公开(公告)号：US20080002291A1

公开(公告)日：2008-01-03

申请号：US11411561

申请日：2006-04-25

申请人： Hamid Balamane ,  Christian Bonhote ,  Yimin Hsu ,  Aaron Neuhaus ,  Aron Pentek ,  Yi Zheng

发明人： Hamid Balamane ,  Christian Bonhote ,  Yimin Hsu ,  Aaron Neuhaus ,  Aron Pentek ,  Yi Zheng

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.

摘要翻译： 一种制造用于垂直磁记录的磁写头的方法，其具有具有非常窄的轨道宽度和良好控制的临界尺寸的写极。 写极通过在衬底上沉积导电种子层，然后在种子层上沉积光致抗蚀剂层而形成。 光致抗蚀剂层被光刻地曝光和显影以在光致镜层中形成开口或沟槽，该开口限定写入极的图案。 然后将磁性材料电镀在光致抗蚀剂层的开口中。 然后可以通过化学剥离去除光致抗蚀剂层，并且可以通过离子铣削除去未被写入极覆盖的种子层的部分。

公开(公告)号：US20070268625A1

公开(公告)日：2007-11-22

申请号：US11439297

申请日：2006-05-22

申请人： Ming Jiang ,  Aron Pentek ,  Yi Zheng

发明人： Ming Jiang ,  Aron Pentek ,  Yi Zheng

IPC分类号： G11B5/147 ,  G11B5/127

CPC分类号： G11B5/3143 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49021 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield. After forming a magnetic write pole such as by masking and ion milling a magnetic write pole layer, a thin layer of alumina is deposited. This is followed by the deposition of a thin layer of Rh. Then, a thick layer of alumina is deposited, having a thickness that is preferably at least equal to the height of the write pole layer. A chemical mechanical polish is then performed until a portion of the Rh layer over the top (trailing edge) of the write pole is exposed. A material removal process such as ion milling is then performed to remove the exposed Rh layer exposing the thin alumina layer there beneath. The exposed thin alumina layer over the trailing edge of the write pole can then either be removed or left intact to form a portion of a trailing shield gap layer. Another Rh layer can then be deposited to provide a non-magnetic trailing shield gap. A magnetic material is then deposited to form the trailing shield. Since the Rh trailing gap layer is electrically conductive it can also serve as a seed layer for electroplating the magnetic trailing shield.

摘要翻译： 一种用于构造用于垂直磁记录的磁写头的方法，该写头具有带后挡板的写极。 在通过掩蔽和离子铣削磁性写入磁极层形成磁性写入磁极之后，沉积薄层的氧化铝。 随后沉积一层薄薄​​的Rh。 然后，沉积厚的氧化铝层，其厚度优选至少等于写入极层的高度。 然后执行化学机械抛光，直到暴露在写柱的顶部（后缘）上的Rh层的一部分。 然后进行诸如离子研磨的材料去除工艺以除去暴露在其下面的薄氧化铝层的暴露的Rh层。 然后可以将写入极的后缘上的暴露的薄氧化铝层去除或保持不变，以形成后屏蔽间隙层的一部分。 然后可以沉积另一个Rh层以提供非磁性的后屏蔽间隙。 然后沉积磁性材料以形成尾部屏蔽。 由于Rh拖尾间隙层是导电的，所以它也可以用作用于电镀磁性后屏蔽的种子层。

公开(公告)号：US20070245545A1

公开(公告)日：2007-10-25

申请号：US11412038

申请日：2006-04-25

申请人： Aron Pentek ,  Yi Zheng

发明人： Aron Pentek ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49021 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield that wraps around the write pole. The method allows the trailing shield to be constructed with a very well controlled trailing gap thickness and also allows the write pole to be constructed with a well controlled track width and a straight, flat trailing edge. The method includes depositing a magnetic write pole over a substrate and forming a mask structure over the write pole layer. The mask structure includes an end point detection layer that can be removed by reactive ion etching. An ion mill is performed to form a write pole by removing magnetic write pole material that is not covered by the mask layer. A layer of non-magnetic material such as alumina is deposited and is ion milled to expose the end point detection layer. The end point detection layer is then removed by reactive ion etch and a magnetic wrap around trailing shield is deposited.

