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公开(公告)号：US20220288259A1
公开(公告)日：2022-09-15
申请号：US17200408
申请日：2021-03-12
Applicant: Applied Materials, Inc.
Abstract: Embodiments of the present disclosure relate to an oxygen cleaning chamber with UV radiation generator temperature control and a method of atomic oxygen cleaning a substrate. The atomic oxygen cleaning chamber includes a process chamber and a cooling chamber coupled to the process chamber and a divider sealingly separating the process chamber from the cooling chamber. An ultraviolet (UV) radiation generator is disposed in the cooling chamber and provides UV radiation through the divider into the process chamber. A gas distribution assembly distributes ozone over an upper surface of a pedestal in the process chamber and a coolant distribution assembly distributes cooling gas into the cooling chamber to cool the UV radiation generator. By actively cooling the UV radiation generator, a higher intensity UV radiation at a stable wavelength is produced, i.e., without wavelength drift normally associated with high power UV radiation generator outputs.
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公开(公告)号：US20200098556A1
公开(公告)日：2020-03-26
申请号：US16556562
申请日：2019-08-30
Applicant: Applied Materials, Inc.
Abstract: Embodiments described herein relate to oxygen cleaning chambers and a method of atomic oxygen cleaning a substrate. The oxygen cleaning chambers and method of atomic oxygen cleaning a substrate provide for generation of atomic oxygen in situ to oxidize materials on the surfaces of the substrate. The atomic oxygen cleaning chamber includes a chamber body, a chamber lid, a processing volume defined by the chamber body and the chamber lid, an UV radiation generator including one or more UV radiation sources, a pedestal disposed in the processing volume, and a gas distribution assembly. The pedestal has a processing position corresponding to a distance from the UV radiation generator to an upper surface of the pedestal. The gas distribution assembly is configured to be connected to an ozone generator to distribute ozone over the upper surface of the pedestal.
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公开(公告)号：US20180040457A1
公开(公告)日：2018-02-08
申请号：US15671862
申请日：2017-08-08
Applicant: Applied Materials, Inc.
Inventor： Banqiu WU
CPC classification number: H01J37/321 , H01J37/32422 , H01J37/3244 , H01J37/32477 , H01J37/32623 , H01J37/32651 , H01J2237/3321 , H01J2237/334 , H01L21/67069
Abstract: Implementations of the disclosure provide a surface treatment process for chamber components. In one implementation, the chamber component includes a crystalline body comprising machined surfaces including at least a reflowed surface layer formed in a plasma treatment chamber by placing the body on a pedestal disposed within the plasma chamber, maintaining a pressure in the plasma chamber at 0.1-100 mTorr, flowing a gas into the plasma chamber at a flow rate of 10-500 sccm, applying an RF power to an inductive coil of the plasma chamber to form a plasma from the gas in the plasma chamber, the RF power of 300 Watts is applied at a frequency of 10 kHz to 160 MHz, and applying an RF bias power of 100 Watts at a frequency of 10 kHz to 160 MHz to the pedestal to bombard the body with ions from the plasma for 10-100 hours.
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公开(公告)号：US20240157411A1
公开(公告)日：2024-05-16
申请号：US17987591
申请日：2022-11-15
Applicant: Applied Materials, Inc.
Inventor： Banqiu WU , Khalid MAKHAMREH , Eliyahu Shlomo DAGAN
CPC classification number: B08B7/04 , B08B3/08 , B08B3/10 , B08B7/0057 , B08B13/00 , B08B2203/005
Abstract: A cleaning apparatus for cleaning a substrate wherein the substrate is contacted with ozonated water and irradiating the substrate and the ozonated water with UV electromagnetic radiation from a UV lamp within a cleaning chamber; wherein greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm. Methods of cleaning a substrate are also presented.
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公开(公告)号：US20240027894A1
公开(公告)日：2024-01-25
申请号：US18370190
申请日：2023-09-19
Applicant: Applied Materials, Inc.
