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公开(公告)号：US20090095925A1
公开(公告)日：2009-04-16
申请号：US12288970
申请日：2008-10-24
IPC分类号： G01J3/10
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100mum的EUV目标液滴在所涉及的几何形状的约束条件下是不切实际的 聚焦镜头。 驱动激光器可以包括CO2激光器。 驱动激光重定向机构可以包括镜子。
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公开(公告)号：US09713239B2
公开(公告)日：2017-07-18
申请号：US12928313
申请日：2010-12-07
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
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公开(公告)号：US08704200B2
公开(公告)日：2014-04-22
申请号：US13441639
申请日：2012-04-06
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.
摘要翻译： 公开了一种EUV光源，其可以包括多个目标，例如锡滴，以及产生预脉冲和主脉冲的系统，其中具有用于照射目标的预脉冲以产生扩展的目标。 该系统还可以包括连续泵浦的激光器装置，其产生具有用于照射扩展目标的主脉冲以产生EUV光脉冲的脉冲的主脉冲。 该系统还可以具有在EUV光脉冲的突发期间改变至少一个预脉冲参数的控制器。 另外，EUV光源还可以包括测量EUV光脉冲脉冲串内的至少一个EUV光脉冲的强度的仪器，并且向控制器提供反馈信号以在脉冲串的爆发期间改变至少一个预脉冲参数 EUV光脉冲以产生具有预选剂量的EUV脉冲的突发。
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公开(公告)号：US08461560B2
公开(公告)日：2013-06-11
申请号：US13087207
申请日：2011-04-14
摘要： An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.
摘要翻译： 公开了一种装置和方法，其包括或使用包括输出激光束的激光装置的EUV光源，将激光束引导到照射部位的光束传递系统，以及用于在照射部位与激光束相互作用的材料 创建用于处理衬底的EUV发光等离子体。
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公开(公告)号：US08017924B2
公开(公告)日：2011-09-13
申请号：US12322669
申请日：2009-02-04
IPC分类号： H01J35/20
CPC分类号： H05G2/003 , G03F7/70033 , H01S3/0064 , H01S3/073 , H01S3/0805 , H01S3/08054 , H01S3/08059 , H01S3/083 , H01S3/10092 , H01S3/105 , H01S3/1066 , H01S3/115 , H01S3/121 , H01S3/127 , H01S3/2232 , H01S3/2316 , H01S3/2325 , H01S3/2383 , H05G2/008
摘要： An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.
摘要翻译： 公开了一种LPP EUV光源，其具有位于等离子体室中的光学器件，用于反射在其中产生的EUV光和激光输入窗口。 对于该方面，EUV光源可以被配置为将窗口暴露于更低的气体蚀刻剂压力以将窗口暴露于气体蚀刻剂压力以进行光学清洁，以避免窗口涂层变质。 在另一方面，EUV光源可以包括沿着光束路径定位以参与与光束路径上的光的第一相互作用的目标材料; 光放大器; 以及至少一个光导向光子从第一相互作用散射到光放大器中以在光束路径上产生激光束，用于随后与目标材料的相互作用以产生EUV发光等离子体。
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26.发明申请Systems and methods for target material delivery in a laser produced plasma EUV light source 有权用于激光产生等离子体EUV光源的靶材料输送的系统和方法公开(公告)号：US20090230326A1
公开(公告)日：2009-09-17
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G21K5/00
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译： 本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。 光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。 该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。
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公开(公告)号：US07482609B2
公开(公告)日：2009-01-27
申请号：US11217161
申请日：2005-08-31
IPC分类号： G01J1/00
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下 聚焦镜头。 驱动激光器可以包括CO2激光器。 驱动激光重定向机构可以包括镜子。
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公开(公告)号：US07465946B2
公开(公告)日：2008-12-16
申请号：US11406216
申请日：2006-04-17
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.
摘要翻译： 公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。 在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素 元素表面。 锡化合物可以包括SnBr4，SnBr2和SnH4。 另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。
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公开(公告)号：US20110192995A1
公开(公告)日：2011-08-11
申请号：US13087207
申请日：2011-04-14
IPC分类号： H05G2/00
摘要： An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.
摘要翻译： 公开了一种装置和方法，其包括或使用包括输出激光束的激光装置的EUV光源，将激光束引导到照射部位的光束传递系统，以及用于在照射部位与激光束相互作用的材料 创建用于处理衬底的EUV发光等离子体。
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公开(公告)号：US07928417B2
公开(公告)日：2011-04-19
申请号：US12288970
申请日：2008-10-24
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译： 公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。 该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，使得在有效的等离子体产生能量下聚焦在小于约100μm的EUV目标液滴在所涉及的几何形状的约束条件下是不实际的 聚焦镜头。 驱动激光器可以包括CO2激光器。 驱动激光重定向机构可以包括镜子。
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