-
公开(公告)号：US10994991B2
公开(公告)日：2021-05-04
申请号：US16792861
申请日：2020-02-17
Applicant: Applied Materials, Inc.
Inventor： Joseph R. Johnson , Kenichi Ohno
IPC: B82B3/00 , G01N33/487 , B82B1/00 , B81C1/00
Abstract: Methods are provided for manufacturing well-controlled, solid-state nanopores and arrays of well-controlled, solid-state nanopores by a cyclic process including atomic layer deposition (ALD), or chemical vapor deposition (CVD), and etching. One or more features are formed in a thin film deposited on a topside of a substrate. A dielectric material is deposited over the substrate having the one or more features in the thin film. An etching process is then used to etch a portion of the dielectric material deposited over the substrate having the one or more features in the thin film. The dielectric material deposition and etching processes are optionally repeated to reduce the size of the features until a well-controlled nanopore is formed through the thin film on the substrate.
-
公开(公告)号：US10830756B2
公开(公告)日：2020-11-10
申请号：US16122171
申请日：2018-09-05
Applicant: Applied Materials, Inc.
Inventor： Ankit Vora , Kenichi Ohno , Philip Allan Kraus , Zohreh Hesabi , Joseph R. Johnson
IPC: G01N27/447 , G01N33/487 , B82B3/00 , B82B1/00 , B81C1/00
Abstract: Methods of manufacturing well-controlled nanopores using directed self-assembly and methods of manufacturing free-standing membranes using selective etching are disclosed. In one aspect, one or more nanopores are formed by directed self-assembly with block co-polymers to shrink the critical dimension of a feature which is then transferred to a thin film. In another aspect, a method includes providing a substrate having a thin film over a highly etchable layer thereof, forming one or more nanopores through the thin film over the highly etchable layer, for example, by a pore diameter reduction process, and then selectively removing a portion of the highly etchable layer under the one or more nanopores to form a thin, free-standing membrane.
-
公开(公告)号：US10752496B2
公开(公告)日：2020-08-25
申请号：US16049749
申请日：2018-07-30
Applicant: Applied Materials, Inc.
Inventor： Philip Allan Kraus , Joseph R. Johnson
IPC: B81C1/00 , H01L21/02 , G01N33/487 , G01N27/49 , H01L21/302
Abstract: Methods are provided for manufacturing well-controlled, solid-state nanopores and arrays thereof. In one aspect, methods for manufacturing nanopores and arrays thereof exploit a physical seam. One or more etch pits are formed in a topside of a substrate and one or more trenches, which align with the one or more etch pits, are formed in a backside of the substrate. An opening is formed between the one or more etch pits and the one or more trenches. A dielectric material is then formed over the substrate to fill the opening. Contacts are then disposed on the topside and the backside of the substrate and a voltage is applied from the topside to the backside, or vice versa, through the dielectric material to form a nanopore. In another aspect, the nanopore is formed at or near the center of the opening at a seam, which is formed in the dielectric material.
-
公开(公告)号：US10234630B2
公开(公告)日：2019-03-19
申请号：US15647348
申请日：2017-07-12
Applicant: Applied Materials, Inc.
Abstract: Embodiments described herein generally relate to a wave guide and a method of creating a wave guide. In one embodiment, a method of forming a wave guide is disclosed herein. An inverse master substrate having a plurality of projections extending therefrom is formed. A high refractive index material is formed on a top surface of the inverse master substrate. A glass layer is positioned on a top surface of the high refractive index material. The inverse master substrate is removed from the high refractive index material.
-
公开(公告)号：US12105424B2
公开(公告)日：2024-10-01
申请号：US17639240
申请日：2020-08-19
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Thomas L. Laidig , Joseph R. Johnson
CPC classification number: G03F7/2057 , G03F7/203 , G03F7/70625
Abstract: Examples described herein provide a system, a software application, and a method of a lithography process to write multiple tones in a single pass. A system includes a stage and a lithography system. The lithography system includes image projection systems, a controller, and memory. The controller is coupled to the memory, which stores instruction code. Execution of the instruction code by the controller causes the controller to control the stage and the image projection systems to iteratively expose a photoresist supported by the stage and to move the stage relative to the image projection systems a step distance between sequential pairs of the exposures. Each exposure includes using write beam(s) projected from the image projection systems. Each exposure is at a respective one of different dosage amounts. An accumulation of the different dosage amounts is a full tone dosage amount for the photoresist.
-
Patent Agency Ranking
26.发明授权公开(公告)号：US11815818B2
公开(公告)日：2023-11-14
申请号：US17740750
申请日：2022-05-10
Applicant: Applied Materials, Inc.
Inventor： Joseph R. Johnson , Christopher Dennis Bencher
CPC classification number: G03F7/70466 , G03F7/70191 , G02B26/105
Abstract: Methods for patterning a substrate are described. A substrate is scanned using a spatial light modulator with a plurality of exposures timed according to a non-crystalline shot pattern. Lithography systems for performing the substrate patterning method and non-transitory computer-readable medium for executing the patterning method are also described.
-
公开(公告)号：US20230112114A1
公开(公告)日：2023-04-13
申请号：US17953575
申请日：2022-09-27
Applicant: Applied Materials, Inc.
Inventor： Joseph R. Johnson , Yang Ming Lee , Hsiao-Ying Cheng , Christabelle Si Mei Goh , Ustun Serdar Tulu , Chang H. Choi , Chloe Kim
Abstract: Exemplary sample processing methods are described that include providing an initial sample to a sample processing system. The sample processing system includes a light-emitting-diode, a temperature control unit, and a fluid supply unit. The methods also include irradiating the initial sample with light emitted from the light-emitting-diode to produce an irradiated sample. The methods may still further include adjusting a temperature of the irradiated sample with the temperature control unit to between 0° C. and 60° C., and contacting the irradiated sample with a fluid from the fluid supply unit. The irradiated sample has a reduction in auto-fluorescence of greater than or about 50% compared to the initial sample. Exemplary sample processing systems are also described that include a light-emitting-diode, a temperature control unit, and a fluid supply unit.
-
公开(公告)号：US10983444B2
公开(公告)日：2021-04-20
申请号：US15964018
申请日：2018-04-26
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Joseph R. Johnson
IPC: G03F7/20
Abstract: Embodiments of the present disclosure provide improved photolithography systems and methods using a solid state emitter device. The solid state emitter device includes an array of solid state emitters arranged in a plurality of horizontal rows and vertical columns. The variable intensity of each group of solid state emitters, for example an entire row or column of solid state emitters, is controllable for improved field brightness uniformity and stitching. Controlling the variable intensity includes, for example, varying the signal, such as voltage, that is applied to each of the rows of solid state emitters to attenuate the brightness from the middle of the array to the edges of the array to accommodate for overlapping exposures during photolithography processing.
-
公开(公告)号：US10935890B2
公开(公告)日：2021-03-02
申请号：US16662196
申请日：2019-10-24
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Joseph R. Johnson , Thomas L. Laidig
Abstract: Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.
-
公开(公告)号：US10705433B2
公开(公告)日：2020-07-07
申请号：US16597718
申请日：2019-10-09
Applicant: Applied Materials, Inc.
Inventor： Joseph R. Johnson , Thomas L. Laidig , Christopher Dennis Bencher
Abstract: Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the “off” position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the “off” position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.
-
-
-
-
-
-
-
-
-
Search Results
33
records
(took 0.016 seconds)
