摘要:
An underwater buoyancy apparatus for compensating for wave induced vertical and/or horizontal motion, particularly in sonar devices deployed from nautical platform. The underwater buoyancy apparatus is slidably connected along a tether between a nautical platform and an underwater sonar device. The underwater buoyancy apparatus contains a volume of air and/or water which can be changed to thereby alter the underwater buoyancy apparatus's depth in a body of water, in response to vertical and/or horizontal motion the nautical platform.
摘要:
Disclosed are methods for treating urinary incontinence in a mammal wherein a composition comprising a biocompatible polymer, a biocompatible solvent, and a contrast agent is delivered to the periurethral tissue of the mammal.
摘要:
A stent and stent catheter for intra-cranial use. The stent is a rolled sheet stent and is releasably mounted on the distal tip of the catheter with a low profile retaining tab. The stent is rolled tightly on the distal tip of the catheter and flexibility of the tightly rolled stent is promoted by ribbed or slatted construction (or, alternatively, slotted construction) in which the various layers of the stent are provided with numerous slats which counter align when the stent is expanded to form an imperforate wall from a plurality of perforate layers.
摘要:
Disclosed are methods for the sterilization of a male mammal wherein a composition comprising a biocompatible polymer, a biocompatible solvent, and a contrast agent is delivered to the vas deferens of the male mammal.
摘要:
Disclosed are methods for treating urinary incontinence in a mammal wherein a composition comprising a biocompatible polymer, a biocompatible solvent, and a contrast agent is delivered to the periurethral tissue of the mammal.
摘要:
A stent and stent catheter for intra-cranial use. The stent is a rolled sheet stent and is releasably mounted on the distal tip of the catheter by means of a non-sliding retention and release mechanism. The non-sliding release mechanism is operated remotely at the proximal end of the catheter by means of a linear translator. The stent is rolled tightly on the distal tip of the catheter and flexibility of the tightly rolled stent is promoted by ribbed or slatted construction (or, alternatively, slotted construction) in which the various layers of the stent are provided with numerous slats which counter align when the stent is expanded to form an imperforate wall from a plurality of perforate layers.
摘要:
A semiconductor wafer handler comprises a ring (70) attached to a hub (80) by a plurality of spokes (90). Vacuum is applied to the surface of the semiconductor wafer through orifices (100) containing in the ring (70). Water and/or nitrogen can be applied to the surface of the semiconductor wafer through orifices (110) contained in the spokes (90).
摘要:
A semiconductor wafer handler comprises a ring (70) attached to a hub (80) by a plurality of spokes (90). Vacuum is applied to the surface of the semiconductor wafer through orifices (100) containing in the ring (70). Water and/or nitrogen can be applied to the surface of the semiconductor wafer through orifices (110) contained in the spokes (90).
摘要:
A stent and stent catheter for intra-cranial use. The stent is a rolled sheet stent and is releasably mounted on the distal tip of the catheter by means of a non-sliding retention and release mechanism. The non-sliding release mechanism is operated remotely at the proximal end of the catheter by means of a linear translator. The stent is rolled tightly on the distal tip of the catheter and flexibility of the tightly rolled stent is promoted by ribbed or slatted construction (or, alternatively, slotted construction) in which the various layers of the stent are provided with numerous slats which counter align when the stent is expanded to form an imperforate wall from a plurality of perforate layers.
摘要:
A pad cleaning device (210, 220, 250) is used in conjunction with spray rinse water to thoroughly clean a polishing pad (110) of a chemical-mechanical polishing system (100) after a wafer (120) has been polished. A sprayer or sprayer extension (210, 220, 250) is strategically positioned and securely retained on a portion of the dispensing arm (130) and adapted for applying a rinse water spray directly to the center portion (150) of the pad preventing conglomerated slurry from accumulating.