPC classification number: C23C16/4409 , B01J8/0035 , B01J19/0073 , C23C16/4585 , H01L21/67126
Abstract: A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.
Abstract translation: 一种反应室，包括用于处理基板的上部区域，用于装载基板的下部区域，可在反应室内移动的基座，位于基座周边的第一密封构件，位于上部区域和 下部区域，其中第一和第二密封构件彼此选择性地接合以限制上部区域和下部区域之间的连通。
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公开(公告)号：US20190109037A1
公开(公告)日：2019-04-11
申请号：US16210440
申请日：2018-12-05
Applicant: ASM IP HOLDING B.V.
Inventor： Michael Halpin
IPC: H01L21/687 , F16D1/12 , F16D1/033
Abstract: The invention is directed to an alignment assembly for changing the relative position of a plate of a pedestal assembly with respect to a processing chamber of a reactor. The alignment assembly is connected at a first end to a riser shaft of the heating assembly and at a second end to a drive shaft. One or more portions of the alignment assembly may be selectively axially rotated or laterally moved change the relative position of the plate with respect to the processing chamber as desired.
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公开(公告)号：US09340874B2
公开(公告)日：2016-05-17
申请号：US14634342
申请日：2015-02-27
Applicant: ASM IP Holding B.V.
Inventor： Michael Halpin , Eric Shero , Carl White , Fred Alokozai , Jerry Winkler , Todd Dunn
IPC: B01J19/00 , C23C16/44 , B01J8/00 , H01L21/67 , C23C16/458
CPC classification number: C23C16/4409 , B01J8/0035 , B01J19/0073 , C23C16/4585 , H01L21/67126
Abstract: A reaction chamber including an upper region for processing a substrate, a lower region for loading a substrate, a susceptor movable within the reaction chamber, a first sealing member positioned on a perimeter of the susceptor, a second sealing member positioned between the upper region and the lower region, wherein the first and second sealing members are selectively engaged with one another to limit communication between the upper region and the lower region.
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Patent Agency Ranking
公开(公告)号：US09167625B2
公开(公告)日：2015-10-20
申请号：US13677133
申请日：2012-11-14
Applicant: ASM IP Holding B.V.
Inventor： Eric Shero , Michael Halpin , Jerry Winkler
CPC classification number: H05B1/0233 , H01L21/67115 , H05B3/68
Abstract: A reaction chamber including a substrate supporting member positioned within the reaction chamber, the reaction chamber having a first region and a second region, a shield positioned within the second chamber and movable with the substrate supporting member, and wherein the shield is adjacent at least a bottom surface of the substrate supporting member.
Abstract translation: 一种反应室，包括位于所述反应室内的基板支撑构件，所述反应室具有第一区域和第二区域，所述反应室设置在所述第二室内并且可与所述基板支撑构件一起移动，并且其中所述屏蔽件至少与 底板支撑构件的底面。
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公开(公告)号：US11088015B2
公开(公告)日：2021-08-10
申请号：US16210440
申请日：2018-12-05
Applicant: ASM IP HOLDING B.V.
Inventor： Michael Halpin
Abstract: The invention is directed to an alignment assembly for changing the relative position of a plate of a pedestal assembly with respect to a processing chamber of a reactor. The alignment assembly is connected at a first end to a riser shaft of the heating assembly and at a second end to a drive shaft. One or more portions of the alignment assembly may be selectively axially rotated or laterally moved change the relative position of the plate with respect to the processing chamber as desired.
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公开(公告)号：US10683571B2
公开(公告)日：2020-06-16
申请号：US14188760
申请日：2014-02-25
Applicant: ASM IP Holding B.V.
Inventor： Lucian C. Jdira , Herbert Terhorst , Michael Halpin , Carl White , Todd Robert Dunn , Eric Shero , Melvin Verbass , Christopher Wuester , Kyle Fondurulia
IPC: C23C16/455 , H01L21/67 , H01J37/32
Abstract: A gas inlet system for a wafer processing reactor includes a tubular gas manifold conduit adapted to be connected to a gas inlet port of the wafer processing reactor; and gas feeds including a first feed for feeding a first gas into the tubular gas manifold conduit and a second feed for feeding a second gas into the tubular gas manifold conduit. Each feed has two or more injection ports connected to the tubular gas manifold conduit at a first axial position of the tubular gas manifold conduit, and the injection ports of each of the gas feeds are evenly distributed along a circumference of the tubular gas manifold conduit at the first axial position.
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公开(公告)号：US10186450B2
公开(公告)日：2019-01-22
申请号：US14336685
申请日：2014-07-21
Applicant: ASM IP HOLDING B.V.
Inventor： Michael Halpin
Abstract: The invention is directed to an alignment assembly for changing the relative position of a plate of a pedestal assembly with respect to a processing chamber of a reactor. The alignment assembly is connected at a first end to a riser shaft of the heating assembly and at a second end to a drive shaft. One or more portions of the alignment assembly may be selectively axially rotated or laterally moved change the relative position of the plate with respect to the processing chamber as desired.
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公开(公告)号：US20150096973A1
公开(公告)日：2015-04-09
申请号：US14563044
申请日：2014-12-08
Applicant: ASM IP Holding B.V.
Inventor： Todd Dunn , Fred Alokozai , Jerry Winkler , Michael Halpin
IPC: H01L21/67 , F28D15/00 , H01L21/687
CPC classification number: H01L21/67103 , F28D15/00 , H01L21/67109 , H01L21/68714 , H01L21/68742
Abstract: A wafer processing apparatus may include a susceptor having a top side and a backside, a susceptor heater having a spacing member and a heating member, a shim removably mounted between the susceptor and the susceptor heater, a cavity formed by the susceptor backside, the susceptor heater, and the shim, a fluid inlet communicating with the cavity, and a plurality of fluid outlets communicating with the cavity.
Abstract translation: 晶片处理装置可以包括具有顶侧和背面的基座，具有间隔构件和加热构件的基座加热器，可移除地安装在基座和基座加热器之间的垫片，由基座背面形成的空腔，基座 加热器和垫片，与空腔连通的流体入口以及与空腔连通的多个流体出口。
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