公开(公告)号：US11815675B2

公开(公告)日：2023-11-14

申请号：US17633882

申请日：2020-07-27

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Simon Reinald Huisman

IPC: G02B26/06 ,  G02F1/11 ,  G03F9/00

CPC classification number: G02B26/06 ,  G02F1/113 ,  G03F9/7088

Abstract: Disclosed is a phase modulator apparatus comprises at least a first phase modulator for modulating input radiation, and a metrology device comprising such a phase modulator apparatus. The first phase modulator comprises a first moving grating in at least an operational state for diffracting the input radiation and Doppler shifting the frequency of the diffracted radiation; and a first compensatory grating element comprising a pitch configured to compensate for wavelength dependent dispersion of at least one diffraction order of said diffracted radiation.

公开(公告)号：US11803130B2

公开(公告)日：2023-10-31

申请号：US17633884

申请日：2020-08-05

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Franciscus Godefridus Casper Bijnen ,  Muhsin Eralp ,  Simon Reinald Huisman ,  Arie Jeffrey Den Boef

IPC: G03F9/00

CPC classification number: G03F9/7049 ,  G03F9/7069 ,  G03F9/7088

Abstract: An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.

公开(公告)号：US11762305B2

公开(公告)日：2023-09-19

申请号：US17782570

申请日：2020-11-16

Applicant: ASML Netherlands B.V.

Inventor： Sergei Sokolov ,  Filippo Alpeggiani ,  Sebastianus Adrianus Goorden ,  Simon Reinald Huisman

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7065 ,  G03F9/7092

Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.

公开(公告)号：US11300892B2

公开(公告)日：2022-04-12

申请号：US17256408

申请日：2019-06-13

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald Huisman ,  Alessandro Polo

IPC: G03F9/00 ,  G01J9/02

Abstract: A sensor apparatus (300) for determining a position of a target (330) of a substrate (W) comprising, projection optics (315;321) configured to project a radiation beam (310) onto the substrate, collection optics (321) configured to collect measurement radiation (325) that has scattered from the target, a wavefront sensing system (335) configured to determine a pupil function variation of at least a portion (355) of the measurement radiation and output a signal (340) indicative thereof, and a measurement system (350) configured to receive the signal and to determine the position of the target in at least partial dependence on the collected measurement radiation and the determined pupil function variation of at least a portion of the measurement radiation.

公开(公告)号：US10317808B2

公开(公告)日：2019-06-11

申请号：US16069678

申请日：2017-01-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Reinald Huisman ,  Alessandro Polo ,  Duygu Akbulut ,  Sebastianus Adrianus Goorden ,  Arie Jeffrey Den Boef

IPC: G01B11/00 ,  G03F9/00 ,  G01B9/02 ,  G01D5/26

Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.