公开(公告)号：US11513087B2

公开(公告)日：2022-11-29

申请号：US17073271

申请日：2020-10-16

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen ,  Xiaoyu Ji ,  Xiaoxue Chen ,  Weimin Zhou ,  Frank Nan Zhang

IPC: G01N23/2202 ,  G01N1/44 ,  G01N23/2251

Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

公开(公告)号：US11430631B2

公开(公告)日：2022-08-30

申请号：US16833463

申请日：2020-03-27

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Shih Liu ,  Xuedong Liu ,  Wei Fang ,  Jack Jau

IPC: H01J37/28 ,  H01J37/26

Abstract: Disclosed herein is a method comprising: generating a plurality of probe spots on a sample by a plurality of beams of charged particles; while scanning the plurality of probe spots across a region on the sample, recording from the plurality of probe spots a plurality of sets of signals respectively representing interactions of the plurality of beams of charged particles and the sample; generating a plurality of images of the region respectively from the plurality of sets of signals; and generating a composite image of the region from the plurality of images.

公开(公告)号：US10811222B2

公开(公告)日：2020-10-20

申请号：US16200421

申请日：2018-11-26

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/14 ,  H01J37/141 ,  H01J37/29 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244

Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.

公开(公告)号：US20200152421A1

公开(公告)日：2020-05-14

申请号：US16734219

申请日：2020-01-03

Applicant: ASML Netherlands B.V.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/10

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US10573487B2

公开(公告)日：2020-02-25

申请号：US16174146

申请日：2018-10-29

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US10541110B2

公开(公告)日：2020-01-21

申请号：US15925606

申请日：2018-03-19

Applicant: ASML Netherlands B.V.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20190259573A1

公开(公告)日：2019-08-22

申请号：US16398178

申请日：2019-04-29

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US12237144B2

公开(公告)日：2025-02-25

申请号：US18477213

申请日：2023-09-28

Applicant: ASML Netherlands B.V.

Inventor： Xuerang Hu ,  Weiming Ren ,  Xuedong Liu ,  Zhong-wei Chen

IPC: H01J37/147 ,  H01J37/12 ,  H01J37/26

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer, a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the eclectically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：US12237143B2

公开(公告)日：2025-02-25

申请号：US18392494

申请日：2023-12-21

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US12165837B2

公开(公告)日：2024-12-10

申请号：US17901767

申请日：2022-09-01

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus Maria Johannes Maassen ,  Joost Jeroen Ottens ,  Long Ma ,  Youfei Jiang ,  Weihua Yin ,  Wei-Te Li ,  Xuedong Liu

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.