摘要翻译： 一种用于构造用于垂直磁记录的磁写头的方法，该写头具有一个写磁极，带有围绕写磁极的后屏蔽。 该方法允许尾部屏蔽件构造得非常好地控制拖尾间隙厚度，并且还允许写极构造具有良好控制的轨道宽度和直的平坦后缘。 该方法包括在衬底上沉积磁性写入极，并在写入极层上形成掩模结构。 掩模结构包括可以通过反应离子蚀刻去除的端点检测层。 通过去除未被掩模层覆盖的磁性写入极材料来执行离子磨以形成写入极。 沉积一层非磁性材料如氧化铝，并将其离子研磨以露出终点检测层。 然后通过反应离子蚀刻除去端点检测层，并且沉积围绕后屏蔽的磁性卷。

公开(公告)号：US20070124917A1

公开(公告)日：2007-06-07

申请号：US11297228

申请日：2005-12-07

申请人： Hamid Balamame ,  Daniel Bedell ,  Mary Gutberlet ,  Clarence Hsieh ,  Aron Pentek ,  Yi Zheng

发明人： Hamid Balamame ,  Daniel Bedell ,  Mary Gutberlet ,  Clarence Hsieh ,  Aron Pentek ,  Yi Zheng

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B5/3116 ,  Y10T29/49039 ,  Y10T29/49041 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method of manufacturing a magnetic write head that provides improved pole critical dimension control, such as improved track width control (improved sigma) and improved flare point control. The method involves a combination of several process improvements, such as photolithographically patterning a P2 pole tip defining photoresist frame using a zero print bias and also using a small flash field. The method also involves the use of a non-reactive ion etch to notch the first pole (P1) using the second pole (P2) as a mask.

摘要翻译： 一种制造磁写头的方法，其提供改进的极关键尺寸控制，例如改进的轨道宽度控制（改进的σ）和改进的闪点控制。 该方法涉及几个工艺改进的组合，例如使用零印刷偏压光刻地图案化限定光致抗蚀剂框架的P 2极尖端并且还使用小的闪光场。 该方法还涉及使用非反应性离子蚀刻来使用第二极（P 2）作为掩模将第一极（P1）切口。

公开(公告)号：US08568601B2

公开(公告)日：2013-10-29

申请号：US11947616

申请日：2007-11-29

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  H01L21/00

CPC分类号： G03B31/00

摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording. The method includes forming a write pole using a mask that includes a hard mask layer deposited over the write pole laminate material, and a thick, physically robust image transfer layer. The image transfer layer can be a material such as AlTiO that can be patterned by a reactive ion etching process, but which also resists deformation during processing. This process allows a write pole and wrap-around trailing shield to be constructed at very narrow track widths without the mask deformation and fencing problems experienced by prior art methods.

摘要翻译： 一种用于制造用于垂直磁记录的磁写头的方法。 该方法包括使用掩模形成写入极，该掩模包括沉积在写磁极层压材料上的硬掩模层，以及厚的，物理上坚固的图像转印层。 图像转印层可以是诸如AlTiO的材料，其可以通过反应离子蚀刻工艺进行图案化，但也可以在加工过程中抵抗变形。 该过程允许在非常窄的轨道宽度上构造写极点和缠绕后挡板，而不会由现有技术方法遇到的掩模变形和围栏问题。

公开(公告)号：US08503131B2

公开(公告)日：2013-08-06

申请号：US13339310

申请日：2011-12-28

申请人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

发明人： Yi Zheng ,  Yimin Hsu ,  Wen-Chien David Hsiao ,  Ming Jiang ,  Aron Pentek ,  Sue Siyang Zhang ,  Edward Hin Pong Lee ,  Hung-chin Guthrie ,  Ning Shi ,  Vladimir Nikitin ,  Prabodh Ratnaparkhi ,  Yinshi Liu

