公开(公告)号：US12287591B2

公开(公告)日：2025-04-29

申请号：US18269191

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Arjan Johannes Anton Beukman ,  Sebastianus Adrianus Goorden ,  Stephen Roux ,  Sergei Sokolov ,  Filippo Alpeggiani

IPC: G03F7/00 ,  G03F9/00

Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.

公开(公告)号：US11762305B2

公开(公告)日：2023-09-19

申请号：US17782570

申请日：2020-11-16

Applicant: ASML Netherlands B.V.

Inventor： Sergei Sokolov ,  Filippo Alpeggiani ,  Sebastianus Adrianus Goorden ,  Simon Reinald Huisman

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7065 ,  G03F9/7092

Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.

公开(公告)号：US12025925B2

公开(公告)日：2024-07-02

申请号：US17773384

申请日：2020-10-19

Applicant: ASML Netherlands B.V.

Inventor： Filippo Alpeggiani ,  Henricus Petrus Maria Pellemans ,  Sebastianus Adrianus Goorden ,  Simon Reinald Huisman

IPC: G03F7/20 ,  G03F7/00 ,  G03F9/00

CPC classification number: G03F9/7046 ,  G03F7/70091 ,  G03F7/70133 ,  G03F7/70516

Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.