Inventor： Banqiu WU , Khalid MAKHAMREH , Eliyahu Shlomo DAGAN
CPC classification number: G03F1/82 , H01J37/32825 , H01J37/3244 , H01J37/3299 , H01J37/32972 , B08B7/0035 , B08B13/00 , H01J37/32082 , H01J2237/335 , H01J2237/0206
Abstract: Methods and apparatus leverage dielectric barrier discharge (DBD) plasma to treat samples for surface modification prior to photomask application and for photomask cleaning. In some embodiments, a method of treating a surface with AP plasma includes igniting plasma over an ignition plate where the AP plasma is formed by one or more plasma heads of an AP plasma reactor positioned above the ignition plate, monitoring characteristics of the AP plasma with an optical emission spectrometer (OES) sensor to determine if stable AP plasma is obtained and, if so, moving the AP reactor over a central opening of an assistant plate where the central opening contains a sample under treatment and where the assistant plate reduces AP plasma arcing on the sample during treatment. The AP reactor scans back and forth over the central opening of the assistant plate while maintaining stabilized AP plasma to treat the sample.
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Patent Agency Ranking
公开(公告)号：US20230127302A1
公开(公告)日：2023-04-27
申请号：US17550903
申请日：2021-12-14
Applicant: Applied Materials, Inc.
Inventor： Banqiu WU , Khalid MAKHAMREH , Eliyahu Shlomo DAGAN
Abstract: Embodiments of megasonic cleaning chambers are provided herein. In some embodiments, a megasonic cleaning chamber includes: a chamber body defining an interior volume therein; a substrate support to support a substrate disposed in the interior volume; a supply tube comprising a transparent material configured to direct a cleaning fluid to the substrate support; a megasonic power generator coupled to the supply tube to provide megasonic power to the cleaning fluid; a megasonic transducer coupled to the megasonic power generator and the supply tube to create megasonic waves in the cleaning fluid and to form cavities in the cleaning fluid, wherein the megasonic transducer is configured to direct the megasonic waves and cavities toward the substrate support; and one or more sensors configured to generate a signal indicative of a property of the cavities in the cleaning fluid.
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公开(公告)号：US20230044618A1
公开(公告)日：2023-02-09
申请号：US17397088
申请日：2021-08-09
Applicant: Applied Materials, Inc.
Inventor： Banqiu WU , Khalid MAKHAMREH , Hiroki OGAWA , Eliyahu Shlomo DAGAN
Abstract: A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.
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公开(公告)号：US20220326606A1
公开(公告)日：2022-10-13
申请号：US17226775
申请日：2021-04-09
Applicant: Applied Materials, Inc.
Inventor： Banqiu WU , Khalid MAKHAMREH , Eliyahu Shlomo DAGAN
Abstract: Embodiments of baking chambers for baking a photomask are provided herein. In some embodiments, a baking chamber includes: a chamber body enclosing a first interior volume and a second interior volume, disposed beneath and fluidly independent from the first interior volume; a radiant heat source disposed in the first interior volume; a photomask support structure configured to support a photomask disposed in the second interior volume; a window disposed between the first interior volume the second interior volume, wherein the window is made of a material that is transparent to thermal radiation; a first gas inlet and a first gas outlet coupled to the first interior volume; and a second gas inlet and a second gas outlet coupled to the second interior volume on opposite ends thereof to facilitate flow of a process gas laterally through the second interior volume and across the photomask support structure.
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公开(公告)号：US20200290339A1
公开(公告)日：2020-09-17
申请号：US16885469
申请日：2020-05-28
Applicant: Applied Materials, Inc.
IPC: B41C1/10 , G03F7/20 , H01L21/027
Abstract: Embodiments described herein generally relate to an apparatus and methods for removing a glue residue from a photomask. The glue residue may be exposed when a pellicle is removed from the photomask. Before a new pellicle can be adhered to the photomask, the glue residue may be removed. To remove the glue residue, a laser beam may be projected through a lens and focused on a surface of the glue residue. The glue residue may be ablated from the photomask by the laser beam.
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公开(公告)号：US20200166834A1
公开(公告)日：2020-05-28
申请号：US16685164
申请日：2019-11-15
Applicant: Applied Materials, Inc.
Inventor： Banqiu WU , Eli DAGAN , Khalid MAKHAMREH , Bruce J. FENDER
Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.
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