IPC分类号： G11B5/147

CPC分类号： G11B5/3166 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052 ,  Y10T428/11 ,  Y10T428/1186

摘要： A magnetic write head for perpendicular magnetic data recording. The write head includes a substrate and a magnetic write pole formed on the substrate, the write pole having a trailing edge and first and second sides. A magnetic stitched pole is formed over a portion of the magnetic write pole, the stitched pole having a front edge that defines a secondary flare point. First and second non-magnetic side walls are formed at the first and second sides of the write pole. The non-magnetic side walls extend from the substrate at least to the trailing edge of the write pole in a first region near an air bearing surface and wherein the first and second non-magnetic side walls extend from the substrate to a point between the substrate and the trailing edge, allowing the stitched magnetic pole to extend partially over the sides of the write pole.

摘要翻译： 用于垂直磁数据记录的磁写头。 写入头包括形成在衬底上的衬底和磁性写入磁极，写入极具有后缘和第一和第二侧。 在磁性写入磁极的一部分上形成有磁性的缝合磁极，缝合的磁极具有限定二次闪光点的前部边缘。 第一和第二非磁性侧壁形成在写入极的第一和第二侧。 所述非磁性侧壁在靠近空气支承表面的第一区域中从所述基板至少延伸到所述写柱的后缘，并且其中所述第一和第二非磁性侧壁从所述基板延伸到所述基板之间的点 和后缘，允许缝合的磁极部分地延伸在写柱的侧面上。

公开(公告)号：US08347489B2

公开(公告)日：2013-01-08

申请号：US12874116

申请日：2010-09-01

申请人： Liubo Hong ,  Aron Pentek ,  Yi Zheng ,  Honglin Zhu

发明人： Liubo Hong ,  Aron Pentek ,  Yi Zheng ,  Honglin Zhu

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/23 ,  G11B5/3116 ,  G11B5/315 ,  Y10T29/49041 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for manufacturing a magnetic write head having a tapered write pole as well as a leading edge taper, and independent trailing and side magnetic shields. The method allows the write pole to be constructed by a dry process wherein the write pole material is either deposited by a process such as sputter deposition or electrically plated and the write pole shape is defined by masking and ion milling. The write pole has a stepped feature that can either be used to provide increased magnetic spacing between the trailing shield and the write pole at a location slightly recessed from the ABS or can be magnetic material that increases the effective thickness of the write pole at a location slightly recessed from the ABS. A bump structure can be further built over that stepped feature to enhance field gradient as well as reduce trailing shield saturation.

摘要翻译： 一种用于制造具有锥形写柱以及前缘锥形的磁写头的方法，以及独立的后侧和侧面磁屏蔽。 该方法允许写极通过干法进行构建，其中写极材料通过诸如溅射沉积或电镀的工艺沉积，并且写极形状通过掩模和离子铣削定义。 写极具有阶梯特征，其可以用于在稍微从ABS处凹陷的位置处在后屏蔽和写极之间提供增加的磁间隔，或者可以是磁性材料，其增加写极的位置处的有效厚度 从ABS略微凹进。 可以在该阶梯特征上进一步构建凸块结构，以增强磁场梯度以及减少后屏蔽饱和度。

公开(公告)号：US08323727B2

公开(公告)日：2012-12-04

申请号：US12641138

申请日：2009-12-17

申请人： Aron Pentek ,  Yi Zheng

发明人： Aron Pentek ,  Yi Zheng

IPC分类号： C23C14/32

CPC分类号： C25D7/001 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163 ,  Y10T428/115

摘要： A method for manufacturing a magnetic write head that has a trailing magnetic shield with a tapered write pole trailing edge, a non-magnetic step layer and a Ru bump and an alumina bump formed at the front of the non-magnetic step layer. The process forms a Ru/alumina side wall at the sides of the write pole, such that the Ru side wall is closest to the write pole. The Ru is removed more readily than the alumina during the ion milling that is performed to taper the write pole. This causes the Ru portion of the side wall to taper away from the write pole rather than forming an abrupt step. This tapering prevents dishing of the trailing edge of the write pole for improved write head performance.

