公开(公告)号：US20200233319A1

公开(公告)日：2020-07-23

申请号：US16625135

申请日：2018-06-07

Applicant: ASML Netherlands B.V.

Inventor： Adrianus, Hendrik Koevoets ,  Cornelis, Adrianus De Meijere ,  Willem, Michiel De Rapper ,  Sjoerd, Nicolaas, Lambertus Donders ,  Jan Groenewold ,  Alain, Louis, Claude Leroux ,  Maxim, Aleksandrovich Nasalevich ,  Andrey Nikipelov ,  Johannes, Adrianus, Cornelis, Maria Pijnenburg ,  Jacobus, Cornelis, Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.

公开(公告)号：US10588211B2

公开(公告)日：2020-03-10

申请号：US15035983

申请日：2014-10-23

Applicant: ASML Netherlands B.V.

Inventor： Rolf Theodorus Nicolaas Beijsens ,  Kornelis Frits Feenstra ,  Arjen Teake De Jong ,  Reinier Theodorus Martinus Jilisen ,  Niek Antonius Jacobus Maria Kleemans ,  Andrey Nikipelov ,  Pavel Seroglazov ,  Nicolaas Antonius Allegondus Johannes Van Asten ,  Harald Ernest Verbraak

IPC: H05G2/00

Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.

公开(公告)号：US09986628B2

公开(公告)日：2018-05-29

申请号：US14440934

申请日：2013-10-10

Applicant: ASML Netherlands B.V.

Inventor： Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Andrey Nikipelov ,  Edgar Alberto Osorio Oliveros ,  Alexander Matthijs Struycken ,  Bert Pieter Van Drieënhuizen ,  Jan Bernard Plechelmus Van Schoot

IPC: H05G2/00 ,  G03F7/20 ,  H01S3/08 ,  G21K1/06 ,  H01S3/23 ,  H01S3/07 ,  H01S3/081 ,  H01S3/13 ,  H01S3/223

CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/7085 ,  G21K1/062 ,  G21K2201/067 ,  H01S3/073 ,  H01S3/08059 ,  H01S3/0815 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2383 ,  H05G2/008

Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

公开(公告)号：US20150286145A1

公开(公告)日：2015-10-08

申请号：US14438482

申请日：2013-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Nikipelov ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G02B17/0657 ,  G02B17/0808 ,  G03F7/70041 ,  G03F7/7005 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.

Abstract translation: 用于光刻设备的辐射源使用多个光纤激光器在点火位置点燃燃料液滴以产生EUV辐射。 可以将光纤激光器设置成平行于光轴发射，并且提供伸缩光学系统以将激光器聚焦在点火位置，或者激光器可以被引导到光轴，最终聚焦透镜用于减小光束腰部 。 激光器可以以两个或更多个组提供，以允许它们被独立控制，并且一些激光器可以聚焦在不同的位置以提供预脉冲。 光纤激光器的辐射也可以使用二向色镜来组合。