摘要翻译： 一种用于制造具有形成在非磁性阶梯层前面的锥形写磁头后缘的后磁屏蔽，非磁性阶梯层和Ru凸块以及氧化铝凸块的磁写头的方法。 该工艺在写入极的两侧形成Ru /氧化铝侧壁，使得Ru侧壁最靠近写入极。 在离子铣削期间，Ru比氧化铝更容易地被除去，以使得写柱变钝。 这使得侧壁的Ru部分远离写入磁极而变浅，而不是形成突然的步骤。 这种渐缩防止了写磁极的后缘的凹陷以改善写头性能。

公开(公告)号：US08252190B2

公开(公告)日：2012-08-28

申请号：US12343720

申请日：2008-12-24

申请人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： B44C1/22 ,  G11B5/127 ,  H04R31/00

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/315 ,  G11B5/3163 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A method for manufacturing a magnetic write head having a write pole with a tapered trailing edge step. The resulting tapered trailing edge step maximizes write field at very small bit sizes by preventing the magnetic saturation of the write pole at the pole tip. The method includes depositing a magnetic write pole material and then depositing a magnetic material over the magnetic write pole material. A RIE mask and hard mask are deposited over the magnetic bump material. A resist mask is formed over the RIE mask and hard mask, and a reactive ion etching is performed to transfer the pattern of the resist mask onto the underlying hard mask. Then an ion milling is performed to form a the magnetic step layer with a tapered edge that defines a tapered trailing edge step structure of the write pole.

摘要翻译： 一种用于制造具有具有锥形后缘台阶的写极的磁写头的方法。 所产生的锥形后沿步骤通过防止磁极尖端的写极的磁饱和而使非常小的位尺寸的写入场最大化。 该方法包括沉积磁性写入磁极材料，然后在磁性写入磁极材料上沉积磁性材料。 RIE掩模和硬掩模沉积在磁性凸块材料上。 在RIE掩模和硬掩模上形成抗蚀剂掩模，并且执行反应离子蚀刻以将抗蚀剂掩模的图案转移到下面的硬掩模上。 然后执行离子铣削以形成具有锥形边缘的磁性阶梯层，其限定了写入极的锥形后缘阶梯结构。

公开(公告)号：US08085497B2

公开(公告)日：2011-12-27

申请号：US12341834

申请日：2008-12-22

申请人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

发明人： Wen-Chien David Hsiao ,  Vladimir Nikitin ,  Aron Pentek ,  Sue Siyang Zhang ,  Yi Zheng

IPC分类号： G11B5/127

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： A system according to one embodiment includes a magnetic pole; a bump structure above the pole, the bump structure having a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the pole, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the pole, wherein the second angle is greater than the first angle; and a shield above the bump structure. A method according to one embodiment includes forming a bump layer above a magnetic pole; removing a portion of the bump layer for forming a step therein; and milling the bump layer for defining thereon a first surface oriented at a first angle between 1° and 89° from a plane of deposition of the bump layer, and a second surface oriented at a second angle between 1° and 89° from the plane of deposition of the bump layer, wherein the second angle is greater than the first angle.

摘要翻译： 根据一个实施例的系统包括磁极; 所述凸起结构具有从所述极的沉积平面以1°至89°之间的第一角度定向的第一表面，并且所述第一表面以与所述极的沉积的平面成1°至89°之间的第二角度定向 所述极的沉积平面，其中所述第二角度大于所述第一角度; 和凸块结构之上的屏蔽。 根据一个实施例的方法包括在磁极上形成凸起层; 去除所述凸起层的一部分以在其中形成台阶; 并且研磨所述凸起层，以在其上限定从凸起层的沉积平面以1°至89°之间的第一角度定向的第一表面，以及从该平面以1°至89°之间的第二角度定向的第二表面 所述凸起层的沉积，其中所述第二角度大于所述第一角度。